公开(公告)号：US20180040521A1

公开(公告)日：2018-02-08

申请号：US15785531

申请日：2017-10-17

Applicant: Renesas Electronics Corporation

Inventor： Bunji YASUMURA ,  Fumio TSUCHIYA ,  Hisanori ITO ,  Takuji IDE ,  Naoki KAWANABE ,  Masanao SATO

IPC: H01L21/66 ,  H01L23/31 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L22/32 ,  H01L23/3114 ,  H01L23/49816 ,  H01L23/49838 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L24/85 ,  H01L2224/02166 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05073 ,  H01L2224/05553 ,  H01L2224/05624 ,  H01L2224/0613 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/45015 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48157 ,  H01L2224/48227 ,  H01L2224/4845 ,  H01L2224/48463 ,  H01L2224/48465 ,  H01L2224/48624 ,  H01L2224/49171 ,  H01L2224/73265 ,  H01L2224/85203 ,  H01L2224/85205 ,  H01L2224/85207 ,  H01L2224/85399 ,  H01L2924/00012 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01025 ,  H01L2924/01033 ,  H01L2924/0105 ,  H01L2924/01051 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/05042 ,  H01L2924/10253 ,  H01L2924/12041 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/20752 ,  H01L2924/20753 ,  H01L2924/30107 ,  H01L2924/3512 ,  H01L2924/00

Abstract: A technique is provided that can prevent cracking of a protective film in the uppermost layer of a semiconductor device and improve the reliability of the semiconductor device. Bonding pads formed over a principal surface of a semiconductor chip are in a rectangular shape, and an opening is formed in a protective film over each bonding pad in such a manner that an overlapping width of the protective film in a wire bonding region of each bonding pad becomes wider than an overlapping width of the protective film in a probe region of each bonding pad.

公开(公告)号：US20150228618A1

公开(公告)日：2015-08-13

申请号：US14602186

申请日：2015-01-21

Applicant: Renesas Electronics Corporation

Inventor： Naoki KAWANABE

IPC: H01L23/00

CPC classification number: H01L24/85 ,  H01L24/05 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/78 ,  H01L24/83 ,  H01L24/97 ,  H01L2224/02166 ,  H01L2224/04042 ,  H01L2224/05014 ,  H01L2224/05017 ,  H01L2224/05093 ,  H01L2224/05124 ,  H01L2224/05554 ,  H01L2224/05557 ,  H01L2224/05624 ,  H01L2224/32225 ,  H01L2224/45139 ,  H01L2224/45144 ,  H01L2224/45147 ,  H01L2224/45565 ,  H01L2224/45664 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/4845 ,  H01L2224/48453 ,  H01L2224/48465 ,  H01L2224/49171 ,  H01L2224/73265 ,  H01L2224/78301 ,  H01L2224/83101 ,  H01L2224/85181 ,  H01L2224/85205 ,  H01L2224/85206 ,  H01L2224/85345 ,  H01L2224/85365 ,  H01L2224/85447 ,  H01L2224/92247 ,  H01L2224/97 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2924/00015

Abstract: A method of manufacturing a semiconductor device which improves the reliability of a semiconductor device. The method of manufacturing the semiconductor device includes the step of connecting a ball portion formed at the tip of a wire with a pad (electrode pad) of a semiconductor chip. The pad is comprised of an aluminum-based material and has a trench in its portion to be connected with the ball portion. The ball portion is comprised of a harder material than gold. The step of connecting the ball portion includes the step of applying ultrasonic waves to the ball portion.

Abstract translation: 一种提高半导体器件的可靠性的半导体器件的制造方法。 制造半导体器件的方法包括将形成在导线末端的球部与半导体芯片的焊盘（电极焊盘）连接的步骤。 垫由铝基材料构成，并且在其与球部分连接的部分中具有沟槽。 球部分由比金更硬的材料组成。 连接球部的步骤包括向球部施加超声波的步骤。

公开(公告)号：US20170018470A1

公开(公告)日：2017-01-19

申请号：US15280618

申请日：2016-09-29

Applicant: Renesas Electronics Corporation

Inventor： Bunji YASUMURA ,  Fumio TSUCHIYA ,  Hisanori ITO ,  Takuji IDE ,  Naoki KAWANABE ,  Masanao SATO

IPC: H01L21/66 ,  H01L23/31 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L22/32 ,  H01L23/3114 ,  H01L23/49816 ,  H01L23/49838 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L24/85 ,  H01L2224/02166 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05073 ,  H01L2224/05553 ,  H01L2224/05624 ,  H01L2224/0613 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/45015 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48157 ,  H01L2224/48227 ,  H01L2224/4845 ,  H01L2224/48463 ,  H01L2224/48465 ,  H01L2224/48624 ,  H01L2224/49171 ,  H01L2224/73265 ,  H01L2224/85203 ,  H01L2224/85205 ,  H01L2224/85207 ,  H01L2224/85399 ,  H01L2924/00012 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01025 ,  H01L2924/01033 ,  H01L2924/0105 ,  H01L2924/01051 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/05042 ,  H01L2924/10253 ,  H01L2924/12041 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/20752 ,  H01L2924/20753 ,  H01L2924/30107 ,  H01L2924/3512 ,  H01L2924/00

Abstract: A technique is provided that can prevent cracking of a protective film in the uppermost layer of a semiconductor device and improve the reliability of the semiconductor device. Bonding pads formed over a principal surface of a semiconductor chip are in a rectangular shape, and an opening is formed in a protective film over each bonding pad in such a manner that an overlapping width of the protective film in a wire bonding region of each bonding pad becomes wider than an overlapping width of the protective film in a probe region of each bonding pad.

Abstract translation: 提供了能够防止半导体装置的最上层的保护膜的破裂的技术，提高了半导体装置的可靠性。 在半导体芯片的主表面上形成的接合焊盘为矩形，并且在每个接合焊盘上的保护膜中形成开口，使得保护膜在每个接合的引线接合区域中的重叠宽度 衬垫比每个焊盘的探针区域中的保护膜的重叠宽度宽。