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公开(公告)号：US07202007B2
公开(公告)日：2007-04-10
申请号：US10456472
申请日：2003-06-09
Applicant: Norio Shibata , Junji Nakada , Jun Fujinawa
Inventor： Norio Shibata , Junji Nakada , Jun Fujinawa
CPC classification number: H01L21/76838 , C23C14/0005 , C23C14/086 , H01L21/28506 , H01L27/3211 , H01L51/0004 , H01L51/0013 , H01L51/005 , H01L51/0051 , H01L51/0059 , H01L51/0078 , H01L51/0081 , H01L51/0084 , H01L51/0097 , H01L51/56
Abstract: This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.
Abstract translation: 该方法形成图案化膜。 该方法制备具有根据要形成的膜图案形成有凹凸的转印面的转印部件，对形成在转印部件的转印面上的至少脊的表面进行剥离处理，然后形成薄膜 通过在形成在转印部件的转印表面上的至少脊的表面上形成真空膜的技术，将形成在转印部件的至少脊的表面上的薄膜转印到基板上，从而形成图案化膜 在基板上。
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公开(公告)号：US20050064642A1
公开(公告)日：2005-03-24
申请号：US10981601
申请日：2004-11-05
Applicant: Jun Fujinawa , Junji Nakada
Inventor： Jun Fujinawa , Junji Nakada
IPC: G02B1/11 , H01L21/8238 , H01L31/0232 , H01L31/0336
Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.
Abstract translation: 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。
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公开(公告)号：US06863965B2
公开(公告)日：2005-03-08
申请号：US10151173
申请日：2002-05-21
Applicant: Jun Fujinawa , Junji Nakada
Inventor： Jun Fujinawa , Junji Nakada
CPC classification number: C23C14/10 , C08J7/06 , C23C14/0694 , G02B1/113 , Y10T428/24967 , Y10T428/24975 , Y10T428/265 , Y10T428/31507 , Y10T428/31667 , Y10T428/31931 , Y10T428/31935 , Y10T428/31938
Abstract: This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.
Abstract translation: 该光学部件包括由塑料制成的成膜基板，形成在成膜基板的上侧的氟化镁膜和在氟化镁膜上形成的第一氧化硅膜。 氟化镁膜可以形成在成膜基板的表面上。 或者，光学部件还可以包括在成膜基板的表面上以及成膜基板和氟化镁膜之间形成的第二氧化硅膜。 可以实现膜粘合性，机械强度，耐药性，耐环境性等优异的光学元件以及光学特性，并且生产率，成膜操作性，成本等优异 。
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公开(公告)号：US07462927B2
公开(公告)日：2008-12-09
申请号：US11034805
申请日：2005-01-14
Applicant: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
Inventor： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
CPC classification number: C03C17/42 , B44C1/1733 , C03C17/3405 , H01L51/0013 , H01L51/56
Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
Abstract translation: 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。
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公开(公告)号：US20050150865A1
公开(公告)日：2005-07-14
申请号：US11034805
申请日：2005-01-14
Applicant: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
Inventor： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
IPC: B41M5/00 , B44C1/17 , C03C17/34 , C03C17/42 , H01L51/40 , H01L51/50 , H01L51/56 , H05B33/10 , C23F1/00 , B44C1/22 , C03C15/00 , H01L21/469
CPC classification number: C03C17/42 , B44C1/1733 , C03C17/3405 , H01L51/0013 , H01L51/56
Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
Abstract translation: 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。
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Patent Agency Ranking
公开(公告)号：US06833600B2
公开(公告)日：2004-12-21
申请号：US10252390
申请日：2002-09-24
Applicant: Jun Fujinawa , Junji Nakada
Inventor： Jun Fujinawa , Junji Nakada
IPC: H01L310232
Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.
Abstract translation: 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。
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公开(公告)号：US08039373B2
公开(公告)日：2011-10-18
申请号：US11798708
申请日：2007-05-16
Applicant: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
Inventor： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
CPC classification number: C03C17/42 , B44C1/1733 , C03C17/3405 , H01L51/0013 , H01L51/56
Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
Abstract translation: 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。
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公开(公告)号：US20070224812A1
公开(公告)日：2007-09-27
申请号：US11798708
申请日：2007-05-16
Applicant: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
Inventor： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
IPC: H01L21/44
CPC classification number: C03C17/42 , B44C1/1733 , C03C17/3405 , H01L51/0013 , H01L51/56
Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
Abstract translation: 图案膜形成方法包括在片状材料的表面上形成薄膜的转印片材的制造工序以及利用加压部件将薄膜压在基板的图案成膜面上的工序 具有与转印纸的与薄膜相反的反面的图案膜的凸部或与图案膜形成面相反的基板的反面，将薄膜转印到基板。 图案成膜装置包括片材供应装置，按压装置和基板输送装置。 可以高生产率形成具有期望图案和锋利边缘的高分辨率图案薄膜。
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公开(公告)号：US07033855B2
公开(公告)日：2006-04-25
申请号：US10981601
申请日：2004-11-05
Applicant: Jun Fujinawa , Junji Nakada
Inventor： Jun Fujinawa , Junji Nakada
IPC: H01L21/00
Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less. The plurality of films are formed by performing melting of film forming materials other than a film forming material for a film formed on the surface of the substrate after the film is formed on the surface of the substrate.
Abstract translation: 光学部件包括由树脂材料制成的基板，形成在基板的表面上的氧化硅膜和形成在氧化硅膜上的多层光反射防止膜，并且具有至少一层低折射率膜， 折射率材料和交替形成的至少一层高折射率材料层。 氧化硅膜通过在成膜期间通过真空沉积引入氧来形成和/或形成，从而赋予氧化硅膜预定的弹性。 其他光学部件包括由树脂材料制成的基板和通过真空沉积形成的多个膜，并且每个相邻的多个膜中的内部应力的方向彼此不同或存在于表面上的杂质的厚度 的基板为0.2nm以下。 在膜形成在基板的表面上之后，通过对形成在基板表面上的膜的成膜材料以外的成膜材料进行熔融而形成多个膜。
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公开(公告)号：US06688951B2
公开(公告)日：2004-02-10
申请号：US09534555
申请日：2000-03-27
Applicant: Makoto Kashiwaya , Junji Nakada
Inventor： Makoto Kashiwaya , Junji Nakada
IPC: B24B700
CPC classification number: B41J2/3353 , B24B19/26 , B24B21/004 , B24B27/0023
Abstract: A thermal head lapping apparatus includes a pallet for holding at least one thermal head, a transport device for transporting the thermal head held on the pallet successively to a specified processing position, and a lapping device for forcing a lapping material being moved onto the thermal head that has been transported to said processing position. As a result, the apparatus is capable of advantageously performing lapping treatment with a good efficiency on surfaces to be coated with protective layers or the formed protective layers in a process of fabricating a thermal head, thereby improving the production efficiency of the thermal head and fabricating with a good productivity the suitably lapped thermal head of high quality that ensures high quality image recording.
Abstract translation: 一种热头研磨装置，包括用于保持至少一个热敏头的托盘，用于将保持在托盘上的热敏头连续运送到指定加工位置的运送装置，以及用于迫使研磨材料移动到热敏头上的研磨装置 已经被运送到所述处理位置。 结果，该装置能够在制造热敏头的过程中有利地在保护层或形成的保护层的表面上以良好的效率执行研磨处理，从而提高热敏头的生产效率和制造 具有良好的生产效率，适合搭配高品质的热敏头，确保高质量的图像记录。
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