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    WEARABLE ELECTRONIC DEVICE
    3.
    发明申请
    WEARABLE ELECTRONIC DEVICE 有权

    公开(公告)号：US20250088792A1

    公开(公告)日：2025-03-13

    申请号：US18958491

    申请日：2024-11-25

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jinyong Kim ,  Jonghwan Kim ,  Taiyong Kim ,  Wonju Seo ,  Myungcheol Lee ,  Yonghoon Lee ,  Jeock Lee

    IPC: H04R1/34 ,  H04R1/02 ,  H04R1/10

    Abstract: Provided is a wearable electronic device including: a housing forming at least a part of an exterior of the wearable electronic device; a nozzle extending from a part of the housing, wherein the nozzle includes a first hole at a first position and a second hole at a second position; an acoustic path inside the nozzle; a grill inside the nozzle, wherein the grill includes a first latch passing through the first hole such that a part thereof protrudes in a first direction and a second latch passing through the second hole such that a part thereof protrudes in a second direction; and an ear tip at least partially surrounding an outer surface of the nozzle, wherein the ear tip includes a first groove detachably coupled to a part of the first latch and a second groove detachably coupled to a part of the second latch.

    Spectrometer, metrology system, and semiconductor inspection method
    6.
    发明授权
    Spectrometer, metrology system, and semiconductor inspection method 有权

    公开(公告)号：US12188818B2

    公开(公告)日：2025-01-07

    申请号：US17827051

    申请日：2022-05-27

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Hidaka Yasuhiro ,  Jinyong Kim

    IPC: G01J3/02 ,  G01J3/28 ,  H01L21/66

    Abstract: A spectrometer and a metrology system capable of improving spectral performance are provided. The spectrometer includes a collimator lens, a focusing lens, and a spatial light modulator (SLM), wherein light reflected by the SLM is output from an output slit through the focusing lens and a dispersive optical element, and on a second plane perpendicular to a first plane including optical paths of pieces of light dispersed at different angles, an incident slit, the output slit, and a reflective plane have a conjugate relationship.

    SEMICONDUCTOR MEASUREMENT APPARATUS
    7.
    发明公开
    SEMICONDUCTOR MEASUREMENT APPARATUS 审中-公开

    公开(公告)号：US20230400404A1

    公开(公告)日：2023-12-14

    申请号：US18154990

    申请日：2023-01-16

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Garam Choi ,  Wookrae Kim ,  Jinseob Kim ,  Jinyong Kim ,  Sungho Jang ,  Daehoon Han

    IPC: G01N21/21 ,  G01B11/24

    CPC classification number: G01N21/21 ,  G01B11/24 ,  G01B2210/56

    Abstract: A semiconductor measurement apparatus includes an illumination unit including a light source and at least one illumination polarization element, a light receiving unit including at least one light-receiving polarization element disposed on a path of light reflected by a sample, and an image sensor positioned to receive light passing through the at least one light-receiving polarization element and configured to output an original image, and a control unit configured to determine, by processing the original image, a selected critical dimension among critical dimensions of a structure included in a region of the sample. The control unit is configured to obtain a plurality of sample images by selecting regions of the original image in which a peak due to interference appears, to determine a plurality of elements included in a Mueller matrix using the plurality of sample images, and to determine the selected critical dimension based on the plurality of elements.

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