Lateral superjunction semiconductor device
    1.
    发明申请
    Lateral superjunction semiconductor device 有权
    横向超结半导体器件

    公开(公告)号:US20020195627A1

    公开(公告)日:2002-12-26

    申请号:US09891727

    申请日:2001-06-26

    Abstract: A lateral conduction superjunction semiconductor device has a plurality of spaced vertical trenches in a junction receiving layer of Pnull silicon. An Nnull diffusion lines the walls of the trench and the concentration and thickness of the Nnull diffusion and Pnull mesas are arranged to deplete fully in reverse blocking operation. A MOSgate structure is connected at one end of the trenches and a drain is connected at its other end. An Nnullnull further layer or an insulation oxide layer may be interposed between a Pnullnull substrate and the Pnull junction receiving layer.

    Abstract translation: 横向导电超结半导体器件在P-硅的结接收层中具有多个间隔开的垂直沟槽。 N-扩散线排列在沟槽的壁上,并且N-扩散和P-台面的浓度和厚度被排列成完全消耗在反向阻塞操作中。 MOSgate结构在沟槽的一端连接,漏极在其另一端连接。 可以在P-基底和P-结接收层之间插入N-另外的层或绝缘氧化物层。

    Process for counter doping N-type silicon in Schottky device with Ti silicide barrier
    3.
    发明申请
    Process for counter doping N-type silicon in Schottky device with Ti silicide barrier 有权
    在具有Ti硅化物屏障的肖特基器件中反向掺杂N型硅的工艺

    公开(公告)号:US20030062585A1

    公开(公告)日:2003-04-03

    申请号:US10254112

    申请日:2002-09-25

    CPC classification number: H01L27/0814 H01L29/66143 H01L29/8725

    Abstract: A Schottky diode has a barrier height which is adjusted by boron implant through a titanium silicide Schottky contact and into the underlying Nnull silicon substrate which receives the titanium silicide contact. The implant is a low energy, of about 10 keV (non critical) and a low dose of less than about 1E12 atoms per cm2 (non-critical).

    Abstract translation: 肖特基二极管具有通过硼注入通过硅化钛肖特基接触并进入接收硅化钛接触的下面的N-硅衬底中的势垒高度。 植入物是约10keV(非临界)和小于约1E12原子/ cm 2(非关键)的低能量的低能量。

    Vertical conduction flip-chip device with bump contacts on single surface
    5.
    发明申请
    Vertical conduction flip-chip device with bump contacts on single surface 有权
    垂直导通倒装芯片器件,在单面上具有凸点接触

    公开(公告)号:US20010045635A1

    公开(公告)日:2001-11-29

    申请号:US09780080

    申请日:2001-02-09

    Abstract: A flip-chip MOSFET structure has a vertical conduction semiconductor die in which the lower layer of the die is connected to a drain electrode on the top of the die by a diffusion sinker or conductive electrode. The source and gate electrodes are also formed on the upper surface of the die and have coplanar solder balls for connection to a circuit board. The structure has a chip scale package size. The back surface of the die, which is inverted when the die is mounted may be roughened or may be metallized to improve removal of heat from the die. Several separate MOSFETs can be integrated side-by-side into the die to form a series connection of MOSFETs with respective source and gate electrodes at the top surface having solder ball connectors. Plural solder ball connectors may be provided for the top electrodes and are laid out in respective parallel rows. The die may have the shape of an elongated rectangle with the solder balls laid out symmetrically to a diagonal to the rectangle.

    Abstract translation: 倒装芯片MOSFET结构具有垂直导电半导体管芯,其中管芯的下层通过扩散沉积片或导电电极连接到管芯顶部的漏电极。 源极和栅电极也形成在管芯的上表面上,并且具有用于连接到电路板的共面焊球。 该结构具有芯片级封装尺寸。 当安装模具时倒模的模具的背面可以被粗糙化或者可以被金属化以改善从模具中的热量的去除。 几个单独的MOSFET可以并排集成到管芯中,以形成MOSFET与具有焊球连接器的顶表面处的相应源极和栅电极的串联连接。 可以为顶部电极提供多个焊球连接器并且布置在各自的平行行中。 模具可以具有细长矩形的形状,其中焊球对称地对准矩形的对角线。

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