Electrostatic Discharge Protection Element and Electrostatic Discharge Protection Chip and Method of Producing the Same
    1.
    发明申请
    Electrostatic Discharge Protection Element and Electrostatic Discharge Protection Chip and Method of Producing the Same 有权
    静电放电保护元件和静电放电保护芯片及其制造方法

    公开(公告)号:US20120319137A1

    公开(公告)日:2012-12-20

    申请号:US13599636

    申请日:2012-08-30

    摘要: An electrostatic discharge (ESD) protection element includes a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.

    摘要翻译: 静电放电(ESD)保护元件包括集电区域,第一阻挡区域,半导体区域,第二阻挡区域和发射极区域。 集电区具有第一导电类型。 第一屏障区域与集电区域相邻,具有第二导电类型。 半导体区域与第一屏障区域相邻并且是本征半导体区域,或者具有低于第一阻挡区域的掺杂剂浓度的第一或第二导电类型和掺杂剂浓度。 第二阻挡区域与半导体区域相邻并且具有比半导体区域更高的第二导电类型和更高的掺杂剂浓度。 发射极区域与第二阻挡区域相邻并且具有第一导电类型。

    Electrostatic Discharge Protection Element and Electrostatic Discharge Protection Chip and Method of Producing the Same
    2.
    发明申请
    Electrostatic Discharge Protection Element and Electrostatic Discharge Protection Chip and Method of Producing the Same 有权
    静电放电保护元件和静电放电保护芯片及其制造方法

    公开(公告)号:US20110026174A1

    公开(公告)日:2011-02-03

    申请号:US12533919

    申请日:2009-07-31

    摘要: An electrostatic discharge (ESD) protection element is described, the ESD protection element including a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.

    摘要翻译: 描述了静电放电(ESD)保护元件,ESD保护元件包括集电极区域,第一阻挡区域,半导体区域,第二阻挡区域和发射极区域。 集电区具有第一导电类型。 第一屏障区域与集电区域相邻,具有第二导电类型。 半导体区域与第一屏障区域相邻并且是本征半导体区域,或者具有低于第一阻挡区域的掺杂剂浓度的第一或第二导电类型和掺杂剂浓度。 第二阻挡区域与半导体区域相邻并且具有比半导体区域更高的第二导电类型和更高的掺杂剂浓度。 发射极区域与第二阻挡区域相邻并且具有第一导电类型。

    Electrostatic discharge protection element and electrostatic discharge protection chip and method of producing the same
    4.
    发明授权
    Electrostatic discharge protection element and electrostatic discharge protection chip and method of producing the same 有权
    静电放电保护元件及静电放电保护芯片及其制造方法

    公开(公告)号:US08270131B2

    公开(公告)日:2012-09-18

    申请号:US12533919

    申请日:2009-07-31

    IPC分类号: H02H9/00

    摘要: An electrostatic discharge (ESD) protection element is described, the ESD protection element including a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.

    摘要翻译: 描述了静电放电(ESD)保护元件,ESD保护元件包括集电极区域,第一阻挡区域,半导体区域,第二阻挡区域和发射极区域。 集电区具有第一导电类型。 第一屏障区域与集电区域相邻,具有第二导电类型。 半导体区域与第一屏障区域相邻并且是本征半导体区域,或者具有低于第一阻挡区域的掺杂剂浓度的第一或第二导电类型和掺杂剂浓度。 第二阻挡区域与半导体区域相邻并且具有比半导体区域更高的第二导电类型和更高的掺杂剂浓度。 发射极区域与第二阻挡区域相邻并且具有第一导电类型。

    Device for clamping and positioning an evaporator boat
    5.
    发明授权
    Device for clamping and positioning an evaporator boat 有权
    用于夹紧和定位蒸发器船的装置

    公开(公告)号:US08168002B2

    公开(公告)日:2012-05-01

    申请号:US11996640

    申请日:2005-07-27

    IPC分类号: C23C16/00

    CPC分类号: C23C14/26

    摘要: The invention relates to a vacuum treatment plant comprising an evaporator (1) for vacuum coating facilities. The evaporator (1) according to the invention comprises a device for guiding a supply line (4) movable in a gripping direction (A) and intended for gripping and positioning an evaporation boat (3) having a base (22) and further comprises two spacers (18, 19) which the movable supply line (4) flexibly connects to the base (22), with the spacers (18, 19) being disposed on one side each with the movable supply line (4) and with the other side on the base (22), thus enabling the first supply line (4) to be forcibly guided, and with the spacers (18, 19) having such a length and configuration between the first supply line (4) and the base (22) that the guidance direction (B) is essentially parallel to the gripping direction (A) at least across a small deflection range of the spacers (18, 19).

    摘要翻译: 本发明涉及一种真空处理设备,其包括用于真空涂装设备的蒸发器(1)。 根据本发明的蒸发器(1)包括用于引导可沿夹紧方向(A)移动并用于夹持和定位具有底座(22)的蒸发舟皿(3)的供应管线(4)的装置,并且还包括两个 可移动供应管线(4)柔性地连接到基座(22)的间隔件(18,19),其中间隔件(18,19)在一侧设置有各自的可动供应管线(4),另一侧 在基座(22)上,从而能够强制地引导第一供应管线(4),并且在第一供应管线(4)和基座(22)之间具有这种长度和结构的间隔件(18,19) 导向方向(B)至少在间隔件(18,19)的小的偏转范围上基本上平行于夹紧方向(A)。

    Electrical filter
    8.
    发明授权
    Electrical filter 有权
    电动过滤器

    公开(公告)号:US07528680B2

    公开(公告)日:2009-05-05

    申请号:US11657397

    申请日:2007-01-24

    IPC分类号: H03H7/00

    CPC分类号: H03H1/0007 H03H7/09

    摘要: An electrical filter has at least four terminals, two inductances and two capacitors. The first inductance is connected between the first terminal and the second terminal, and a second inductance is connected between the third terminal and the fourth terminal. The first capacitance is connected between the first terminal and a reference potential, and the second capacitance is connected between the third terminal and the reference potential. The first inductance and the second inductance form a transformer having a coupling coefficient of a magnitude such that the filter acts as a low-pass filter for differential signals and common mode signals, a cutoff frequency for differential signals being higher than a cutoff frequency for common mode signals.

    摘要翻译: 电滤波器至少有四个端子,两个电感和两个电容。 第一电感连接在第一端子和第二端子之间,第二电感连接在第三端子和第四端子之间。 第一电容连接在第一端子和参考电位之间,第二电容连接在第三端子和参考电位之间。 第一电感和第二电感形成具有大小的耦合系数的变压器,使得滤波器用作差分信号和共模信号的低通滤波器,差分信号的截止频率高于常见的截止频率 模式信号。

    Semiconductor structure with increased breakdown voltage and method for producing the semiconductor structure
    10.
    发明授权
    Semiconductor structure with increased breakdown voltage and method for producing the semiconductor structure 失效
    具有增加的击穿电压的半导体结构和用于制造半导体结构的方法

    公开(公告)号:US07001806B2

    公开(公告)日:2006-02-21

    申请号:US10780276

    申请日:2004-02-17

    IPC分类号: H01L21/8238

    摘要: A semiconductor structure comprises a buried first semiconductor layer of a first doping type, a second semiconductor layer of the first doping type on the buried semiconductor layer, which is less doped than the buried first semiconductor layer, a semiconductor area of a second doping type on the second semiconductor layer, so that a pn junction is formed between the semiconductor area and the second semiconductor layer, and a recess present below the semiconductor area in the buried first semiconductor layer, which comprises a semiconductor material of the first doping type, which can be less doped than the buried first semiconductor layer and has a larger distance to the semiconductor area of the second doping type on the second semiconductor layer, such that the breakdown voltage across the pn junction is higher than if the recess were not provided. Thereby, it is achieved that both a semiconductor structure with a desired breakdown voltage as well as a further semiconductor structure without this recess can be generated in the buried first semiconductor layer with optimized HF properties.

    摘要翻译: 半导体结构包括第一掺杂类型的掩埋的第一半导体层,在掩埋半导体层上的第一掺杂类型的第二半导体层,其比掩埋的第一半导体层掺杂的掺杂少,第二掺杂类型的半导体区域 第二半导体层,使得在半导体区域和第二半导体层之间形成pn结,以及存在于掩埋的第一半导体层中的半导体区域下方的凹部,其包括第一掺杂型半导体材料,其可以 比埋入的第一半导体层的掺杂少,并且在第二半导体层上具有比第二掺杂类型的半导体区域更大的距离,使得跨越pn结的击穿电压高于未设置凹部的击穿电压。 由此,可以在具有优化的HF性质的掩埋的第一半导体层中产生具有期望的击穿电压的半导体结构以及没有该凹槽的另外的半导体结构。