Methods of Reducing Registration Errors of Photomasks and Photomasks Formed Using the Methods
    1.
    发明申请
    Methods of Reducing Registration Errors of Photomasks and Photomasks Formed Using the Methods 有权
    使用方法减少光掩模和光掩模的注册错误的方法

    公开(公告)号:US20150050584A1

    公开(公告)日:2015-02-19

    申请号:US14319281

    申请日:2014-06-30

    IPC分类号: G03F1/72 G03F1/00

    摘要: Methods of reducing registration errors of photomasks and photomasks formed using the methods are provided. The method may include forming a plurality of photomask patterns on a substrate and determining registration errors of the plurality of photomask patterns. The method may further include forming a plurality of stress-producing portions in the substrate to reduce the registration errors by considering exposure latitude variations.

    摘要翻译: 提供了减少使用这些方法形成的光掩模和光掩模的配准误差的方法。 该方法可以包括在衬底上形成多个光掩模图案并确定多个光掩模图案的配准误差。 该方法还可以包括在衬底中形成多个应力产生部分,以通过考虑曝光宽容度变化来减小配准误差。

    INTEGRATED CIRCUIT DEVICE
    2.
    发明公开

    公开(公告)号:US20240321874A1

    公开(公告)日:2024-09-26

    申请号:US18499117

    申请日:2023-10-31

    摘要: An integrated circuit device includes a pair of fin-type active regions collinear with each other on a substrate, a gate line disposed on one of the fin-type active regions, a capping insulating layer that covers the gate line, and a fin isolation insulating portion that passes through the capping insulating layer in a vertical direction between the pair of fin-type active regions. The fin isolation insulating portion includes an isolation insulating plug that includes a first portion disposed between the pair of fin-type active regions and a second portion integrally connected to the first portion and that passes through the capping insulating layer in the vertical direction, and an isolation insulating liner that surrounds a bottom surface and a sidewall of the isolation insulating plug. The isolation insulating liner includes an uppermost portion that is closer to the substrate than a top surface of the isolation insulating plug.

    Methods of reducing registration errors of photomasks and photomasks formed using the methods
    4.
    发明授权
    Methods of reducing registration errors of photomasks and photomasks formed using the methods 有权
    减少使用该方法形成的光掩模和光掩模的配准误差的方法

    公开(公告)号:US09323142B2

    公开(公告)日:2016-04-26

    申请号:US14319281

    申请日:2014-06-30

    摘要: Methods of reducing registration errors of photomasks and photomasks formed using the methods are provided. The method may include forming a plurality of photomask patterns on a substrate and determining registration errors of the plurality of photomask patterns. The method may further include forming a plurality of stress-producing portions in the substrate to reduce the registration errors by considering exposure latitude variations.

    摘要翻译: 提供了减少使用这些方法形成的光掩模和光掩模的配准误差的方法。 该方法可以包括在衬底上形成多个光掩模图案并确定多个光掩模图案的配准误差。 该方法还可以包括在衬底中形成多个应力产生部分,以通过考虑曝光宽容度变化来减小配准误差。

    SYSTEM AND METHOD FOR UPDATING KNOWLEDGE GRAPH

    公开(公告)号:US20210117402A1

    公开(公告)日:2021-04-22

    申请号:US17028542

    申请日:2020-09-22

    IPC分类号: G06F16/23 G06F16/901

    摘要: A method of updating a server knowledge graph, is performed by a server and includes obtaining a server knowledge graph of the server, and obtaining a plurality of device knowledge graphs by receiving a device knowledge graph from each of a plurality of devices. The method further includes generating a knowledge graph for server knowledge graph extension, based on the obtained plurality of device knowledge graphs, and updating the obtained server knowledge graph, using the generated knowledge graph for server knowledge graph extension.