公开(公告)号：US08426830B2

公开(公告)日：2013-04-23

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： G21G4/00

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US08269194B2

公开(公告)日：2012-09-18

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

公开(公告)号：US08198603B2

公开(公告)日：2012-06-12

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： H01J37/20 ,  G21K5/10 ,  G01N1/28

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A sample preparing device has a sample stage that supports a sample and undergoes rotation about a first rotation axis to bring a preselected direction of the sample piece into coincidence with an intersection line between a first plane formed by a surface of the sample piece and a second plane. A manipulator holds sample piece of the sample and undergoes rotation about a second rotation axis independently of the sample stage to rotate the sample piece to a preselected position in the state in which the preselected direction of the sample piece coincides with the intersection line. The manipulator is disposed relative to the sample stage so that an angle between the second rotation axis and the surface of the sample is in the range of 0° to 45°. The second plane corresponds to a plane obtained by rotating around the second rotation axis a line segment which is vertical to the surface of the sample and of which one end corresponds to an intersection between the surface of the sample and the second rotation axis.

摘要翻译： 样品制备装置具有样品台，其支撑样品并围绕第一旋转轴线旋转以使样品片的预选方向与由样品片的表面形成的第一平面和第二面之间的交线相符， 飞机 操纵器保持样品的样品并且独立于样品台绕第二旋转轴旋转，以在样品的预选方向与交叉线重合的状态下将样品片旋转到预选位置。 操纵器相对于样品台设置，使得第二旋转轴与样品表面之间的角度在0°至45°的范围内。 第二平面对应于通过围绕第二旋转轴旋转垂直于样品表面的线段并且其一端对应于样品表面和第二旋转轴线之间的交叉而获得的平面。

公开(公告)号：US20110320595A1

公开(公告)日：2011-12-29

申请号：US13166104

申请日：2011-06-22

申请人： Hayato KONISHI ,  Kousuke Sakaue ,  Junichi Tashiro

发明人： Hayato KONISHI ,  Kousuke Sakaue ,  Junichi Tashiro

IPC分类号： G06F15/173

CPC分类号： G06F8/65 ,  G16H40/40

摘要： This embodiment involves a medical information processing device comprising: a storage part; a configuration information storage part; a determination part; and a controller. The storage part stores a plurality of application programs. The configuration information storage part stores configuration information for an execution environment that is quality guaranteed, corresponding to the application program. The determination part, based on the configuration information, determines whether it is possible to run the application program. The controller, if it is determined at the determination part that the application program cannot be run, causes a function corresponding to this application program to be run on a server.

摘要翻译： 本实施例涉及一种医疗信息处理装置，包括：存储部; 配置信息存储部; 确定部分; 和控制器。 存储部存储多个应用程序。 配置信息存储部存储与应用程序对应的，质量保证的执行环境的配置信息。 确定部件基于配置信息来确定是否可以运行应用程序。 如果在确定部分确定应用程序不能运行，则控制器使得与该应用程序相对应的功能在服务器上运行。

公开(公告)号：US20110226948A1

公开(公告)日：2011-09-22

申请号：US13065238

申请日：2011-03-17

申请人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

发明人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

IPC分类号： H01J37/26

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/226 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

摘要翻译： 提供了一种样品处理和观察方法，包括将聚焦离子束照射到样品上以形成观察表面，向观察表面照射电子束以形成观察图像，除去与样品的观察表面相反的表面， 形成包括观察表面的薄片并获得薄片的透射观察图像。

公开(公告)号：US20100205485A1

公开(公告)日：2010-08-12

申请号：US12698623

申请日：2010-02-02

申请人： Junichi TASHIRO ,  Shinya SUGIYAMA ,  Kousuke SAKAUE

发明人： Junichi TASHIRO ,  Shinya SUGIYAMA ,  Kousuke SAKAUE

IPC分类号： G06F11/07 ,  G06F15/16

CPC分类号： H04L41/5035 ,  H04L69/40

摘要： The present invention comprises a request sending part 101 that sends connection requests during network communication and DICOM communication to a medical information device 010, a response-data receiving part 102 that receives response data for each connection request, a first response analyzing part 103 that receives the response data and analyzes any error in the network communication to acquire first error information, a second response analyzing part 104 that analyzes any error in the DICOM communication during a failed connection to acquire second error information, and a display controller 109 that displays countermeasures on a display part 112.

摘要翻译： 本发明包括在网络通信和DICOM通信期间向医疗信息设备010发送连接请求的请求发送部分101，接收每个连接请求的响应数据的响应数据接收部分102，接收到响应数据的第一响应分析部分103 响应数据并分析网络通信中的任何错误以获取第一错误信息;第二响应分析部分104，其在故障连接期间分析DICOM通信中的任何错误以获取第二错误信息;以及显示控制器109，显示对策 显示部112。

公开(公告)号：US07755044B2

公开(公告)日：2010-07-13

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G21K5/04 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US20100155624A1

公开(公告)日：2010-06-24

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： H01J37/08 ,  G21K5/04

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US20090114842A1

公开(公告)日：2009-05-07

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： G21K5/10

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： After a certain direction of a sample piece is allowed to coincide with an intersection line made by two planes of a surface of the sample and a conical side plane obtained by rotating, around a manipulator rotation axis, a line segment which is vertical to the surface of the sample and of which one end is an intersection of the surface of a sample and the manipulator rotation axis, the sample piece is supported by a manipulator and the manipulator rotation axis is operated.

摘要翻译： 在样品的一定方向被允许与由样品表面的两个平面形成的交线和通过围绕机械手旋转轴线旋转而获得的圆锥形侧面的与表面垂直的线段 并且其一端是样品的表面与操纵器旋转轴线的交点，样品片由操纵器支撑并且操纵器旋转轴被操作。

公开(公告)号：US07872231B2

公开(公告)日：2011-01-18

申请号：US12047022

申请日：2008-03-12

申请人： Junichi Tashiro ,  Masanao Munekane

发明人： Junichi Tashiro ,  Masanao Munekane

IPC分类号： G01N23/00

CPC分类号： H01J37/20 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/20278 ,  H01J2237/31735 ,  H01L21/68707

摘要： In a chamber of a charged particle beam apparatus, the sample on the sample substrate is gripped and carried to the sample holder, and there is controlled the attitude of the sample when the sample is fixed on the sample holder. There possesses a marking process applying, in the chamber, a marking to a surface of the sample Wb existing on the sample substrate by a beam, a carriage process gripping the sample by a sample gripping means and carrying it from the sample substrate to the sample holder, and an attitude control process controlling, when fixing the sample to the sample holder, the attitude of the sample while observing the marking applied to the surface of the sample.

摘要翻译： 在带电粒子束装置的室中，将样品基板上的样品夹持并携带到样品架上，并且当将样品固定在样品架上时，控制样品的姿态。 具有标记过程，在室中通过光束在样品基板上存在于样品Wb的表面上的标记，通过样品夹持装置夹持样品并将其从样品基底携带到样品的标记 以及姿态控制处理，当将样品固定到样品保持器上时，控制样品的姿态，同时观察施加到样品表面的标记。