Charged Particle Beam Apparatus
    1.
    发明公开

    公开(公告)号:US20230307206A1

    公开(公告)日:2023-09-28

    申请号:US18121289

    申请日:2023-03-14

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.

    Charged particle beam device and analysis method

    公开(公告)号:US11315753B2

    公开(公告)日:2022-04-26

    申请号:US17017859

    申请日:2020-09-11

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

    Charged Particle Beam Device and Analysis Method

    公开(公告)号:US20210082660A1

    公开(公告)日:2021-03-18

    申请号:US17017859

    申请日:2020-09-11

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

    Electron Spectrometer and Analytical Method
    4.
    发明公开

    公开(公告)号:US20230411113A1

    公开(公告)日:2023-12-21

    申请号:US18210169

    申请日:2023-06-15

    Applicant: JEOL Ltd.

    CPC classification number: H01J37/244 H01J37/05 H01J37/28 H01J2237/24485

    Abstract: An electron spectrometer is provided which can collect spectra in a reduced measurement time. The electron spectrometer includes an electron analyzer for providing energy dispersion of electrons emitted from a sample (S), a detector having a plurality of detection elements juxtaposed and arranged in the direction of energy dispersion of the dispersed electrons, and a processor. The processor operates (i) to sweep a measurement energy in first incremental energy steps (ΔE1) within the analyzer, to detect the dispersed electrons with the detection elements, and to obtain a plurality of resulting first spectra; (ii) to interpolate points of measurement in each of the first spectra; and (iii) to generate a spectral chart in second incremental energy steps (ΔE2) smaller than the first incremental energy steps (ΔE1) on the basis of the first spectra for which the points of measurement have been interpolated.

    Charged particle beam device and analysis method

    公开(公告)号:US11710615B2

    公开(公告)日:2023-07-25

    申请号:US17586949

    申请日:2022-01-28

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

    Charged Particle Beam Device and Analysis Method

    公开(公告)号:US20220157558A1

    公开(公告)日:2022-05-19

    申请号:US17586949

    申请日:2022-01-28

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

    Auger Electron Microscope and Analysis Method

    公开(公告)号:US20210255124A1

    公开(公告)日:2021-08-19

    申请号:US17177376

    申请日:2021-02-17

    Applicant: JEOL Ltd.

    Abstract: An Auger electron microscope includes a processing unit, and the processing unit performs processing of: acquiring an actually measured Auger spectrum obtained by measuring a test specimen containing an analysis target element; acquiring a plurality of first standard Auger spectra obtained by measuring a plurality of standard specimens each containing the same analysis target element but in different chemical states; calculating, based on a test specimen measurement condition that is a measurement condition when the test specimen has been measured and a standard specimen measurement condition that is a measurement condition when the standard specimens have been measured, a plurality of second standard Auger spectra under the test specimen measurement condition from the plurality of first standard Auger spectra; and performing curve fitting calculation of the actually measured Auger spectrum by using the plurality of calculated second standard Auger spectra.

    Method of generating elemental map and surface analyzer

    公开(公告)号:US11062434B2

    公开(公告)日:2021-07-13

    申请号:US16590706

    申请日:2019-10-02

    Applicant: JEOL Ltd.

    Inventor: Tatsuya Uchida

    Abstract: A method of generating an elemental map includes: acquiring a plurality of correction channel images by scanning a surface of a standard specimen having a uniform elemental concentration with a primary beam and generating a correction channel image for each channel; generating correction information for each pixel of each correction channel image among the plurality of correction channel images based on a brightness value of the pixel; acquiring a plurality of analysis channel images by scanning a surface of a specimen to be analyzed with the primary beam and generating an analysis channel image for each channel; correcting brightness values of pixels constituting an analysis channel image among the plurality of analysis channel images based on the correction information; and generating an elemental map of the specimen to be analyzed based on the plurality of analysis channel images having pixels with corrected brightness values.

    Input Lens and Electron Spectrometer

    公开(公告)号:US20210098244A1

    公开(公告)日:2021-04-01

    申请号:US17032092

    申请日:2020-09-25

    Applicant: JEOL Ltd.

    Inventor: Tatsuya Uchida

    Abstract: An input lens is provided which has a large acceptance solid angle for electrons. The input lens is for use in an electron spectrometer and disposed between an electron source producing electrons and an electron analyzer in the electron spectrometer. The input lens has a reference electrode at a reference potential, a slit, first through nth electrodes, where n is an integer equal to or greater than three, arranged between the reference electrode and the slit, and a second mesh attached to the first electrode. The first through nth electrodes are arranged in this order along an optical axis. The second mesh is at a potential higher than the reference potential.

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