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公开(公告)号:US20230307206A1
公开(公告)日:2023-09-28
申请号:US18121289
申请日:2023-03-14
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida , Kazushiro Yokouchi , Nobuyuki Ikeo , Konomi Ikita
IPC: H01J37/22 , H01J37/26 , H01J37/147
CPC classification number: H01J37/222 , H01J37/26 , H01J37/1474 , H01J2237/2511 , H01J2237/24578 , H01J37/244
Abstract: A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.
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公开(公告)号:US11315753B2
公开(公告)日:2022-04-26
申请号:US17017859
申请日:2020-09-11
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida
IPC: H01J37/244 , H01J37/147 , H01J37/24 , H01J37/28
Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.
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公开(公告)号:US20210082660A1
公开(公告)日:2021-03-18
申请号:US17017859
申请日:2020-09-11
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida
IPC: H01J37/244 , H01J37/24 , H01J37/147 , H01J37/28
Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.
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公开(公告)号:US20230411113A1
公开(公告)日:2023-12-21
申请号:US18210169
申请日:2023-06-15
Applicant: JEOL Ltd.
Inventor: Tatsuya Uchida , Terutaka Shimojima
IPC: H01J37/244 , H01J37/05 , H01J37/28
CPC classification number: H01J37/244 , H01J37/05 , H01J37/28 , H01J2237/24485
Abstract: An electron spectrometer is provided which can collect spectra in a reduced measurement time. The electron spectrometer includes an electron analyzer for providing energy dispersion of electrons emitted from a sample (S), a detector having a plurality of detection elements juxtaposed and arranged in the direction of energy dispersion of the dispersed electrons, and a processor. The processor operates (i) to sweep a measurement energy in first incremental energy steps (ΔE1) within the analyzer, to detect the dispersed electrons with the detection elements, and to obtain a plurality of resulting first spectra; (ii) to interpolate points of measurement in each of the first spectra; and (iii) to generate a spectral chart in second incremental energy steps (ΔE2) smaller than the first incremental energy steps (ΔE1) on the basis of the first spectra for which the points of measurement have been interpolated.
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公开(公告)号:US11710615B2
公开(公告)日:2023-07-25
申请号:US17586949
申请日:2022-01-28
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida
IPC: H01J37/244 , H01J37/147 , H01J37/24 , H01J37/28
CPC classification number: H01J37/244 , H01J37/1474 , H01J37/24 , H01J37/28 , H01J2237/0473 , H01J2237/221 , H01J2237/2448 , H01J2237/24475
Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.
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公开(公告)号:US20220157558A1
公开(公告)日:2022-05-19
申请号:US17586949
申请日:2022-01-28
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida
IPC: H01J37/244 , H01J37/147 , H01J37/24 , H01J37/28
Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.
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公开(公告)号:US20210255124A1
公开(公告)日:2021-08-19
申请号:US17177376
申请日:2021-02-17
Applicant: JEOL Ltd.
Inventor: Kenichi Tsutsumi , Tatsuya Uchida
IPC: G01N23/2276 , H01J37/28
Abstract: An Auger electron microscope includes a processing unit, and the processing unit performs processing of: acquiring an actually measured Auger spectrum obtained by measuring a test specimen containing an analysis target element; acquiring a plurality of first standard Auger spectra obtained by measuring a plurality of standard specimens each containing the same analysis target element but in different chemical states; calculating, based on a test specimen measurement condition that is a measurement condition when the test specimen has been measured and a standard specimen measurement condition that is a measurement condition when the standard specimens have been measured, a plurality of second standard Auger spectra under the test specimen measurement condition from the plurality of first standard Auger spectra; and performing curve fitting calculation of the actually measured Auger spectrum by using the plurality of calculated second standard Auger spectra.
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公开(公告)号:US11062434B2
公开(公告)日:2021-07-13
申请号:US16590706
申请日:2019-10-02
Applicant: JEOL Ltd.
Inventor: Tatsuya Uchida
IPC: G06T5/00 , G01N23/2273 , G01N23/2276 , G06T5/50 , G06T7/40
Abstract: A method of generating an elemental map includes: acquiring a plurality of correction channel images by scanning a surface of a standard specimen having a uniform elemental concentration with a primary beam and generating a correction channel image for each channel; generating correction information for each pixel of each correction channel image among the plurality of correction channel images based on a brightness value of the pixel; acquiring a plurality of analysis channel images by scanning a surface of a specimen to be analyzed with the primary beam and generating an analysis channel image for each channel; correcting brightness values of pixels constituting an analysis channel image among the plurality of analysis channel images based on the correction information; and generating an elemental map of the specimen to be analyzed based on the plurality of analysis channel images having pixels with corrected brightness values.
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公开(公告)号:US20210098244A1
公开(公告)日:2021-04-01
申请号:US17032092
申请日:2020-09-25
Applicant: JEOL Ltd.
Inventor: Tatsuya Uchida
Abstract: An input lens is provided which has a large acceptance solid angle for electrons. The input lens is for use in an electron spectrometer and disposed between an electron source producing electrons and an electron analyzer in the electron spectrometer. The input lens has a reference electrode at a reference potential, a slit, first through nth electrodes, where n is an integer equal to or greater than three, arranged between the reference electrode and the slit, and a second mesh attached to the first electrode. The first through nth electrodes are arranged in this order along an optical axis. The second mesh is at a potential higher than the reference potential.
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公开(公告)号:US20210096063A1
公开(公告)日:2021-04-01
申请号:US17036825
申请日:2020-09-29
Inventor: Kenichi Tsutsumi , Akihiro Tanaka , Kazushiro Yokouchi , Tatsuya Uchida , Noboru Taguchi , Shingo Tanaka
IPC: G01N21/25
Abstract: An analysis method includes: obtaining n×m pieces of map data by repeating, m times, a map measurement in which n pieces of map data are obtained by scanning a specimen with a primary probe to detect electrons emitted from the specimen with an electron spectrometer, while measurement energy ranges of an analyzer are varied; and generating a spectral map in which a position on the specimen is associated with a spectrum based on the n×m pieces of map data, the measurement energy ranges of m times of the map measurement not overlapping each other.
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