公开(公告)号：US20210198786A1

公开(公告)日：2021-07-01

申请号：US17133988

申请日：2020-12-24

申请人： KOREA INSTITUTE OF MACHINERY & MATERIALS

发明人： Min HUR ,  Woo Seok KANG ,  Dae-Woong KIM ,  Jinyoung LEE

IPC分类号： C23C16/44 ,  B08B7/00 ,  B08B5/00 ,  H01L21/67

摘要： A plasma cleaning apparatus includes a metal chamber, a gate assembly, a dielectric, and a high voltage electrode.
The metal chamber is connected to a vacuum tube connecting the process chamber and the vacuum pump, and is provided with a first opening. The gate assembly includes a gate support fixed to the metal chamber around the first opening and having a second opening, and a gate coupled to the gate support and having a first position closing the second opening and a second position opening the second opening switchable with each other. The dielectric is coupled to the outside of the gate support around the second opening, and the high voltage electrode is positioned on an outer surface of the dielectric.