Electronic devices and methods of controlling power in electronic devices

    公开(公告)号:US12034373B2

    公开(公告)日:2024-07-09

    申请号:US17575249

    申请日:2022-01-13

    Abstract: An electronic device includes a system on chip (SoC) and a power management integrated circuit (PMIC). The SoC includes a plurality of power domains and a dynamic voltage and frequency scaling (DVFS) controller which performs DVFS on the power domains The PMIC includes direct current (DC)-DC converters and a control logic which controls the plurality of DC-DC converters, and each of the DC-DC converters provides a corresponding output voltage to a respective one of the power domains. The control logic designates a target DC-DC converter which provides a target output voltage having a target level as a global DC-DC converter and provides the target output voltage to a power domain corresponding the global DC-DC converter and to at least one first power domain consuming the target output voltage, from among the plurality of power domains, by sharing the target output voltage provided by the global DC-DC converter.

    METHOD OF VERIFYING ERROR OF OPTICAL PROXIMITY CORRECTION MODEL

    公开(公告)号:US20220180503A1

    公开(公告)日:2022-06-09

    申请号:US17384366

    申请日:2021-07-23

    Abstract: A method of fabricating a semiconductor device includes generating a mask based on second layout data obtained by applying an OPC model to first layout data and performing a semiconductor process using the mask on a substrate, obtaining a plurality of pattern images by selecting a plurality of sample patterns from the substrate, selecting sample images corresponding to the sample patterns from each of the first layout data, the second layout data, and simulation data obtained by performing a simulation based on the second layout data, generating a plurality of input images corresponding to the sample patterns by blending the sample images corresponding to the sample patterns, respectively, and generating an error prediction model for the OPC model by training a machine learning model using a data set including the input images and the pattern images.

    HUB DEVICE, MULTI-DEVICE SYSTEM INCLUDING THE HUB DEVICE AND PLURALITY OF DEVICES, AND METHOD OF OPERATING THE SAME

    公开(公告)号:US20200349952A1

    公开(公告)日:2020-11-05

    申请号:US16864635

    申请日:2020-05-01

    Abstract: A hub device, a multi-device system including the hub device, and a method of operating the same may include: converting, by the hub device, received voice input into text; identifying, by the hub device, a device capable of performing an operation corresponding to the text; identifying which device stores a function determination model corresponding to the device capable of performing the operation corresponding to the text, from among the hub device, and a plurality of other devices connected to the hub device; and based on the identified device that stores the function determination model being a device that is different from the hub device, transmitting at least part of the text to the identified device.

    METHOD OF FABRICATING A PHOTOMASK

    公开(公告)号:US20210181617A1

    公开(公告)日:2021-06-17

    申请号:US17030941

    申请日:2020-09-24

    Abstract: The present disclosure relates to a fabrication method of a photomask. The method of fabricating a photomask provides for a layout of patterns to be designed. The layout of patterns may be formed on a wafer on which chips are formed. The layout of patterns are corrected to provide a layout of a photoresist pattern serving as an etching mask for forming the patterns on the wafer while generating a flare map of the patterns. An optical proximity correction (OPC) may be performed at a chip level on the corrected layout of patterns to perform a secondary correction of the layout of patterns. A second OPC may be performed at a level of a shot which includes a plurality of ones of the chips by reflecting the flare map on the second corrected layout of patterns to a third corrected layout of patterns.

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