Semiconductor structure and manufacturing method thereof

    公开(公告)号:US10797007B2

    公开(公告)日:2020-10-06

    申请号:US16201187

    申请日:2018-11-27

    Abstract: The present disclosure provides a semiconductor structure including a first insulation, a second insulation over the first insulation, a third insulation over the second insulation, a first conductor proximal to a boundary between the first insulation and the second insulation, and an electronic device electrically connected to the first conductor and at least partially surrounded by the second insulation. A coefficient of thermal expansion (CTE) of the second insulation is larger than a CTE of the first insulation and larger than a CTE of the third insulation.

Patent Agency Ranking