公开(公告)号：US20150314233A1

公开(公告)日：2015-11-05

申请号：US14698938

申请日：2015-04-29

申请人： KOREA INSTITUTE OF MACHINERY & MATERIALS

发明人： Min HUR ,  Woo Seok KANG ,  Jae Ok LEE

IPC分类号： B01D53/32

CPC分类号： H01J37/32844 ,  B01D53/32 ,  B01D2259/818 ,  H01J37/32091 ,  H01J37/32834 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2245/1215 ,  Y02C20/30 ,  Y02P70/605

摘要： A plasma reactor for abating hazardous materials included in process gases while being installed on an exhaust path of the process gases toward a vacuum pump is provided. The plasma reactor includes an insulator having a pipe shape through which process gases pass, a first ground electrode connected to a front end of the insulator facing the process chamber, a second ground electrode connected to a rear end of the insulator and provided with a facing part that faces a center of the inside of the insulator along the moving direction of process gases, and a driving electrode fixed to an external circumferential surface of the insulator and connected to a power supply applying an AC or RF voltage.

摘要翻译： 提供了一种等离子体反应器，用于在将工艺气体的排气路径安装到真空泵的同时，减少包含在工艺气体中的有害物质。 等离子体反应器包括具有工艺气体通过的管状绝缘体，连接到面向处理室的绝缘体的前端的第一接地电极，连接到绝缘体的后端的第二接地电极， 沿着处理气体的移动方向面对绝缘体内部的中心的部分，以及固定到绝缘体的外周表面并连接到施加AC或RF电压的电源的驱动电极。

公开(公告)号：US20210198786A1

公开(公告)日：2021-07-01

申请号：US17133988

申请日：2020-12-24

申请人： KOREA INSTITUTE OF MACHINERY & MATERIALS

发明人： Min HUR ,  Woo Seok KANG ,  Dae-Woong KIM ,  Jinyoung LEE

IPC分类号： C23C16/44 ,  B08B7/00 ,  B08B5/00 ,  H01L21/67

摘要： A plasma cleaning apparatus includes a metal chamber, a gate assembly, a dielectric, and a high voltage electrode.
The metal chamber is connected to a vacuum tube connecting the process chamber and the vacuum pump, and is provided with a first opening. The gate assembly includes a gate support fixed to the metal chamber around the first opening and having a second opening, and a gate coupled to the gate support and having a first position closing the second opening and a second position opening the second opening switchable with each other. The dielectric is coupled to the outside of the gate support around the second opening, and the high voltage electrode is positioned on an outer surface of the dielectric.

公开(公告)号：US20140225502A1

公开(公告)日：2014-08-14

申请号：US14171888

申请日：2014-02-04

申请人： KOREA INSTITUTE OF MACHINERY & MATERIALS

发明人： Woo Seok KANG ,  Min Hur ,  Jae Ok Lee ,  Young Hoon Song ,  Kwan-Tae Kim ,  Dae-Hoon Lee

IPC分类号： H01J37/32

CPC分类号： H01J37/32091 ,  C23C16/452 ,  H01J37/32348 ,  H01J37/32357 ,  H01J37/32366 ,  H01J37/32752 ,  H05H1/2406 ,  H05H2001/2431 ,  H05H2001/2443 ,  H05H2001/2462

摘要： A remote plasma generation apparatus that can enhance plasma processing efficiency by centralizing remote plasma to a processing object is provided. The remote plasma generation apparatus includes: a dielectric support body that has a main body that is connected to a discharge gas injection opening and a nozzle portion that is connected to a plasma outlet; a driving electrode that is fixed to the main body and that receives application of an AC voltage from a power supply unit to generate plasma at internal space of the main body; and a ground electrode that supports a processing object at the outside of the nozzle portion. The nozzle portion includes an inclined surface that is integrally connected to the main body, and by forming a width of the plasma outlet to be smaller than a width of the main body, remote plasma is concentrated to the processing object.

摘要翻译： 提供了一种能够通过将远程等离子体集中到处理对象来提高等离子体处理效率的远程等离子体生成装置。 远程等离子体产生装置包括：电介质支撑体，其具有连接到排出气体注入口的主体和连接到等离子体出口的喷嘴部; 驱动电极，固定在主体上，并接收来自电源单元的交流电压的施加，以在主体的内部空间产生等离子体; 以及在喷嘴部分的外侧支撑处理对象物的接地电极。 喷嘴部分包括与主体一体连接的倾斜表面，并且通过将等离子体出口的宽度形成为小于主体的宽度，远程等离子体被集中到处理对象。