公开(公告)号：US20220157558A1

公开(公告)日：2022-05-19

申请号：US17586949

申请日：2022-01-28

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/24 ,  H01J37/28

Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

公开(公告)号：US20210255124A1

公开(公告)日：2021-08-19

申请号：US17177376

申请日：2021-02-17

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida

IPC: G01N23/2276 ,  H01J37/28

Abstract: An Auger electron microscope includes a processing unit, and the processing unit performs processing of: acquiring an actually measured Auger spectrum obtained by measuring a test specimen containing an analysis target element; acquiring a plurality of first standard Auger spectra obtained by measuring a plurality of standard specimens each containing the same analysis target element but in different chemical states; calculating, based on a test specimen measurement condition that is a measurement condition when the test specimen has been measured and a standard specimen measurement condition that is a measurement condition when the standard specimens have been measured, a plurality of second standard Auger spectra under the test specimen measurement condition from the plurality of first standard Auger spectra; and performing curve fitting calculation of the actually measured Auger spectrum by using the plurality of calculated second standard Auger spectra.

公开(公告)号：US20230402252A1

公开(公告)日：2023-12-14

申请号：US18208598

申请日：2023-06-12

Applicant: JEOL Ltd.

Inventor： Nobuyuki Ikeo ,  Kenichi Tsutsumi

IPC: H01J37/304 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/3045 ,  H01J37/28 ,  H01J2237/2511 ,  H01J2237/2806 ,  H01J2237/2804 ,  H01J37/222

Abstract: A charged particle beam device acquires an image by scanning a specimen with a probe formed from a charged particle beam and detects a signal emitted from the specimen. The charged particle beam device includes an optical system that forms the probe; a control unit that repeatedly performs correction processing and image acquisition processing for acquiring a frame image; and an image processing unit that generates an image of the specimen based on a plurality of the frame images. In the correction processing, the control unit acquires a reference image, and corrects the shifting of the irradiation position of the probe. The image processing unit acquires position shift information, corrects a position shift between the frame images based on the position shift information, and generates an image of the specimen based on the plurality of corrected frame images.

公开(公告)号：US20210096063A1

公开(公告)日：2021-04-01

申请号：US17036825

申请日：2020-09-29

Applicant: JEOL Ltd. ,  National Institute of Advanced Industrial Science and Technology

Inventor： Kenichi Tsutsumi ,  Akihiro Tanaka ,  Kazushiro Yokouchi ,  Tatsuya Uchida ,  Noboru Taguchi ,  Shingo Tanaka

IPC: G01N21/25

Abstract: An analysis method includes: obtaining n×m pieces of map data by repeating, m times, a map measurement in which n pieces of map data are obtained by scanning a specimen with a primary probe to detect electrons emitted from the specimen with an electron spectrometer, while measurement energy ranges of an analyzer are varied; and generating a spectral map in which a position on the specimen is associated with a spectrum based on the n×m pieces of map data, the measurement energy ranges of m times of the map measurement not overlapping each other.

公开(公告)号：US11698336B2

公开(公告)日：2023-07-11

申请号：US17036825

申请日：2020-09-29

Applicant: JEOL Ltd. ,  National Institute of Advanced Industrial Science and Technology

Inventor： Kenichi Tsutsumi ,  Akihiro Tanaka ,  Kazushiro Yokouchi ,  Tatsuya Uchida ,  Noboru Taguchi ,  Shingo Tanaka

IPC: G01N21/17 ,  G01N21/25

CPC classification number: G01N21/25 ,  G01N2021/1765 ,  G01N2201/10 ,  G01N2201/127

Abstract: An analysis method includes: obtaining n×m pieces of map data by repeating, m times, a map measurement in which n pieces of map data are obtained by scanning a specimen with a primary probe to detect electrons emitted from the specimen with an electron spectrometer, while measurement energy ranges of an analyzer are varied; and generating a spectral map in which a position on the specimen is associated with a spectrum based on the n×m pieces of map data, the measurement energy ranges of m times of the map measurement not overlapping each other.

公开(公告)号：US11710615B2

公开(公告)日：2023-07-25

申请号：US17586949

申请日：2022-01-28

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/24 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/1474 ,  H01J37/24 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/24475

Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

公开(公告)号：US20230307206A1

公开(公告)日：2023-09-28

申请号：US18121289

申请日：2023-03-14

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida ,  Kazushiro Yokouchi ,  Nobuyuki Ikeo ,  Konomi Ikita

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/147

CPC classification number: H01J37/222 ,  H01J37/26 ,  H01J37/1474 ,  H01J2237/2511 ,  H01J2237/24578 ,  H01J37/244

Abstract: A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.

公开(公告)号：US11315753B2

公开(公告)日：2022-04-26

申请号：US17017859

申请日：2020-09-11

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/24 ,  H01J37/28

Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

公开(公告)号：US20210082660A1

公开(公告)日：2021-03-18

申请号：US17017859

申请日：2020-09-11

Applicant: JEOL Ltd.

Inventor： Kenichi Tsutsumi ,  Tatsuya Uchida

IPC: H01J37/244 ,  H01J37/24 ,  H01J37/147 ,  H01J37/28

Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.