公开(公告)号：US10355025B2

公开(公告)日：2019-07-16

申请号：US15813758

申请日：2017-11-15

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Wook Lee ,  Woo-Geun Lee ,  Ki-Won Kim ,  Hyun-Jung Lee ,  Ji-Soo Oh

IPC: H01L27/12 ,  H01L29/786 ,  H01L21/768

Abstract: A substrate including gate wirings including a gate line and a gate electrode disposed on a substrate, an oxide semiconductor layer pattern overlapping the gate electrode, a gate insulating layer disposed between the gate wirings and the oxide semiconductor layer pattern, data wirings including a data line crossing the gate line, a source electrode connected to one side of the oxide semiconductor layer pattern, and a drain electrode connected to another side of the oxide semiconductor layer, and an insulating pattern including a first portion which is disposed between the gate line and the data line and at least partially overlaps with both of the gate line and the data line.

公开(公告)号：US09520419B2

公开(公告)日：2016-12-13

申请号：US14793183

申请日：2015-07-07

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Wook Lee ,  Woo-Geun Lee ,  Ki-Won Kim ,  Hyun-Jung Lee ,  Ji-Soo Oh

IPC: H01L27/12 ,  H01L29/786

CPC classification number: H01L27/124 ,  H01L21/76834 ,  H01L27/1225 ,  H01L27/1255 ,  H01L27/1262 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/7869 ,  H01L29/78693

Abstract: A method of manufacturing a thin film transistor (TFT) array substrate includes forming a gate line and a gate electrode on a substrate, forming a gate-insulating layer and an oxide semiconductor layer on the gate line and the gate electrode, forming etch stop patterns at a thin-film transistor area and an area where the gate line and the data line overlap each other, forming a data conductor on the oxide semiconductor layer and the etch stop patterns, the data conductor comprising a source electrode and a drain electrode that constitute a TFT together with the gate electrode, and forming a data line extending in a direction intersecting the gate line.

Abstract translation: 制造薄膜晶体管（TFT）阵列基板的方法包括在基板上形成栅极线和栅电极，在栅极线和栅电极上形成栅极绝缘层和氧化物半导体层，形成蚀刻停止图案 在薄膜晶体管区域和栅极线和数据线彼此重叠的区域中，在氧化物半导体层和蚀刻停止图案上形成数据导体，数据导体包括源电极和漏极，构成 TFT与栅极电极一起形成，并且在与栅极线相交的方向上形成数据线。

公开(公告)号：US09502445B2

公开(公告)日：2016-11-22

申请号：US14809372

申请日：2015-07-27

Applicant: Samsung Display Co., Ltd.

Inventor： Je-Hun Lee ,  Ki-Won Kim ,  Do-Hyun Kim ,  Woo-Geun Lee ,  Kap-Soo Yoon

IPC: H01L29/10 ,  H01L27/12 ,  H01L29/51 ,  H01L29/786 ,  H01L29/45 ,  H01L23/532 ,  H01L29/49 ,  H01L29/66 ,  H01L21/02

CPC classification number: H01L27/1225 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02554 ,  H01L21/02565 ,  H01L23/53238 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1262 ,  H01L29/45 ,  H01L29/4908 ,  H01L29/513 ,  H01L29/518 ,  H01L29/66969 ,  H01L29/78603 ,  H01L29/7869 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A TFT array substrate includes a semiconductive oxide layer disposed on an insulating substrate and including a channel portion, a gate electrode overlapping the semiconductive oxide layer, a gate insulating layer interposed between the semiconductive oxide layer and the gate electrode, and a passivation layer disposed on the semiconductive oxide layer and the gate electrode. At least one of the gate insulating layer and the passivation layer includes an oxynitride layer, and the oxynitride layer has a higher concentration of oxygen than that of nitrogen in a location of the oxynitride layer closer to the semiconductive oxide layer.

公开(公告)号：US09443877B2

公开(公告)日：2016-09-13

申请号：US14799060

申请日：2015-07-14

Applicant: Samsung Display Co., Ltd.

Inventor： Pil-Sang Yun ,  Ki-Won Kim ,  Hye-Young Ryu ,  Woo-Geun Lee ,  Seung-Ha Choi ,  Jae-Hyoung Youn ,  Kyoung-Jae Chung ,  Young-Wook Lee ,  Je-Hun Lee ,  Kap-Soo Yoon ,  Do-Hyun Kim ,  Dong-Ju Yang ,  Young-Joo Choi

IPC: H01L29/04 ,  H01L31/036 ,  H01L27/12 ,  H01L21/4757 ,  H01L21/441 ,  H01L21/475 ,  H01L29/786 ,  H01L29/66

CPC classification number: H01L29/41733 ,  H01L21/44 ,  H01L21/441 ,  H01L21/465 ,  H01L21/475 ,  H01L21/47573 ,  H01L21/47635 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869 ,  H01L29/78696

Abstract: A thin film transistor panel includes an insulating substrate, a gate insulating layer disposed on the insulating substrate, an oxide semiconductor layer disposed on the gate insulating layer, an etch stopper disposed on the oxide semiconductor layer, and a source electrode and a drain electrode disposed on the etch stopper.

公开(公告)号：US10896920B2

公开(公告)日：2021-01-19

申请号：US16438385

申请日：2019-06-11

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Wook Lee ,  Woo-Geun Lee ,  Ki-Won Kim ,  Hyun-Jung Lee ,  Ji-Soo Oh

IPC: H01L27/12 ,  H01L29/786 ,  H01L21/768

Abstract: A substrate including a gate line and a gate electrode disposed on a substrate, an oxide semiconductor layer pattern overlapping the gate electrode, a gate insulating layer disposed between the gate electrode and the oxide semiconductor layer pattern, a data line intersecting the gate line, a source electrode electrically connected to the oxide semiconductor layer pattern, a drain electrode electrically connected to the oxide semiconductor layer, the drain electrode spaced apart from the source electrode, and an insulating pattern including a first portion, which is disposed between the gate line and the data line and at least partially overlaps with both of the gate line and the data line.

公开(公告)号：US09825065B2

公开(公告)日：2017-11-21

申请号：US15342756

申请日：2016-11-03

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Wook Lee ,  Woo-Geun Lee ,  Ki-Won Kim ,  Hyun-Jung Lee ,  Ji-Soo Oh

IPC: H01L27/12 ,  H01L29/786 ,  H01L21/768

CPC classification number: H01L27/124 ,  H01L21/76834 ,  H01L27/1225 ,  H01L27/1255 ,  H01L27/1262 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/7869 ,  H01L29/78693

Abstract: A substrate including gate wirings including gate line and a gate electrode disposed on the substrate, a storage line disposed on the same layer as the gate wirings, a gate insulating layer disposed on the gate wirings and the storage line, an oxide semiconductor layer pattern disposed on the gate insulating layer, data wirings including a data line crossing the gate line, a source electrode disposed on one side of the oxide semiconductor layer pattern, and a drain electrode disposed on another side of the oxide semiconductor layer, and an etch stopper including a first etch stopper portion disposed between the storage line and the data line and partially overlapping both the data line and the storage line.

公开(公告)号：US09123597B2

公开(公告)日：2015-09-01

申请号：US14319012

申请日：2014-06-30

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Je-Hun Lee ,  Ki-Won Kim ,  Do-Hyun Kim ,  Woo-Geun Lee ,  Kap-Soo Yoon

IPC: H01L51/40 ,  H01L27/12 ,  H01L29/49 ,  H01L29/786 ,  H01L29/66 ,  H01L21/02

CPC classification number: H01L27/1225 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02554 ,  H01L21/02565 ,  H01L23/53238 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1262 ,  H01L29/45 ,  H01L29/4908 ,  H01L29/513 ,  H01L29/518 ,  H01L29/66969 ,  H01L29/78603 ,  H01L29/7869 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A TFT array substrate includes a semiconductive oxide layer disposed on an insulating substrate and including a channel portion, a gate electrode overlapping the semiconductive oxide layer, a gate insulating layer interposed between the semiconductive oxide layer and the gate electrode, and a passivation layer disposed on the semiconductive oxide layer and the gate electrode. At least one of the gate insulating layer and the passivation layer includes an oxynitride layer, and the oxynitride layer has a higher concentration of oxygen than that of nitrogen in a location of the oxynitride layer closer to the semiconductive oxide layer.

Abstract translation: TFT阵列基板包括设置在绝缘基板上并包括沟道部分的半导体氧化物层，与半导体氧化物层重叠的栅极电极，插入在半导体氧化物层和栅电极之间的栅极绝缘层，以及设置在 半导体氧化物层和栅电极。 栅极绝缘层和钝化层中的至少一个包括氧氮化物层，并且氧氮化物层在氧氮化物层的位置更靠近半导体氧化物层的位置处具有比氮的浓度高的氧氮化物层。

公开(公告)号：US09117917B2

公开(公告)日：2015-08-25

申请号：US13650528

申请日：2012-10-12

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun-Jung Lee ,  Sung-Haeng Cho ,  Woo-Geun Lee ,  Jang-Hoon Ha ,  Hee-Jun Byeon ,  Ji-Yun Hong ,  Ji-Soo Oh

IPC: H01L27/15 ,  H01L29/786

CPC classification number: H01L29/78693 ,  H01L27/1225 ,  H01L29/41733 ,  H01L29/78606 ,  H01L29/7869

Abstract: A Thin Film Transistor (TFT) includes a substrate, a semiconductor layer disposed on the substrate a first source electrode and a first drain electrode spaced apart from each other on the semiconductor layer, a channel area disposed in the semiconductor layer between the first source electrode and the first drain electrode, an etching prevention layer disposed on the channel area, the first source electrode, and the first drain electrode and a second source electrode in contact with the first source electrode, and a second drain electrode in contact with the first drain electrode.

Abstract translation: 薄膜晶体管（TFT）包括衬底，在衬底上设置有在半导体层上彼此间隔开的第一源电极和第一漏电极的半导体层，设置在第一源极之间的半导体层中的沟道区 所述第一漏电极，设置在所述沟道区上的防蚀层，所述第一源电极和所述第一漏电极以及与所述第一源极接触的第二源电极，以及与所述第一漏极接触的第二漏极 电极。

公开(公告)号：US09111805B2

公开(公告)日：2015-08-18

申请号：US14230787

申请日：2014-03-31

Applicant: Samsung Display Co., Ltd.

Inventor： Pil-Sang Yun ,  Ki-Won Kim ,  Hye-Young Ryu ,  Woo-Geun Lee ,  Seung-Ha Choi ,  Jae-Hyoung Youn ,  Kyoung-Jae Chung ,  Young-Wook Lee ,  Je-Hun Lee ,  Kap-Soo Yoon ,  Do-Hyun Kim ,  Dong-Ju Yang ,  Young-Joo Choi

IPC: H01L29/04 ,  H01L31/036 ,  H01L31/0376 ,  H01L31/20 ,  H01L27/12 ,  H01L29/786 ,  H01L29/66

CPC classification number: H01L29/41733 ,  H01L21/44 ,  H01L21/441 ,  H01L21/465 ,  H01L21/475 ,  H01L21/47573 ,  H01L21/47635 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869 ,  H01L29/78696

Abstract: A thin film transistor panel includes an insulating substrate, a gate insulating layer disposed on the insulating substrate, an oxide semiconductor layer disposed on the gate insulating layer, an etch stopper disposed on the oxide semiconductor layer, and a source electrode and a drain electrode disposed on the etch stopper.

Abstract translation: 薄膜晶体管面板包括绝缘基板，设置在绝缘基板上的栅极绝缘层，设置在栅极绝缘层上的氧化物半导体层，设置在氧化物半导体层上的蚀刻停止器，以及设置在源极电极和漏极上的 在蚀刻停止器上。

公开(公告)号：US09105733B2

公开(公告)日：2015-08-11

申请号：US13897879

申请日：2013-05-20

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Wook Lee ,  Woo-Geun Lee ,  Ki-Won Kim ,  Hyun-Jung Lee ,  Ji-Soo Oh

IPC: H01L29/786 ,  H01L27/12

CPC classification number: H01L27/124 ,  H01L21/76834 ,  H01L27/1225 ,  H01L27/1255 ,  H01L27/1262 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/7869 ,  H01L29/78693

Abstract: A thin film transistor (TFT) array substrate and a manufacturing method thereof are provided. The TFT array substrate may include a gate line disposed on a substrate and including a gate line and a gate electrode, an oxide semiconductor layer pattern disposed on the gate electrode, a data line disposed on the oxide semiconductor layer pattern and including a source electrode and a drain electrode of a thin film transistor (TFT) together with the gate electrode, and a data line extending in a direction intersecting the gate line, and etch stop patterns disposed at an area where the TFT is formed between the source/drain electrodes and the oxide semiconductor layer pattern and at an area where the gate line and the data line overlap each other between the gate line and the data line.

Abstract translation: 提供薄膜晶体管（TFT）阵列基板及其制造方法。 TFT阵列基板可以包括设置在基板上的栅极线，包括栅极线和栅电极，设置在栅电极上的氧化物半导体层图案，设置在氧化物半导体层图案上的数据线，并且包括源电极和 薄膜晶体管（TFT）的漏电极和栅极电极以及沿着与栅极线相交的方向延伸的数据线，以及设置在源极/漏极之间形成TFT的区域的蚀刻停止图案，以及 氧化物半导体层图案和栅极线与数据线在栅极线与数据线之间重叠的区域。