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    Salt and photoresist composition containing the same
    1.
    发明授权
    Salt and photoresist composition containing the same 有权
    含有其的盐和光致抗蚀剂组合物

    公开(公告)号：US09346750B2

    公开(公告)日：2016-05-24

    申请号：US12947349

    申请日：2010-11-16

    申请人： Koji Ichikawa ,  Mitsuyoshi Ochiai ,  Masako Sugihara

    发明人： Koji Ichikawa ,  Mitsuyoshi Ochiai ,  Masako Sugihara

    IPC分类号： C07C309/19 ,  C07C309/17 ,  C07C381/12 ,  C07D307/33 ,  C07D307/93 ,  C07D327/06 ,  C07D333/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

    CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D307/33 ,  C07D307/93 ,  C07D327/06 ,  C07D333/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译： 由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是 在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示 在每次出现时都独立地是羟基等，R5各自独立地出现 含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。

    Photoresist composition
    3.
    发明授权
    Photoresist composition 有权

    公开(公告)号：US09726976B2

    公开(公告)日：2017-08-08

    申请号：US12881942

    申请日：2010-09-14

    申请人： Koji Ichikawa ,  Hiromu Sakamoto ,  Masako Sugihara ,  Takashi Hiraoka

    发明人： Koji Ichikawa ,  Hiromu Sakamoto ,  Masako Sugihara ,  Takashi Hiraoka

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046

    摘要： A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    6.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20100316952A1

    公开(公告)日：2010-12-16

    申请号：US12797466

    申请日：2010-06-09

    申请人： Koji Ichikawa ,  Masako Sugihara ,  Hiromu Sakamoto

    发明人： Koji Ichikawa ,  Masako Sugihara ,  Hiromu Sakamoto

    IPC分类号： G03F7/20 ,  C07C69/753 ,  C07C69/74 ,  C07D307/77 ,  C07C69/76 ,  G03F7/004

    CPC分类号： C07D307/94 ,  C07C309/12 ,  C07C309/17 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A salt represented by the formula (a1): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents —CO—O—Xa1— or —CH2—O—Xa2— wherein Xa1 and Xa2 independently each represent a C1-C15 alkylene group and one or more —CH2— in the alkylene group can be replaced by —O— or —CO—, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and Z+ represents an organic cation.

    摘要翻译： 由式（a1）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示-CO-O-Xa1或-CH2-O-Xa2-，其中Xa1和Xa2独立地 各自表示C1-C15亚烷基，亚烷基中的一个或多个-CH2-可以被-O-或-CO-代替，Y1表示C3-C36脂环族烃基或C6-C24芳族烃基， 脂环族烃基和芳香族烃基可以具有一个以上的取代基，脂环式烃基中的一个以上的-CH 2 - 可以被-O-或-CO-代替，Z +表示有机阳离子。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    7.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20100304294A1

    公开(公告)日：2010-12-02

    申请号：US12786799

    申请日：2010-05-25

    申请人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

    发明人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

    IPC分类号： G03F7/004 ,  C07D307/00 ,  G03F7/20 ,  C07D307/04

    CPC分类号： C07D307/80 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译： 由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物 通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    8.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20100304292A1

    公开(公告)日：2010-12-02

    申请号：US12786726

    申请日：2010-05-25

    申请人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

    发明人： Koji ICHIKAWA ,  Masako Sugihara ,  Tatsuro Masuyama

    IPC分类号： G03F7/004 ,  C07C69/708 ,  C07D307/00 ,  C07C69/96 ,  G03F7/20

    CPC分类号： C07D493/18 ,  C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D307/33 ,  C07D307/77 ,  C07D307/93 ,  C07D309/06 ,  C07D309/30 ,  C07D313/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

    摘要： A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.

    摘要翻译： 由式（I-BB）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示 表示C1-C20脂肪族烃基等，Ar1表示可以具有一个以上取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示C4-C36脂环族 具有一个或多个-OXa基并且不能通过酸等的作用而被除去的烃基，Xa表示氢原子或能够通过酸的作用而被除去的基团，m1和m2 独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜3的整数。

    METHOD FOR PRODUCING RESIST PATTERN
    9.
    发明申请
    METHOD FOR PRODUCING RESIST PATTERN 审中-公开
    生产电阻图案的方法

    公开(公告)号：US20100230136A1

    公开(公告)日：2010-09-16

    申请号：US12720419

    申请日：2010-03-09

    申请人： Koji ICHIKAWA ,  Masako Sugihara

    发明人： Koji ICHIKAWA ,  Masako Sugihara

    IPC分类号： H05K1/00 ,  G03F7/20 ,  G03F7/004 ,  B32B3/30

    CPC分类号： H01L21/0274 ,  G03F7/0035 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/40 ,  Y10T428/24479

    摘要： The present invention provides a method for producing a resist pattern sufficiently miniaturized having an excellent shape including: repeating a process of forming a patterned resist film comprising the following step (1):(1) forming a resist film, and exposing the formed resist film, and the like to form a patterned resist film by n cycles to obtain a resist pattern, wherein the resist film exposed in the step (1) in at least one cycle of the n cycles of the process of forming the patterned resist film is a film formed by layering a resist composition containing a resin (B) that becomes soluble in an alkali aqueous solution by an action of an acid and has a weight-average molecular weight of 7,000 to 10,000 and a glass transition temperature of 150 to 200° C., a photoacid generator (A) and a crosslinking agent (C).

    摘要翻译： 本发明提供一种制造具有优异形状的抗蚀剂图案的方法，其特征在于包括：重复形成图案化抗蚀剂膜的方法，该方法包括以下步骤（1）：（1）形成抗蚀剂膜，并使形成的抗蚀剂膜曝光 以形成图案化的抗蚀剂膜，以形成抗蚀剂图案，其中在形成图案化抗蚀剂膜的工艺的n个循环中的至少一个循环中，在步骤（1）中暴露的抗蚀剂膜为 通过使含有树脂（B）的抗蚀剂组合物层叠形成，所述抗蚀剂组合物通过酸的作用变成可溶于碱性水溶液的树脂（B），其重均分子量为7000〜10,000，玻璃化转变温度为150〜200℃ 光电产生剂（A）和交联剂（C）。