发明申请
- 专利标题： SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- 专利标题（中）： 含有它的盐和光催化剂组合物
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申请号： US12833712申请日： 2010-07-09
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公开(公告)号： US20110014567A1公开(公告)日： 2011-01-20
- 发明人: Koji Ichikawa , Masako Sugihara , Yuko Yamashita
- 申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-165362 20090714
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C07C69/76 ; C07D333/76 ; C08F28/06 ; C08F28/02 ; G03F7/004
摘要：
A salt represented by the formula (I—Pb): wherein Xpb represents a single bond or —O—, Rpb represents a single bond etc., Ypb represents a polymerizable group, Zpb represents an organic group, Xpc represents a single bond or a C1-C4 alkylene group, and Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents etc.
公开/授权文献
- US08609317B2 Salt and photoresist composition containing the same 公开/授权日：2013-12-17
信息查询
IPC分类:
