发明授权
- 专利标题: Composite focused ion beam device, and processing observation method and processing method using the same
- 专利标题(中): 复合聚焦离子束装置及其加工方法及处理方法
-
申请号: US12733089申请日: 2008-08-06
-
公开(公告)号: US08269194B2公开(公告)日: 2012-09-18
- 发明人: Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
- 申请人: Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
- 申请人地址: JP
- 专利权人: SII NanoTechnology Inc.
- 当前专利权人: SII NanoTechnology Inc.
- 当前专利权人地址: JP
- 代理机构: Adams & Wilks
- 优先权: JP2007-207097 20070808
- 国际申请: PCT/JP2008/064122 WO 20080806
- 国际公布: WO2009/020150 WO 20090212
- 主分类号: H01J49/00
- IPC分类号: H01J49/00
摘要:
A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
公开/授权文献
信息查询