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公开(公告)号：US11905204B2
公开(公告)日：2024-02-20
申请号：US16171516
申请日：2018-10-26
发明人： Wook-Tae Kim , In-Gi Kim , Ji-Won Lee , Chang-Soo Lee , Hyung-jin Lee , Gyu-Ha Jo , Yong-Hyun Cho
CPC分类号： C03C17/42 , C03C17/002 , C03C17/02 , C03C17/25 , C03C17/30 , C03C2203/52 , C03C2204/08 , C03C2217/213 , C03C2217/285 , C03C2217/77 , C03C2217/78 , C03C2218/112 , C03C2218/32 , G06F3/041
摘要： According to an embodiment, a cover glass includes a glass plate forming at least a portion of an electronic device, and a first coat layer deposited on a surface of the glass plate, the first coat layer at least partially including a network structure. The first coat layer includes silicon (Si), oxygen (O), and at least one impurity, and such that Si—O bonds are 80% or more by weight of the first coat layer. A polysilazane-applied coat is laid over one surface of the reinforced glass plate, providing an elegant haze glass cover.
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公开(公告)号：US10795263B2
公开(公告)日：2020-10-06
申请号：US15986901
申请日：2018-05-23
发明人： Jung-Min Oh , Mi-Hyun Park , Hyo-San Lee , Ji-Hoon Jeong , Yong-Sun Ko , In-Gi Kim , Na-Rim Kim , Sang-Tae Kim , Seong-Min Kim , Kyong-Ho Lee
IPC分类号： G03F7/42 , H01L21/8238 , H01L21/266 , H01L29/16 , H01L21/311 , G03F7/039
摘要： A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
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公开(公告)号：US11087996B2
公开(公告)日：2021-08-10
申请号：US16371461
申请日：2019-04-01
发明人： Seung-Min Shin , Seok-Hoon Kim , Young-Hoo Kim , In-Gi Kim , Tae-Hong Kim , Sung-Hyun Park , Jin-Woo Lee , Ji-Hoon Cha , Yong-Jun Choi
IPC分类号： H01L21/67 , H01L21/02 , H01J37/32 , G02B27/09 , B23K26/352 , B08B7/00 , H01L29/66 , H01L27/11556 , H01L27/11582
摘要： A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.
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公开(公告)号：US11742221B2
公开(公告)日：2023-08-29
申请号：US17376369
申请日：2021-07-15
发明人： Seung-Min Shin , Seok-Hoon Kim , Young-Hoo Kim , In-Gi Kim , Tae-Hong Kim , Sung-Hyun Park , Jin-Woo Lee , Ji-Hoon Cha , Yong-Jun Choi
IPC分类号： H01L21/67 , H01L21/02 , H01J37/32 , G02B27/09 , B23K26/352 , B08B7/00 , H01L29/66 , H10B41/27 , H10B43/27
CPC分类号： H01L21/67034 , B08B7/0042 , B23K26/352 , G02B27/0955 , H01J37/3244 , H01J37/32568 , H01L21/02098 , H01J2237/335 , H01L29/66545 , H01L29/66795 , H10B41/27 , H10B43/27
摘要： A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.
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公开(公告)号：US09772296B2
公开(公告)日：2017-09-26
申请号：US14460814
申请日：2014-08-15
发明人： Byung-Bok Kang , Seok-Min Kang , Bon-Ok Koo , Kyoung-Hwan Kim , Myung-Woo Kim , In-Gi Kim , Hyun-Chul Kim , Sung-Ki Roh , Gyung-Jin Min , Eun-Seok Lee , Jin-Suk Hong
CPC分类号： G01N21/9501 , G01N21/8851 , G01N2021/8887
摘要： In a method of inspecting a surface of a substrate, a first surface image of the substrate before loaded into a process chamber may be obtained. The first surface image may be processed to detect a defect on the surface of the substrate. Thus, the surfaces of all of the substrate may be inspected during a process may be performed without transferring the substrates.
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公开(公告)号：US10025192B2
公开(公告)日：2018-07-17
申请号：US15084536
申请日：2016-03-30
发明人： Jung-Min Oh , Mi-Hyun Park , Hyo-San Lee , Ji-Hoon Jeong , Yong-Sun Ko , In-Gi Kim , Na-Rim Kim , Sang-Tae Kim , Seong-Min Kim , Kyong-Ho Lee
IPC分类号： G03F7/42 , H01L21/8238 , H01L21/266 , H01L29/16 , H01L21/311
摘要： A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
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7.发明授权Cleaning solution composition and method of cleaning semiconductor device using the same 有权清洗液组合物及使用其的半导体装置的清洗方法公开(公告)号：US09394509B2
公开(公告)日：2016-07-19
申请号：US14542973
申请日：2014-11-17
发明人： Sang-Won Bae , Yong-Sun Ko , Seok-Hoon Kim , In-Gi Kim , Jung-Min Oh , Kun-Tack Lee , Hyo-San Lee , Ji-Hoon Jeong , Yong-Jhin Cho
CPC分类号： C11D11/0047 , C11D7/08 , C11D7/10 , C11D7/5022 , H01L21/02063 , H01L21/02068 , H01L21/02071
摘要： A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2−), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.
摘要翻译： 清洗液组合物包括金属氟化物不溶解的有机溶剂，至少一种产生氟化氢的氟化物（HF2-）和去离子水，其中可以以1.5重量％以下的浓度包含去离子水 基于清洁溶液组合物的总重量。
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8.发明申请CLEANING SOLUTION COMPOSITION AND METHOD OF CLEANING SEMICONDUCTOR DEVICE USING THE SAME 有权清洁溶液组合物及其清洗使用其的半导体器件的方法公开(公告)号：US20150299629A1
公开(公告)日：2015-10-22
申请号：US14542973
申请日：2014-11-17
发明人： Sang-Won Bae , Yong-Sun Ko , Seok-Hoon Kim , In-Gi Kim , Jung-Min Oh , Kun-Tack Lee , Hyo-San Lee , Ji-Hoon Jeong , Yong-Jhin Cho
CPC分类号： C11D11/0047 , C11D7/08 , C11D7/10 , C11D7/5022 , H01L21/02063 , H01L21/02068 , H01L21/02071
摘要： A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2−), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.
摘要翻译： 清洗液组合物包括金属氟化物不溶解的有机溶剂，至少一种产生氟化氢的氟化物（HF2-）和去离子水，其中可以以1.5重量％以下的浓度包含去离子水 基于清洁溶液组合物的总重量。
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