公开(公告)号：US07202007B2

公开(公告)日：2007-04-10

申请号：US10456472

申请日：2003-06-09

申请人： Norio Shibata ,  Junji Nakada ,  Jun Fujinawa

发明人： Norio Shibata ,  Junji Nakada ,  Jun Fujinawa

IPC分类号： G03C5/58 ,  G03C11/12 ,  B41M3/12 ,  C23C16/00 ,  B05D3/00

CPC分类号： H01L21/76838 ,  C23C14/0005 ,  C23C14/086 ,  H01L21/28506 ,  H01L27/3211 ,  H01L51/0004 ,  H01L51/0013 ,  H01L51/005 ,  H01L51/0051 ,  H01L51/0059 ,  H01L51/0078 ,  H01L51/0081 ,  H01L51/0084 ,  H01L51/0097 ,  H01L51/56

摘要： This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

摘要翻译： 该方法形成图案化膜。 该方法制备具有根据要形成的膜图案形成有凹凸的转印面的转印部件，对形成在转印部件的转印面上的至少脊的表面进行剥离处理，然后形成薄膜 通过在形成在转印部件的转印表面上的至少脊的表面上形成真空膜的技术，将形成在转印部件的至少脊的表面上的薄膜转印到基板上，从而形成图案化膜 在基板上。

公开(公告)号：US07462927B2

公开(公告)日：2008-12-09

申请号：US11034805

申请日：2005-01-14

申请人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

发明人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

IPC分类号： H01L23/02 ,  H01L21/00 ,  H01L21/20

CPC分类号： C03C17/42 ,  B44C1/1733 ,  C03C17/3405 ,  H01L51/0013 ,  H01L51/56

摘要： A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

摘要翻译： 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。

公开(公告)号：US20050150865A1

公开(公告)日：2005-07-14

申请号：US11034805

申请日：2005-01-14

申请人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

发明人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

IPC分类号： B41M5/00 ,  B44C1/17 ,  C03C17/34 ,  C03C17/42 ,  H01L51/40 ,  H01L51/50 ,  H01L51/56 ,  H05B33/10 ,  C23F1/00 ,  B44C1/22 ,  C03C15/00 ,  H01L21/469

CPC分类号： C03C17/42 ,  B44C1/1733 ,  C03C17/3405 ,  H01L51/0013 ,  H01L51/56

摘要： A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

摘要翻译： 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。

公开(公告)号：US08039373B2

公开(公告)日：2011-10-18

申请号：US11798708

申请日：2007-05-16

申请人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

发明人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

IPC分类号： H01L21/20 ,  H01L21/40

CPC分类号： C03C17/42 ,  B44C1/1733 ,  C03C17/3405 ,  H01L51/0013 ,  H01L51/56

摘要： A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

摘要翻译： 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。

公开(公告)号：US20070224812A1

公开(公告)日：2007-09-27

申请号：US11798708

申请日：2007-05-16

申请人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

发明人： Jun Fujinawa ,  Junji Nakada ,  Norio Shibata ,  Takashi Kataoka

IPC分类号： H01L21/44

CPC分类号： C03C17/42 ,  B44C1/1733 ,  C03C17/3405 ,  H01L51/0013 ,  H01L51/56

摘要： A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

摘要翻译： 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。

公开(公告)号：US20050064642A1

公开(公告)日：2005-03-24

申请号：US10981601

申请日：2004-11-05

申请人： Jun Fujinawa ,  Junji Nakada

发明人： Jun Fujinawa ,  Junji Nakada

IPC分类号： G02B1/11 ,  H01L21/8238 ,  H01L31/0232 ,  H01L31/0336

CPC分类号： G02B1/115 ,  G02B1/113

摘要： The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.

摘要翻译： 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。

公开(公告)号：US06863965B2

公开(公告)日：2005-03-08

申请号：US10151173

申请日：2002-05-21

申请人： Jun Fujinawa ,  Junji Nakada

发明人： Jun Fujinawa ,  Junji Nakada

IPC分类号： C08J7/06 ,  C23C14/06 ,  C23C14/10 ,  G02B1/11 ,  B32B7/02

CPC分类号： C23C14/10 ,  C08J7/06 ,  C23C14/0694 ,  G02B1/113 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/31507 ,  Y10T428/31667 ,  Y10T428/31931 ,  Y10T428/31935 ,  Y10T428/31938

摘要： This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.

摘要翻译： 该光学部件包括由塑料制成的成膜基板，形成在成膜基板的上侧的氟化镁膜和在氟化镁膜上形成的第一氧化硅膜。 氟化镁膜可以形成在成膜基板的表面上。 或者，光学部件还可以包括在成膜基板的表面上以及成膜基板和氟化镁膜之间形成的第二氧化硅膜。 可以实现膜粘合性，机械强度，耐药性，耐环境性等优异的光学元件以及光学特性，并且生产率，成膜操作性，成本等优异 。

公开(公告)号：US06833600B2

公开(公告)日：2004-12-21

申请号：US10252390

申请日：2002-09-24

申请人： Jun Fujinawa ,  Junji Nakada

发明人： Jun Fujinawa ,  Junji Nakada

IPC分类号： H01L310232

CPC分类号： G02B1/115 ,  G02B1/113

摘要： The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.

摘要翻译： 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。

公开(公告)号：US07033855B2

公开(公告)日：2006-04-25

申请号：US10981601

申请日：2004-11-05

申请人： Jun Fujinawa ,  Junji Nakada

发明人： Jun Fujinawa ,  Junji Nakada

IPC分类号： H01L21/00

CPC分类号： G02B1/115 ,  G02B1/113

摘要： The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.

摘要翻译： 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。

公开(公告)号：US20070048400A1

公开(公告)日：2007-03-01

申请号：US11515426

申请日：2006-09-05

申请人： Makoto Kashiwaya ,  Junji Nakada ,  Norio Shibata

发明人： Makoto Kashiwaya ,  Junji Nakada ,  Norio Shibata

IPC分类号： B29C59/04

CPC分类号： C23C14/562 ,  C23C14/042

摘要： The apparatus for producing sheeting includes a transport unit which transports a web of sheeting along its length direction, a pattern transfer unit which forms a pattern on a surface of the sheeting by transfer and that is provided in a pathway where the web of sheeting is transported by the transport unit, a film depositing unit which performs vacuum film deposition on the patterned surface of the web of sheeting and that is provided downstream of the pattern transfer unit in the pathway, and a pressure retaining unit which retains pressure within the film depositing unit and that is provided in a region of the film depositing unit into which the web of sheeting is transported and in a region of the film depositing unit from which the web of sheeting emerges.

摘要翻译： 用于生产片材的设备包括：输送单元，其沿长度方向输送片材幅材;图案转印单元，其通过转印在片材的表面上形成图案，并且设置在片材的幅材被输送的路径中 通过所述传送单元，在所述片材的幅材的图案化表面上进行真空膜沉积并且设置在所述路径中的图案转印单元的下游的膜沉积单元，以及保持在所述膜沉积单元内的压力的压力保持单元 并且其设置在成膜单元的区域中，片材的幅材被输送到该区域中，并且在成膜单元的区域中，片材幅材从该区域出现。