Tracking arrangement for a communications system on a mobile platform
    1.
    发明授权
    Tracking arrangement for a communications system on a mobile platform 有权
    在移动平台上的通信系统的跟踪安排

    公开(公告)号:US07956806B2

    公开(公告)日:2011-06-07

    申请号:US12484604

    申请日:2009-06-15

    CPC classification number: H04B7/086 G01S3/40

    Abstract: Systems and methods are provided for orienting an antenna in a communications system on a mobile platform to orient a peak of the antenna pattern in a direction associated with a signal source. A signal from a signal source is received at the antenna. A signal strength is measured from the received signal. A signal strength and a misalignment of the antenna along at least one axis are predicted according to a previous estimate of the signal strength, a previous estimate of the misalignment of the antenna, an estimated change in the signal strength, and a known change in the antenna orientation. The predicted signal strength and misalignment of the antenna are updated according to the measured signal strength to provide an estimate of a current misalignment of the antenna. The orientation of the peak of the antenna pattern is adjusted according to the estimated current misalignment of the antenna.

    Abstract translation: 提供了系统和方法,用于在移动平台上的通信系统中定向天线,以将天线图案的峰值定向在与信号源相关联的方向上。 在天线处接收来自信号源的信号。 从接收信号测量信号强度。 根据信号强度的先前估计,天线未对准的先前估计,信号强度的估计变化以及信号强度的已知变化来预测天线沿着至少一个轴的信号强度和未对准 天线方向。 根据测得的信号强度来更新天线的预测信号强度和未对准,以提供对天线的电流未对准的估计。 根据天线的估计的电流偏差来调整天线方向图的峰值的方位。

    Structure and process for semiconductor device using batch processing
    3.
    发明授权
    Structure and process for semiconductor device using batch processing 失效
    使用批处理的半导体器件的结构和工艺

    公开(公告)号:US3874918A

    公开(公告)日:1975-04-01

    申请号:US44378174

    申请日:1974-02-19

    Applicant: TRW INC

    Abstract: A fabrication process and structure for semiconductor devices allowing a large number of devices to be made utilizing batch processing techniques without individual handling of the devices. The process includes forming a plurality of mesas on a semiconductor wafer, each of which contains a semiconductor junction, coating the wafer with a thick glass coating, etching tapered holes in the glass over the mesas, and plating a contact onto the mesa filling the tapered holes. Diodes made according to the process display low capacitance and inductance, high reliablility and high power dissipation characteristics.

    Abstract translation: 一种用于半导体器件的制造工艺和结构,允许使用批处理技术制造大量器件,而无需单独处理器件。 该方法包括在半导体晶片上形成多个台面,每个台面均包含半导体结,用厚玻璃涂层涂覆晶片,在台面上蚀刻玻璃中的锥形孔,并将接触电镀在台面上, 孔。 根据工艺制造的二极管显示低电容和电感,高可靠性和高功耗特性。

    Impedance transforming binary hybrid trees
    4.
    发明授权
    Impedance transforming binary hybrid trees 失效
    阻抗变换二进制杂交条

    公开(公告)号:US3697895A

    公开(公告)日:1972-10-10

    申请号:US3697895D

    申请日:1970-08-03

    Applicant: TRW INC

    Inventor: BECK ALFRED B

    CPC classification number: H03H7/48

    Abstract: Electrical power dividing or combining, and impedance transforming, binary tree circuits for an optimized output or input port isolation or an optimized VSWR across a predetermined frequency band, or a desired compromise between them, having cascaded tiers of multi-port hybrid circuits with each hybrid circuit having a bridging impedance connected across its arrayed ports. The circuits are derived from an even-mode synthesis of a prototype circuit having equal-ripple input reflection coefficient response across the predetermined frequency band, the bridging impedance values for the arrayed ports of each hybrid circuit being determined in accordance with the desired relationship between VSWR and port isolation by an even and oddmode analysis of each hybrid circuit.

    Abstract translation: 用于优化的输出或输入端口隔离的电力分配或组合以及用于优化的输出端口隔离或优化的跨越预定频带的VSWR的二进制树电路或它们之间的期望的折中,具有每个混合电路的多端口混合电路的级联层 电路具有连接在其阵列端口上的桥接阻抗。 这些电路是从具有在预定频带上具有相等纹波输入反射系数响应的原型电路的偶模合成得出的,每个混合电路的阵列端口的桥接阻抗值根据VSWR 并通过每个混合电路的偶模式和奇模式分析来实现端口隔离。

    Method for fabricating semiconductor junctions
    5.
    发明授权
    Method for fabricating semiconductor junctions 失效
    制造半导体结的方法

    公开(公告)号:US3676230A

    公开(公告)日:1972-07-11

    申请号:US3676230D

    申请日:1971-02-16

    Applicant: TRW INC

    Inventor: RICE EDWARD J

    Abstract: A METHOD FOR FORMING SEMICONDUCTOR JUNCTIONS. A SEMICONDUCTOR MATERIAL OF A GIVEN CONDUCTIVITY IS PROVIDED, TWO SEQUENTIAL PASSIVATING LAYERS BEING DISPOSED ON THE SURFACE, THEREOF, THE PASSIVATING LAYERS BEING ADAPTED TO BE ETCHED BY MUTUALLY EXCLUSIVE ETCHING COMPOUNDS. A PORTION OF THE SEMICONDUCTOR SURFACE IS EXPOSED, THE PASSIVATING LAYER ADJACENT THE SURFACE OF THE SEMICONDUCTOR MATERIAL BEING UNDERCUT RELATIVE TO THE UPPER PASSIVATING LAYER. A DOPED OXIDE IS DISPOSED UPON THE SEMICONDUCTOR SURFACE INCLUDING THAT PORTION ADJACENT THE UNDERCUT PASSIVATING LAYER. THE DOPED OXIDE, IS ETCHED IN A MANNER LEAVING PORTIONS OF THE DOPED OXIDE IN INTIMATE CONTACT WITH THE SURFACE OF THE SEMICONDUCTOR MATEIAL SUBSTANTIALLY ADJACENT THE UNDERCUT PASSIVATING LAYER. THE DOPANT IS THEN DIFFUSED INTO THE SEMICONDUCTOR SURFACE FORMING APPROPRIATE SEMICONDUCTOR JUNCTIONS THEREIN.

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