SEMICONDUCTOR PACKAGE
    4.
    发明申请

    公开(公告)号:US20220302002A1

    公开(公告)日:2022-09-22

    申请号:US17498893

    申请日:2021-10-12

    摘要: A semiconductor package includes a redistribution substrate having first and second surfaces opposing one another, a first semiconductor chip on the first surface of the redistribution substrate, a passive device and a metal post on the second surface of the redistribution substrate and electrically connected to the redistribution pattern, a second encapsulant encapsulating at least side surfaces of the passive device and the metal post, a second insulating layer on a lower surface of the metal post and a lower surface of the second encapsulant, and having an opening exposing at least a portion of the lower surface of the metal post, and a connection bump filling the opening of the second insulating layer and in direct contact with the lower surface of the exposed metal post, wherein the metal post has a height greater than a height of each of the redistribution pattern and the redistribution via.

    PACKAGED INTEGRATED CIRCUIT HAVING ENHANCED ELECTRICAL INTERCONNECTS THEREIN

    公开(公告)号:US20240071894A1

    公开(公告)日:2024-02-29

    申请号:US18335336

    申请日:2023-06-15

    IPC分类号: H01L23/498

    摘要: A packaged integrated circuit includes a redistribution layer having a plurality of electrically conductive vias extending at least partially therethrough, and a plurality of lower pads electrically connected to corresponding ones of the plurality of electrically conductive vias. A semiconductor chip is provided on the redistribution layer, and external connection terminals are provided, which electrically contact corresponding ones of the plurality of lower pads within the redistribution layer. Each of the plurality of lower pads includes: (i) a lower under-bump metallization (UBM) layer in contact with a corresponding external connection terminal, and (ii) an upper UBM layer extending on and contacting the lower UBM layer. In addition, an upper surface of the lower UBM layer has a greater lateral width dimension relative to an upper surface of the upper UBM layer, which contacts a corresponding electrically conductive via.