公开(公告)号：US08198603B2

公开(公告)日：2012-06-12

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： H01J37/20 ,  G21K5/10 ,  G01N1/28

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A sample preparing device has a sample stage that supports a sample and undergoes rotation about a first rotation axis to bring a preselected direction of the sample piece into coincidence with an intersection line between a first plane formed by a surface of the sample piece and a second plane. A manipulator holds sample piece of the sample and undergoes rotation about a second rotation axis independently of the sample stage to rotate the sample piece to a preselected position in the state in which the preselected direction of the sample piece coincides with the intersection line. The manipulator is disposed relative to the sample stage so that an angle between the second rotation axis and the surface of the sample is in the range of 0° to 45°. The second plane corresponds to a plane obtained by rotating around the second rotation axis a line segment which is vertical to the surface of the sample and of which one end corresponds to an intersection between the surface of the sample and the second rotation axis.

摘要翻译： 样品制备装置具有样品台，其支撑样品并围绕第一旋转轴线旋转以使样品片的预选方向与由样品片的表面形成的第一平面和第二面之间的交线相符， 飞机 操纵器保持样品的样品并且独立于样品台绕第二旋转轴旋转，以在样品的预选方向与交叉线重合的状态下将样品片旋转到预选位置。 操纵器相对于样品台设置，使得第二旋转轴与样品表面之间的角度在0°至45°的范围内。 第二平面对应于通过围绕第二旋转轴旋转垂直于样品表面的线段并且其一端对应于样品表面和第二旋转轴线之间的交叉而获得的平面。

公开(公告)号：US20090114842A1

公开(公告)日：2009-05-07

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： G21K5/10

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： After a certain direction of a sample piece is allowed to coincide with an intersection line made by two planes of a surface of the sample and a conical side plane obtained by rotating, around a manipulator rotation axis, a line segment which is vertical to the surface of the sample and of which one end is an intersection of the surface of a sample and the manipulator rotation axis, the sample piece is supported by a manipulator and the manipulator rotation axis is operated.

摘要翻译： 在样品的一定方向被允许与由样品表面的两个平面形成的交线和通过围绕机械手旋转轴线旋转而获得的圆锥形侧面的与表面垂直的线段 并且其一端是样品的表面与操纵器旋转轴线的交点，样品片由操纵器支撑并且操纵器旋转轴被操作。

公开(公告)号：US07755044B2

公开(公告)日：2010-07-13

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G21K5/04 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US20080224198A1

公开(公告)日：2008-09-18

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G01N23/225

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US08542275B2

公开(公告)日：2013-09-24

申请号：US12880626

申请日：2010-09-13

申请人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： H04N7/18

CPC分类号： G01N23/2255

摘要： A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.

摘要翻译： 截面处理和观察方法包括：通过使用聚焦离子束的蚀刻处理在样品中形成第一横截面; 通过将聚焦的离子束照射到第一横截面来获得第一横截面的图像信息; 通过对所述第一横截面进行蚀刻处理形成第二横截面; 通过将聚焦离子束照射到包括第二横截面的照射区域来获得第二横截面的图像信息; 从第二横截面的图像信息中显示照射区域的显示区域的一部分的图像信息; 通过将第一横截面的图像信息叠加在正在显示的图像信息上来显示图像信息; 并且在照射区域内移动显示区域。 可以获得显示区域对准的观察图像，同时减少对样品的损伤。

公开(公告)号：US20110052044A1

公开(公告)日：2011-03-03

申请号：US12873886

申请日：2010-09-01

申请人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

IPC分类号： G06T7/00

CPC分类号： G01N23/2255 ,  H01J2237/221

摘要： A cross-section processing and observation method includes: forming a cross section in a sample by a focused ion beam through etching processing; obtaining a cross-section observation image through cross-section observation by the focused ion beam; and forming a new cross section by performing etching processing in a region including the cross section and obtaining a cross-section observation image of the new cross section. A surface observation image of a region including a mark on the sample and the cross section is obtained. A position of the mark is recognized in the surface observation image and etching processing is performed on the cross section by setting, in reference to the position of the mark, a focused ion beam irradiation region in which to form the new cross section. Cross-section processing and observation is thus enabled continuously and efficiently using a focused ion beam apparatus having no SEM apparatus.

摘要翻译： 截面处理和观察方法包括：通过蚀刻处理通过聚焦离子束在样品中形成横截面; 通过聚焦离子束的横截面观察获得横截面观察图像; 并且通过在包括横截面的区域中进行蚀刻处理并获得新横截面的横截面观察图像来形成新的横截面。 获得包括样品上的标记和横截面的区域的表面观察图像。 在表面观察图像中识别标记的位置，并且通过关于标记的位置设置形成新横截面的聚焦离子束照射区域来对截面进行蚀刻处理。 因此，使用不具有SEM装置的聚焦离子束装置，能够连续有效地进行横截面加工和观察。

公开(公告)号：US07872231B2

公开(公告)日：2011-01-18

申请号：US12047022

申请日：2008-03-12

申请人： Junichi Tashiro ,  Masanao Munekane

发明人： Junichi Tashiro ,  Masanao Munekane

IPC分类号： G01N23/00

CPC分类号： H01J37/20 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/20278 ,  H01J2237/31735 ,  H01L21/68707

摘要： In a chamber of a charged particle beam apparatus, the sample on the sample substrate is gripped and carried to the sample holder, and there is controlled the attitude of the sample when the sample is fixed on the sample holder. There possesses a marking process applying, in the chamber, a marking to a surface of the sample Wb existing on the sample substrate by a beam, a carriage process gripping the sample by a sample gripping means and carrying it from the sample substrate to the sample holder, and an attitude control process controlling, when fixing the sample to the sample holder, the attitude of the sample while observing the marking applied to the surface of the sample.

摘要翻译： 在带电粒子束装置的室中，将样品基板上的样品夹持并携带到样品架上，并且当将样品固定在样品架上时，控制样品的姿态。 具有标记过程，在室中通过光束在样品基板上存在于样品Wb的表面上的标记，通过样品夹持装置夹持样品并将其从样品基底携带到样品的标记 以及姿态控制处理，当将样品固定到样品保持器上时，控制样品的姿态，同时观察施加到样品表面的标记。

公开(公告)号：US20090134327A1

公开(公告)日：2009-05-28

申请号：US12290619

申请日：2008-10-31

申请人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

发明人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

IPC分类号： G01N23/00 ,  H01J3/14

CPC分类号： H01J37/3056 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/304 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

摘要： There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition.

摘要翻译： 提供了当在一定的照射条件下将电子束或聚焦离子束发射到观察区域时，检测从样本的观察区域产生的二次带电粒子的检测步骤; 图像形成步骤，从在检测步骤中检测到的二次带电粒子形成通过划分观察区域并具有相同的周期性图案而获得的多个观察图像; 以及从通过比较在图像形成步骤中形成的多个观察图像而获得的差异的信息，识别观察区域中的缺陷的缺陷识别步骤。 此外，即使当电子束或聚焦离子束在与特定照射条件不同的照射条件下发射到观察区域上时，也执行检测步骤，图像形成步骤和缺陷识别步骤。

公开(公告)号：US20080131792A1

公开(公告)日：2008-06-05

申请号：US11946377

申请日：2007-11-28

申请人： Osamu Takaoka ,  Junichi Tashiro

发明人： Osamu Takaoka ,  Junichi Tashiro

IPC分类号： G03F1/00

CPC分类号： G03F1/74 ,  G03F1/72

摘要： In a micromachining apparatus equipped with an AFM having a plurality of independently actuatable probes, which uses an electron beam or a helium ion beam produced by a gas field ion source, an isolating pattern including a defect is grounded by bringing the conducting probe into contact with the pattern, and then the opaque defect is corrected while the charge-up by an electron beam or gas ion beam is prevented. In the case where there are isolating patterns in an observation range and the effect of the charge-up arises even when the isolating pattern including a defect is grounded, the respective isolating patterns are grounded by the plurality of conducting probes thereby to suppress the effect of the charge-up.

摘要翻译： 在配备有具有多个可独立致动的探针的微加工装置中，其使用由气体离子源产生的电子束或氦离子束，通过使导电探针与 在防止电子束或气体离子束的充电的同时校正图案，然后校正不透明缺陷。 在观察范围内存在隔离图案的情况下，即使当包含缺陷的隔离图案接地时也产生充电的效果时，通过多个导电探针使各个隔离图案接地，从而抑制 充电。

公开(公告)号：US20080042059A1

公开(公告)日：2008-02-21

申请号：US11840575

申请日：2007-08-17

申请人： Junichi Tashiro ,  Yutaka Ikku ,  Toshiaki Fujii

发明人： Junichi Tashiro ,  Yutaka Ikku ,  Toshiaki Fujii

IPC分类号： G01N23/00

CPC分类号： G01N23/2255 ,  G01N1/32 ,  G01N2223/104 ,  G01N2223/32 ,  G01N2223/611 ,  H01J37/3005 ,  H01J37/3045 ,  H01J37/3056 ,  H01J2237/30466 ,  H01J2237/30488 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.

摘要翻译： 检测到的是通过照射聚焦离子束而同时进行蚀刻样品部分和周围扫描照射聚焦离子束而产生的二次电子。 从检测到的二次电子信号的变化量中，终点检测机构检测终点，从而终止蚀刻，即使不具有SEM的FIB装置也能够有效地检测缺陷或接触孔的中心位置 观察功能。