公开(公告)号：US20110076119A1

公开(公告)日：2011-03-31

申请号：US12993914

申请日：2009-05-19

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

IPC分类号： H01L21/677

CPC分类号： H01L21/68764 ,  B65G49/061 ,  B65G2249/02 ,  B65G2249/045 ,  H01L21/67709

摘要： An object is to provide a vacuum processing apparatus that is capable of suppressing the costs and making control easy. Provided is a vacuum processing apparatus that includes a vacuum section (2) of which inside is held in vacuum, a placing section (3) that is disposed inside the vacuum section (2) and is capable of placing a workpiece thereon, a linear motor 4) that includes coils (415) and makes the placing section (3) travel within the vacuum section, wherein air is placed inside the placing section (3) while being isolated from the vacuum section (2), and the coils (415) of the linear motor (4) are disposed inside the placing section (3).

摘要翻译： 本发明的目的是提供一种能够抑制成本并使控制变得容易的真空处理装置。 本发明提供一种真空处理装置，其特征在于，具备将真空部保持在真空中的真空部（2），配置在所述真空部（2）内部并能够在其上放置工件的放置部（3） 4），其包括线圈（415）并使放置部分（3）在真空部分内行进，其中空气在与真空部分（2）隔离的同时放置在放置部分（3）内，并且线圈（415） 线性电动机（4）配置在放置部（3）的内部。

公开(公告)号：US20110240223A1

公开(公告)日：2011-10-06

申请号：US13129167

申请日：2009-11-11

申请人： Shinji Matsubayashi ,  Satoru Kawakami ,  Yasuhiro Tobe ,  Masaru Nishimura ,  Yasushi Yagi ,  Teruyuki Hayashi ,  Yuji Ono ,  Fumio Shimo

发明人： Shinji Matsubayashi ,  Satoru Kawakami ,  Yasuhiro Tobe ,  Masaru Nishimura ,  Yasushi Yagi ,  Teruyuki Hayashi ,  Yuji Ono ,  Fumio Shimo

IPC分类号： B08B13/00 ,  B05C13/00

CPC分类号： H01L51/56 ,  H01L21/67173 ,  H01L21/6723

摘要： There is provided a substrate processing system having high maintainability by widening a gap between various processing apparatuses connected with side surfaces of transfer modules and capable of achieving sufficient productivity by avoiding deterioration in throughput. The substrate processing system for manufacturing an organic EL device by forming a multiple number of layers including, e.g., an organic layer on a substrate includes at least one transfer module configured to be evacuable and arranged along a straight transfer route. Within the transfer module, a multiple number of loading/unloading areas for loading/unloading the substrate with respect to a processing apparatus and at least one stocking area positioned between the loading/unloading areas are alternately arranged along the transfer route in series, and the processing apparatus is connected with a side surface of the transfer module at a position facing each of the loading/unloading areas.

摘要翻译： 提供了一种具有高可维护性的基板处理系统，通过扩大与传送模块的侧表面连接的各种处理设备之间的间隙，并且能够通过避免吞吐量的恶化来实现足够的生产率。 用于通过在衬底上形成包括例如有机层的多个层来制造有机EL器件的衬底处理系统包括至少一个被配置为可沿着直线传送路线排空和布置的传送模块。 在传送模块内，沿着传送路径交替布置多个用于相对于处理装置加载/卸载基板的装载/卸载区域和位于装载/卸载区域之间的至少一个放料区域， 处理设备在面向每个装载/卸载区域的位置处与传送模块的侧表面连接。

公开(公告)号：US08522958B2

公开(公告)日：2013-09-03

申请号：US12993914

申请日：2009-05-19

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

IPC分类号： B65G49/00 ,  B65G54/02

CPC分类号： H01L21/68764 ,  B65G49/061 ,  B65G2249/02 ,  B65G2249/045 ,  H01L21/67709

摘要： An object is to provide a vacuum processing apparatus that is capable of suppressing the costs and making control easy. Provided is a vacuum processing apparatus that includes a vacuum section (2) of which inside is held in vacuum, a placing section (3) that is disposed inside the vacuum section (2) and is capable of placing a workpiece thereon, a linear motor 4) that includes coils (415) and makes the placing section (3) travel within the vacuum section, wherein air is placed inside the placing section (3) while being isolated from the vacuum section (2), and the coils (415) of the linear motor (4) are disposed inside the placing section (3).

摘要翻译： 本发明的目的是提供一种能够抑制成本并使控制变得容易的真空处理装置。 本发明提供一种真空处理装置，其特征在于，具备将真空部保持在真空中的真空部（2），配置在所述真空部（2）内部并能够在其上放置工件的放置部（3） 4），其包括线圈（415）并使放置部分（3）在真空部分内行进，其中在与真空部分（2）隔离的同时，空气放置在放置部分（3）内，并且线圈（415） 线性电动机（4）配置在放置部（3）的内部。

公开(公告)号：US08337621B2

公开(公告)日：2012-12-25

申请号：US12516498

申请日：2007-11-29

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi

IPC分类号： B05C13/02 ,  B05C21/00

CPC分类号： H01L21/67709 ,  C23C14/12 ,  C23C14/568 ,  F16C32/0434 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67721 ,  H01L21/6776 ,  H02N15/00

摘要： A processing apparatus for processing a substrate G includes a processing chamber for processing the substrate; a depressurizing mechanism reducing an internal pressure of the processing chamber; and a transfer mechanism disposed in the processing chamber to transfer the substrate, wherein the transfer mechanism includes: a guide member; a stage for holding the substrate; a driving member for moving the stage; and a movable member supporting the stage and moving along the guide member. The guide member and the movable member are maintained so as not to contact each other by a repulsive force of magnets.

摘要翻译： 用于处理衬底G的处理设备包括：用于处理衬底的处理室; 降低处理室内部压力的减压机构; 以及设置在所述处理室中以传送所述基板的传送机构，其中所述传送机构包括：引导构件; 用于保持基板的阶段; 用于移动舞台的驾驶员; 以及可移动部件，其支撑所述台架并沿着所述引导部件移动。 保持引导构件和可动构件，以便通过磁体的排斥力不彼此接触。

公开(公告)号：US20100043712A1

公开(公告)日：2010-02-25

申请号：US12516498

申请日：2007-11-29

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi

IPC分类号： C23C16/458 ,  C23C16/00 ,  H01L21/677

CPC分类号： H01L21/67709 ,  C23C14/12 ,  C23C14/568 ,  F16C32/0434 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67721 ,  H01L21/6776 ,  H02N15/00

摘要： A processing apparatus for processing a substrate G includes a processing chamber for processing the substrate; a depressurizing mechanism reducing an internal pressure of the processing chamber; and a transfer mechanism disposed in the processing chamber to transfer the substrate, wherein the transfer mechanism includes: a guide member; a stage for holding the substrate; a driving member for moving the stage; and a movable member supporting the stage and moving along the guide member. The guide member and the movable member are maintained so as not to contact each other by a repulsive force of magnets.

摘要翻译： 用于处理衬底G的处理设备包括：用于处理衬底的处理室; 降低处理室内部压力的减压机构; 以及设置在所述处理室中以传送所述基板的传送机构，其中所述传送机构包括：引导构件; 用于保持基板的阶段; 用于移动舞台的驾驶员; 以及可移动部件，其支撑所述台架并沿着所述引导部件移动。 保持引导构件和可动构件，以便通过磁体的排斥力不彼此接触。

公开(公告)号：US09337945B2

公开(公告)日：2016-05-10

申请号：US14007248

申请日：2012-03-23

申请人： Tadashi Imai ,  Takayuki Kaida ,  Satoru Kawakami ,  Hitoshi Masumura

发明人： Tadashi Imai ,  Takayuki Kaida ,  Satoru Kawakami ,  Hitoshi Masumura

IPC分类号： H04B1/16 ,  H04H20/44 ,  H04H40/18 ,  H04N5/455 ,  H04N5/46 ,  H04N21/462 ,  H04N21/426 ,  H04N21/438 ,  H04N21/61 ,  H04H20/26 ,  H04H40/90

CPC分类号： H04H40/18 ,  H04H20/26 ,  H04H40/90 ,  H04N5/455 ,  H04N5/46 ,  H04N21/4263 ,  H04N21/4382 ,  H04N21/4622 ,  H04N21/6112 ,  H04N21/6143

摘要： A first high frequency processing unit detects a first broadcasting wave transmitted using a first frequency band, and extracts a first high frequency signal. Further, a second high frequency processing unit detects a second broadcasting wave transmitted using a second frequency band different from the first frequency band, and extracts a second high frequency signal. Furthermore, at least one local oscillator generates a local oscillation signal used in the first high frequency processing unit and the second high frequency processing unit.

摘要翻译： 第一高频处理单元检测使用第一频带发送的第一广播波，并提取第一高频信号。 此外，第二高频处理单元检测使用与第一频带不同的第二频带发送的第二广播波，并提取第二高频信号。 此外，至少一个本地振荡器产生在第一高频处理单元和第二高频处理单元中使用的本地振荡信号。

公开(公告)号：US07634225B2

公开(公告)日：2009-12-15

申请号：US10510289

申请日：2003-04-02

申请人： Satoru Kawakami ,  Tadashi Imai

发明人： Satoru Kawakami ,  Tadashi Imai

IPC分类号： H04H1/00

CPC分类号： H05K9/006 ,  H04B1/005 ,  H04B1/08 ,  H04B1/18 ,  H04N5/50 ,  H04N5/64 ,  H04N21/4263 ,  H04N21/6143 ,  H05K1/0218 ,  H05K1/0237 ,  H05K1/144 ,  H05K2201/043 ,  H05K2201/0715 ,  H05K2201/0723

摘要： The present invention provides a receiver that includes a plurality of tuners for receiving broadcasts such as satellite broadcast. A tuner circuit (1) includes an input terminal (11) for inputting a broadcast wave in which a video signal and/or an audio signal are modulated in a predetermined format, and a mount layer (13) on which a main circuit (12) for selecting, from the broadcast wave, a video signal and/or an audio signal included in a predetermined frequency band is mounted. In the tuner circuit (1), a first ground layer (15) is disposed, through a first dielectric layer (14), on the surface opposite to that on which the main circuit (12) of the mount layer (13) is arranged, and a second ground layer (17) is disposed through a second dielectric layer, thereby suppressing mutual interference between tuners.

摘要翻译： 本发明提供一种接收机，其包括用于接收诸如卫星广播的广播的多个调谐器。 调谐器电路（1）包括用于输入以预定格式调制视频信号和/或音频信号的广播波的输入端（11）和安装层（13），主电路（12） ）用于从广播波选择包括在预定频带中的视频信号和/或音频信号。 在调谐器电路（1）中，第一接地层（15）通过第一电介质层（14）设置在与安装层（13）的主电路（12）相对的表面相对的表面上 并且通过第二介电层设置第二接地层（17），从而抑制调谐器之间的相互干扰。

公开(公告)号：US20050122428A1

公开(公告)日：2005-06-09

申请号：US10510289

申请日：2003-04-02

申请人： Satoru Kawakami ,  Tadashi Imai

发明人： Satoru Kawakami ,  Tadashi Imai

IPC分类号： H04B1/08 ,  H04B1/18 ,  H04N5/50 ,  H04N5/64 ,  H05K1/02 ,  H05K1/14 ,  H04N7/173 ,  H04N5/14 ,  H04N5/44 ,  H04N9/64

CPC分类号： H05K9/006 ,  H04B1/005 ,  H04B1/08 ,  H04B1/18 ,  H04N5/50 ,  H04N5/64 ,  H04N21/4263 ,  H04N21/6143 ,  H05K1/0218 ,  H05K1/0237 ,  H05K1/144 ,  H05K2201/043 ,  H05K2201/0715 ,  H05K2201/0723

摘要： The present invention provides a receiver that includes a plurality of tuners for receiving broadcasts such as satellite broadcast. A tuner circuit (1) includes an input terminal (11) for inputting a broadcast wave in which a video signal and/or an audio signal are modulated in a predetermined format, and a mount layer (13) on which a main circuit (12) for selecting, from the broadcast wave, a video signal and/or an audio signal included in a predetermined frequency band is mounted. In the tuner circuit (1), a first ground layer (15) is disposed, through a first dielectric layer (14), on the surface opposite to that on which the main circuit (12) of the mount layer (13) is arranged, and a second ground layer (17) is disposed through a second dielectric layer, thereby suppressing mutual interference between tuners.

摘要翻译： 本发明提供一种接收机，其包括用于接收诸如卫星广播的广播的多个调谐器。 调谐器电路（1）包括用于输入以预定格式调制视频信号和/或音频信号的广播波的输入端（11）和安装层（13），主电路（12） ）用于从广播波选择包括在预定频带中的视频信号和/或音频信号。 在调谐器电路（1）中，第一接地层（15）通过第一电介质层（14）设置在与安装层（13）的主电路（12）相对的表面相对的表面上 并且通过第二介电层设置第二接地层（17），从而抑制调谐器之间的相互干扰。

公开(公告)号：US5494522A

公开(公告)日：1996-02-27

申请号：US214282

申请日：1994-03-17

申请人： Shuji Moriya ,  Masahiro Ogasawara ,  Jun Yashiro ,  Yoshifumi Tahara ,  Satoru Kawakami ,  Susumu Tanaka

发明人： Shuji Moriya ,  Masahiro Ogasawara ,  Jun Yashiro ,  Yoshifumi Tahara ,  Satoru Kawakami ,  Susumu Tanaka

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/505 ,  H01J37/32 ,  C23C16/00

CPC分类号： C23C16/45568 ,  C23C16/4401 ,  C23C16/4586 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32706 ,  H01J2237/022 ,  H01J2237/184

摘要： A plasma process system for producing gas plasma in an air-tight chamber by high frequency power to process a substrate with the gas plasma comprising a lower electrode on which the substrate to be plasma-processed is mounted, an upper electrode arranged above the lower electrode, a plasma generator circuit for generating plasma between the upper and the lower electrode, a power source for supplying high frequency power to the plasma generator circuit, and bias generator for generating negative voltage in the upper or lower electrode when high frequency power is supplied from the power source to the upper or lower electrode, wherein the plasma generator circuit includes transformer for supplying a part of high frequency power, which is supplied from the power source, to the bias generator.

摘要翻译： 一种用于通过高频功率在气密室中产生气体等离子体的等离子体处理系统，其中包括安装有待等离子体处理的衬底的下电极的气体等离子体处理衬底;布置在下电极上方的上电极 用于在上下电极之间产生等离子体的等离子体发生器电路，用于向等离子体发生器电路提供高频电力的电源，以及当从高电源供应高频电力时在上电极或下电极产生负电压的偏置发生器 电源到上电极或下电极，其中等离子体发生器电路包括用于将从电源提供的一部分高频电力提供给偏置发生器的变压器。

公开(公告)号：US06501082B1

公开(公告)日：2002-12-31

申请号：US09527562

申请日：2000-03-16

申请人： Toshio Goto ,  Masaru Hori ,  Masafumi Ito ,  Nobuo Ishii ,  Satoru Kawakami

发明人： Toshio Goto ,  Masaru Hori ,  Masafumi Ito ,  Nobuo Ishii ,  Satoru Kawakami

IPC分类号： G21K510

CPC分类号： H01J37/32192 ,  H01J37/3233 ,  H01J37/32623

摘要： A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a semi-conductor wafer. In the mass spectrometer, a gas in the vacuum vessel is incorporated, and electrons are added to the particles in the gas. Then the value of negative ions obtained by ionizing the particles, for example specific radicals, is measured. Once measured, the information is forwarded to a controller that may optimize the plasma deposition method.

摘要翻译： 提供了包括真空容器的受控等离子体沉积系统和方法。 将电子加入质谱仪连接到用于对半导体晶片进行气体处理的真空容器。 在质谱仪中，并入真空容器中的气体，并将电子加到气体中的颗粒中。 然后测量通过电离粒子，例如特定基团获得的负离子的值。 一旦测量，信息被转发到可优化等离子体沉积方法的控制器。