Method of fabricating a semiconductor package having redistribution patterns including seed patterns and seed layers

    公开(公告)号:US11705341B2

    公开(公告)日:2023-07-18

    申请号:US17741751

    申请日:2022-05-11

    Abstract: Disclosed are redistribution substrates and semiconductor packages including the same. For example, a redistribution substrate including a dielectric pattern, and a first redistribution pattern in the dielectric pattern is provided. The first redistribution pattern may include: a first via part having a first via seed pattern and a first via conductive pattern on the first via seed pattern, and a first wiring part having a first wiring seed pattern and a first wiring conductive pattern, the first wiring part being disposed on the first via part and having a horizontal width that is different from a horizontal width of the first via part. Additionally, the first wiring seed pattern may cover a bottom surface and a sidewall surface of the first wiring conductive pattern, and the first via conductive pattern is directly connected to the first wiring conductive pattern.

    Method of manufacturing fan-out wafer level package

    公开(公告)号:US11056461B2

    公开(公告)日:2021-07-06

    申请号:US16748138

    申请日:2020-01-21

    Abstract: Provided is a method of manufacturing a semiconductor package including providing a carrier substrate, providing sacrificial layer on the carrier substrate, the sacrificial layer including a first sacrificial layer and a second sacrificial layer, providing a redistribution wiring layer on the sacrificial layer, providing a plurality of semiconductor chips on the redistribution wiring layer, providing a mold layer provided on the sacrificial layer, the redistribution wiring layer, and the plurality of semiconductor chips, detaching the first sacrificial layer from the second sacrificial layer, and dicing the second sacrificial layer, the redistribution wiring layer, and the mold layer, wherein a diameters of the first sacrificial layer and the second sacrificial layer are respectively less than a diameter of the carrier substrate, and a diameter of the mold layer is greater than the diameter of the redistribution wiring layer and less than the diameter of the first sacrificial layer.

    Semiconductor package and method of fabricating the same

    公开(公告)号:US12230556B2

    公开(公告)日:2025-02-18

    申请号:US18588699

    申请日:2024-02-27

    Abstract: Disclosed are semiconductor packages and their fabricating methods. The semiconductor package comprises a redistribution substrate, a semiconductor chip on a top surface of the redistribution substrate, and a solder terminal on a bottom surface of the redistribution substrate. The redistribution substrate includes an under-bump pattern in contact with the solder terminal, a dielectric layer on a sidewall of the under-bump pattern, an under-bump seed pattern between the dielectric layer and the sidewall of the under-bump pattern, and a redistribution pattern on the under-bump pattern. The under-bump pattern has central and edge regions. A first top surface at the edge region of the under-bump pattern is at a level higher than that of a second top surface at the central region of the under-bump pattern. An angle between the bottom surface and the sidewall of the under-bump pattern is in a range of 110° to 140°.

    SEMICONDUCTOR PACKAGE
    7.
    发明公开

    公开(公告)号:US20240096831A1

    公开(公告)日:2024-03-21

    申请号:US18455943

    申请日:2023-08-25

    Abstract: A semiconductor package includes: a first semiconductor chip including a first pad on a first substrate, and a first insulating layer at least partially surrounding the first pad; and a second semiconductor chip including a second pad below a second substrate and contacting the first pad, and a second insulating layer at least partially surrounding the second pad and contacting the first insulating layer. The first pad includes a first surface contacting the second pad and a second surface opposite the first surface, and an inclined side surface between the first surface and the second surface. The inclined side surface includes a first side surface and a second side surface, facing each other and inclined at a first obtuse angle and a second obtuse angle with respect to the second surface, respectively. Each of the first and second obtuse angles is about 100° to about 130°.

    Semiconductor package
    8.
    发明授权

    公开(公告)号:US11804427B2

    公开(公告)日:2023-10-31

    申请号:US17177305

    申请日:2021-02-17

    Abstract: A semiconductor package may include a redistribution substrate, a connection terminal, and a semiconductor chip sequentially stacked. The redistribution substrate may include an insulating layer, a plurality of redistribution patterns, which are vertically stacked in the insulating layer, and each of which includes interconnection and via portions, and a bonding pad on the interconnection portion of the topmost redistribution pattern. The topmost redistribution pattern and the bonding pad may include different metallic materials. The bonding pad may have first and second surfaces opposite to each other. The first surface of the bonding pad may be in contact with a top surface of the interconnection portion of the topmost redistribution pattern. A portion of the second surface of the bonding pad may be in contact with the connection terminal. The insulating layer may be extended to be in contact with the remaining portion of the second surface.

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