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公开(公告)号：US10937838B2
公开(公告)日：2021-03-02
申请号：US16530213
申请日：2019-08-02
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Seock Kim , Jong-Hee Park , Bong-Won Lee , Seung-Bae Kang , Sang-Gab Kim , Jeong-Min Park , Hyun-Eok Shin
Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.
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公开(公告)号：US09236401B2
公开(公告)日：2016-01-12
申请号：US14195051
申请日：2014-03-03
Applicant: Samsung Display Co., Ltd.
Inventor： Jae-Neung Kim , Yu-Gwang Jeong , Sang-Gab Kim , Su-Bin Bae , Shin-Il Choi
IPC: G02F1/1343 , G02F1/1362 , H01L27/12
CPC classification number: H01L27/1225 , G02F1/134309 , G02F1/136213 , G02F2201/50 , H01L27/1248 , H01L27/1255 , H01L27/1259
Abstract: A display apparatus includes: a substrate defining transistor and wiring areas; a thin film transistor in the transistor area and including a gate electrode, an active layer, and source and drain electrodes; an etch prevention layer in the transistor area, absent in the wiring area and covering the active layer, and first and second contact holes defined in the etch prevention layer and through which the active layer is electrically coupled to the source and drain electrodes; a first wiring layer in the wiring area; a first insulating layer which covers the gate electrode and the first wiring layer, and a third contact hole defined in the first insulating layer in the wiring area and exposing the first wiring layer; and a second wiring layer on the first insulating layer and in the wiring area, and electrically coupled to the first wiring layer via the third contact hole.
Abstract translation: 显示装置包括：限定晶体管和布线区域的基板; 晶体管区域中的薄膜晶体管，并且包括栅电极，有源层以及源极和漏极; 晶体管区域中的防蚀层，在布线区域中不存在并覆盖有源层，以及限定在防蚀层中的第一和第二接触孔，有源层电耦合到源电极和漏电极; 布线区域中的第一布线层; 覆盖所述栅电极和所述第一布线层的第一绝缘层和限定在所述布线区域中的所述第一绝缘层中的第三接触孔，并暴露所述第一布线层; 以及在所述第一绝缘层和所述布线区域中的第二布线层，并且经由所述第三接触孔电耦合到所述第一布线层。
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公开(公告)号：US09064750B2
公开(公告)日：2015-06-23
申请号：US13869697
申请日：2013-04-24
Applicant: Samsung Display Co., LTD.
Inventor： Yu-Gwang Jeong , Ji-Young Park , Shin-Il Choi , Sang-Gab Kim
IPC: H01L29/786 , H01L27/13 , G02F1/1345 , H01L27/12 , G02F1/1337 , H01L33/02
CPC classification number: H01L27/124 , G02F1/133707 , H01L27/1248 , H01L27/1288
Abstract: A method of manufacturing a display substrate includes forming a gate insulation layer on the base substrate on which a gate metal pattern, forming a data metal pattern on the gate insulation layer, sequentially forming a insulation layer and an organic layer on the base substrate on which the data metal pattern is formed, partially exposing the organic layer, developing the organic layer to partially remove the organic layer on the data metal pattern and to expose at least a portion of the protecting layer on the gate metal pattern, forming a common electrode on the organic layer, forming a pixel electrode on the on the organic layer, and forming an insulation layer between the pixel electrode and the common electrode. An etching degree of a data metal may be controlled by controlling a thickness of a remained organic layer to reduce a damage of the data metal.
Abstract translation: 一种制造显示基板的方法包括在基底基板上形成栅极绝缘层，栅基金属图案在栅绝缘层上形成数据金属图案，在基底基板上依次形成绝缘层和有机层， 形成数据金属图案，部分地暴露有机层，显影有机层以部分地去除数据金属图案上的有机层，并暴露栅极金属图案上的保护层的至少一部分，形成公共电极 有机层，在有机层上形成像素电极，在像素电极和公共电极之间形成绝缘层。 可以通过控制剩余的有机层的厚度来减少数据金属的损伤来控制数据金属的蚀刻程度。
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公开(公告)号：US09484362B2
公开(公告)日：2016-11-01
申请号：US14262761
申请日：2014-04-27
Applicant: Samsung Display Co., LTD.
Inventor： Dae-Ho Kim , Hyun-Jae Na , Jae-Neung Kim , Yu-Gwang Jeong , Myoung-Geun Cha , Sang-Gab Kim
IPC: H01L29/04 , H01L27/12 , H01L29/417
CPC classification number: H01L27/1225 , H01L27/1244 , H01L27/1248 , H01L29/41733
Abstract: A display substrate includes an active pattern, a gate electrode, a first insulation layer and a pixel electrode. The active pattern is disposed on a base substrate. The active pattern includes a metal oxide semiconductor. The gate electrode overlaps the active pattern. The first insulation layer covers the gate electrode and the active pattern, and a contact hole is defined in the first insulation layer. The pixel electrode is electrically connected to the active pattern via the contact hole penetrating the first insulation layer. A first angle defined by a bottom surface of the first insulation layer and a sidewall of the first insulation layer exposed by the contact hole is between about 30° and about 50°.
Abstract translation: 显示基板包括有源图案，栅电极，第一绝缘层和像素电极。 有源图案设置在基底基板上。 有源图案包括金属氧化物半导体。 栅电极与有源图案重叠。 第一绝缘层覆盖栅电极和有源图案，并且在第一绝缘层中限定接触孔。 像素电极经由穿过第一绝缘层的接触孔电连接到有源图案。 由第一绝缘层的底表面和由接触孔露出的第一绝缘层的侧壁限定的第一角度在约30°至约50°之间。
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公开(公告)号：US08975145B2
公开(公告)日：2015-03-10
申请号：US14168971
申请日：2014-01-30
Applicant: Samsung Display Co., Ltd.
Inventor： Yu-Gwang Jeong , Young-Wook Lee , Sang-Gab Kim , Woo-Geun Lee , Min-Seok Oh , Jang-Soo Kim , Kap-Soo Yoon , Shin-Il Choi , Hong-Kee Chin , Seung-Ha Choi , Seung-Hwan Shim , Sung-Hoon Yang , Ki-Hun Jeong
CPC classification number: H01L27/127 , H01L27/1214 , H01L27/1259 , H01L27/1288 , H01L29/66765
Abstract: Embodiments of the present invention relate to a thin film transistor and a manufacturing method of a display panel, and include forming a gate line including a gate electrode on a substrate, forming a gate insulating layer on the gate electrode, forming an intrinsic semiconductor on the gate insulating layer, forming an extrinsic semiconductor on the intrinsic semiconductor, forming a data line including a source electrode and a drain electrode on the extrinsic semiconductor, and plasma-treating a portion of the extrinsic semiconductor between the source electrode and the drain electrode to form a protection member and ohmic contacts on respective sides of the protection member. Accordingly, the process for etching the extrinsic semiconductor and forming an inorganic insulating layer for protecting the intrinsic semiconductor may be omitted such that the manufacturing process of the display panel may be simplified, manufacturing cost may be reduced, and productivity may be improved.
Abstract translation: 本发明的实施例涉及薄膜晶体管和显示面板的制造方法，包括在基板上形成包括栅电极的栅极线，在栅电极上形成栅绝缘层，在栅电极上形成本征半导体 栅极绝缘层，在本征半导体上形成非本征半导体，在外部半导体上形成包括源电极和漏电极的数据线，以及对源电极和漏极之间的非本征半导体的一部分进行等离子体处理，以形成 保护构件和保护构件的相应侧上的欧姆接触。 因此，可以省略用于蚀刻外部半导体和形成用于保护本征半导体的无机绝缘层的工艺，从而可以简化显示面板的制造工艺，可以降低制造成本，并且可以提高生产率。
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Patent Agency Ranking
公开(公告)号：US09406630B2
公开(公告)日：2016-08-02
申请号：US14579542
申请日：2014-12-22
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Joo-Han Kim , Ki-Yong Song , Dong-Ju Yang , Hee-Joon Kim , Yeo-Geon Yoon , Sung-Hen Cho , Chang-Hoon Kim , Jae-Hong Kim , Yu-Gwang Jeong , Ki-Yeup Lee , Sang-Gab Kim , Yun-Jong Yeo , Shin-Il Choi , Ji-Young Park
IPC: H01L23/00 , G02F1/1362 , H01L27/12
CPC classification number: H01L24/05 , G02F1/136227 , H01L27/12 , H01L27/1214 , H01L27/124 , H01L2224/04042 , H01L2924/14 , H01L2924/1426 , H01L2924/00
Abstract: A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.
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公开(公告)号：US20150070643A1
公开(公告)日：2015-03-12
申请号：US14195051
申请日：2014-03-03
Applicant: Samsung Display Co., Ltd.
Inventor： Jae-Neung Kim , Yu-Gwang Jeong , Sang-Gab Kim , Su-Bin Bae , Shin-Il Choi
IPC: H01L27/12 , G02F1/1343
CPC classification number: H01L27/1225 , G02F1/134309 , G02F1/136213 , G02F2201/50 , H01L27/1248 , H01L27/1255 , H01L27/1259
Abstract: A display apparatus includes: a substrate defining transistor and wiring areas; a thin film transistor in the transistor area and including a gate electrode, an active layer, and source and drain electrodes; an etch prevention layer in the transistor area, absent in the wiring area and covering the active layer, and first and second contact holes defined in the etch prevention layer and through which the active layer is electrically coupled to the source and drain electrodes; a first wiring layer in the wiring area; a first insulating layer which covers the gate electrode and the first wiring layer, and a third contact hole defined in the first insulating layer in the wiring area and exposing the first wiring layer; and a second wiring layer on the first insulating layer and in the wiring area, and electrically coupled to the first wiring layer via the third contact hole.
Abstract translation: 显示装置包括：限定晶体管和布线区域的基板; 晶体管区域中的薄膜晶体管，并且包括栅电极，有源层以及源极和漏极; 晶体管区域中的防蚀层，在布线区域中不存在并覆盖有源层，以及限定在防蚀层中的第一和第二接触孔，有源层电耦合到源电极和漏电极; 布线区域中的第一布线层; 覆盖所述栅电极和所述第一布线层的第一绝缘层和限定在所述布线区域中的所述第一绝缘层中的第三接触孔，并暴露所述第一布线层; 以及在所述第一绝缘层和所述布线区域中的第二布线层，并且经由所述第三接触孔电耦合到所述第一布线层。
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公开(公告)号：US12080721B2
公开(公告)日：2024-09-03
申请号：US17264255
申请日：2019-03-29
Applicant: Samsung Display Co., LTD.
Inventor： Hyun-Eok Shin , Hong-Sick Park , Sangwoo Sohn , Sang-Gab Kim , Gyungmin Baek , Sang-Won Shin
IPC: H01L27/12 , H01L27/32 , H10K59/131
CPC classification number: H01L27/124 , H01L27/1259 , H10K59/131 , H01L27/1218
Abstract: A display substrate may include a substrate and a wiring on the substrate. The wiring may include a metal oxide layer including at least one oxide selected from tantalum (Ta), niobium (Nb), and titanium (Ti), and a metal layer on the metal oxide layer and including copper (Cu), and a thickness of the metal oxide layer may be in a range of about 30 angstroms (Å) to about 50 Å.
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公开(公告)号：US10381418B2
公开(公告)日：2019-08-13
申请号：US15678640
申请日：2017-08-16
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Seock Kim , Jong-Hee Park , Bong-Won Lee , Seung-Bae Kang , Sang-Gab Kim , Jeong-Min Park , Hyun-Eok Shin
Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.
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公开(公告)号：US09443879B2
公开(公告)日：2016-09-13
申请号：US14455113
申请日：2014-08-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Yu-Gwang Jeong , Shin-Il Choi , Su-Bin Bae , Dae-Ho Kim , Sang-Gab Kim , Jae-Neung Kim
IPC: H01L27/12 , H01L21/311 , H01L21/768
CPC classification number: H01L27/124 , H01L21/31116 , H01L21/76804 , H01L21/76832 , H01L27/1259
Abstract: A display substrate includes a base substrate, a common line on the base substrate, a first insulation layer covering the common line and having a first insulating material, a conductive pattern on the first insulation layer and including a source electrode and a drain electrode, a second insulation layer covering the drain electrode and the common line, and including a lower second insulation layer having a second insulating material and an upper second insulation layer having the first insulating material, a first electrode electrically connected to the drain electrode through a first contact hole in the second insulation layer, and a second electrode electrically connected to the common line through a second contact hole in the first and second insulation layers. The upper and lower second insulation layers on the drain electrode have a first hole and a second hole respectively that form the first contact hole.
Abstract translation: 显示基板包括基底基板，基底基板上的公共线，覆盖公共线的第一绝缘层，并具有第一绝缘材料，第一绝缘层上的导电图案，包括源电极和漏电极， 覆盖漏电极和公共线的第二绝缘层，并且包括具有第二绝缘材料的下第二绝缘层和具有第一绝缘材料的上第二绝缘层，第一电极，通过第一接触孔电连接到漏电极 以及通过第一绝缘层和第二绝缘层中的第二接触孔与公共线电连接的第二电极。 漏电极上的上，下第二绝缘层分别具有形成第一接触孔的第一孔和第二孔。
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