Abstract:
A lateral conduction superjunction semiconductor device has a plurality of spaced vertical trenches in a junction receiving layer of Pnull silicon. An Nnull diffusion lines the walls of the trench and the concentration and thickness of the Nnull diffusion and Pnull mesas are arranged to deplete fully in reverse blocking operation. A MOSgate structure is connected at one end of the trenches and a drain is connected at its other end. An Nnullnull further layer or an insulation oxide layer may be interposed between a Pnullnull substrate and the Pnull junction receiving layer.
Abstract:
A lateral conduction superjunction device has bidirectional conduction characteristics. In a first embodiment, spaced vertical trenches in a P substrate are lined with N diffusions. A central MOSgate structure is disposed centrally in the parallel trenches and source and drain electrodes are at the opposite respective ends of the trenches. In a second embodiment, flat layers of alternately opposite conductivity types have source and drain regions at their opposite ends. A trench MOSgate is disposed between the source region at one end of the layers to enable bidirectional currant flow through the stocked layers.
Abstract:
A Schottky diode has a barrier height which is adjusted by boron implant through a titanium silicide Schottky contact and into the underlying Nnull silicon substrate which receives the titanium silicide contact. The implant is a low energy, of about 10 keV (non critical) and a low dose of less than about 1E12 atoms per cm2 (non-critical).
Abstract translation:肖特基二极管具有通过硼注入通过硅化钛肖特基接触并进入接收硅化钛接触的下面的N-硅衬底中的势垒高度。 植入物是约10keV(非临界)和小于约1E12原子/ cm 2(非关键)的低能量的低能量。
Abstract:
A driver stage consisting of an N channel FET and a P channel FET are mounted in the same package as the main power FET. The power FET is mounted on a lead frame and the driver FETs are mounted variously on a separate pad of the lead frame or on the main FET or on the lead frame terminals. All electrodes are interconnected within the package by mounting on common conductive surfaces or by wire bonding. The drivers are connected to define either an inverting or non-inverting drive.
Abstract:
A flip-chip MOSFET structure has a vertical conduction semiconductor die in which the lower layer of the die is connected to a drain electrode on the top of the die by a diffusion sinker or conductive electrode. The source and gate electrodes are also formed on the upper surface of the die and have coplanar solder balls for connection to a circuit board. The structure has a chip scale package size. The back surface of the die, which is inverted when the die is mounted may be roughened or may be metallized to improve removal of heat from the die. Several separate MOSFETs can be integrated side-by-side into the die to form a series connection of MOSFETs with respective source and gate electrodes at the top surface having solder ball connectors. Plural solder ball connectors may be provided for the top electrodes and are laid out in respective parallel rows. The die may have the shape of an elongated rectangle with the solder balls laid out symmetrically to a diagonal to the rectangle.