Method of making doped group iii-v compound semiconductor material
    2.
    发明授权
    Method of making doped group iii-v compound semiconductor material 失效
    制备DOPED III-V族化合物半导体材料的方法

    公开(公告)号:US3660312A

    公开(公告)日:1972-05-02

    申请号:US3660312D

    申请日:1960-03-21

    CPC classification number: C30B29/40 C30B11/00 H01L21/00 H01L29/00 Y10S148/107

    Abstract: METHOD OF MAKING GROUP III-V COMPOUND SEMICONDUCTOR HAVING THE REQUISTE IMPURITY LEVEL FOR DIRECT FABRICATION INTO TUNNEL DIODES. IN A REACTION CHAMBER, A HIGH TEMPERATURE ZONE CONTAINING A MIXTURE OF FIRST ELEMENT (E.G. GALLIUM) AND EXCESS DOPING AGENT (E.G. ZINC), AND A LOW TEMPERATURE ZONE CONTAINING EXCESS SECOND ELEMENT (E.G. ARSENIC) ARE PROVIDED. THE HEATING TEMPERATURE IN THE ZONES ARE CONTROLLED SO THAT SUFFICIENT SECOND ELEMENT IS VAPORIZED AND ENOUGH MIXTURE OF FIRST ELEMENT AND DOPING AGENT ARE MAINTAINED ABOVE THE MELTING POINT OF THE COMPOUND TO ASSURE REACTION TO GIVE A STOICHIOMETRIC MELT OF COMPOUND. A TEMPERATURE GRADIENT IS ESTABLISHED THROUGH SAID MELT, AND THE TEMPERATURE OF THE HIGH TEMPERATURE ZONE IS LOWERED WHILE MAINTAINING SAID TEMPERATURE GRADIENT TO FREEZE SAID MELT PROGRESSIVELY FROM ONE END.

Patent Agency Ranking