公开(公告)号：US20110097846A1

公开(公告)日：2011-04-28

申请号：US12817304

申请日：2010-06-17

Applicant: Son-Kwan HWANG ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

Inventor： Son-Kwan HWANG ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

IPC: H01L21/50 ,  H01L21/768

CPC classification number: H01L24/11 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05599 ,  H01L2224/05647 ,  H01L2224/1147 ,  H01L2224/11902 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/9201 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/10329 ,  H01L2224/05552

Abstract: A semiconductor chip comprises a substrate including a front surface and a rear surface, the substrate having a first via hole formed in the front surface and a second via hole formed in the rear surface, a first conductive plug formed on the substrate, the first conductive plug including a first portion formed in the first via hole and a second portion protruding from the front surface of the substrate, and a second conductive plug formed on the first conductive plug, the second conductive plug having a smaller cross-sectional area than the first conductive plug.

Abstract translation: 一种半导体芯片，包括：具有前表面和后表面的基板，所述基板具有形成在所述前表面上的第一通孔和形成在所述后表面中的第二通孔，形成在所述基板上的第一导电塞，所述第一导电 所述插头包括形成在所述第一通孔中的第一部分和从所述基板的前表面突出的第二部分，以及形成在所述第一导电插塞上的第二导电插塞，所述第二导电插塞具有比所述第一通孔更小的横截面积 导电插头

公开(公告)号：US07897511B2

公开(公告)日：2011-03-01

申请号：US12053478

申请日：2008-03-21

Applicant: In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

Inventor： In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

IPC: H01L21/44

CPC classification number: H01L21/76898 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11462 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13147 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01055 ,  H01L2924/0106 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/19043 ,  H01L2224/05552

Abstract: A method of manufacturing a semiconductor device includes forming an integrated circuit region on a semiconductor wafer. A first metal layer pattern is formed over the integrated circuit region. A via hole is formed to extend through the first metal layer pattern and the integrated circuit region. A final metal layer pattern is formed over the first metal layer pattern and within the via hole. A plug is formed within the via hole. Thereafter, a passivation layer is formed to overlie the final metal layer pattern.

Abstract translation: 一种制造半导体器件的方法包括在半导体晶片上形成集成电路区域。 在集成电路区域上形成第一金属层图案。 通孔形成为延伸穿过第一金属层图案和集成电路区域。 最终的金属层图案形成在第一金属层图案之上并且在通孔内。 在通孔内形成插头。 此后，形成钝化层以覆盖最终金属层图案。

公开(公告)号：US20050104222A1

公开(公告)日：2005-05-19

申请号：US10944613

申请日：2004-09-20

Applicant: Se-Young Jeong ,  Gu-Sung Kim ,  Nam-Seog Kim ,  Gi-Hwan Park ,  Se-Yong Oh ,  Soon-Bum Kim ,  In-Young Lee

Inventor： Se-Young Jeong ,  Gu-Sung Kim ,  Nam-Seog Kim ,  Gi-Hwan Park ,  Se-Yong Oh ,  Soon-Bum Kim ,  In-Young Lee

IPC: H01L23/28 ,  H01L21/60 ,  H01L23/16 ,  H01L23/31 ,  H01L23/485 ,  H01L23/498 ,  H05K3/34 ,  H01L23/48

CPC classification number: H01L24/13 ,  H01L23/16 ,  H01L23/3114 ,  H01L23/49838 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/30 ,  H01L24/32 ,  H01L24/73 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06102 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13169 ,  H01L2224/1357 ,  H01L2224/13611 ,  H01L2224/1403 ,  H01L2224/14051 ,  H01L2224/14131 ,  H01L2224/14136 ,  H01L2224/14155 ,  H01L2224/16 ,  H01L2224/1601 ,  H01L2224/29011 ,  H01L2224/29013 ,  H01L2224/29076 ,  H01L2224/30155 ,  H01L2224/30156 ,  H01L2224/73103 ,  H01L2224/73203 ,  H01L2224/81141 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2924/00013 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/351 ,  H05K3/3436 ,  H05K2201/094 ,  H05K2203/0465 ,  Y02P70/613 ,  H01L2924/00014 ,  H01L2924/01028 ,  H01L2924/01083 ,  H01L2224/13099 ,  H01L2924/00012 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2924/013

Abstract: A flip chip device may have a semiconductor chip with an active surface on which chip pads and a protective layer may be provided. Solder bumps may be provided on the active surface and electrically connected to the chip pads. And a solder bar may be provided on a portion of the protective layer. The solder bar may disperse thermal stress produced in the solder bumps. A metal core may be embedded within the solder bar. The flip chip device may be mounted on and flip-chip bonded to a substrate. The substrate may have land pads to which the solder bumps and the solder bar may be mechanically joined. The solder bar increases a joint area between the flip chip device and the substrate and reinforces solder connections therebetween.

Abstract translation: 倒装芯片器件可以具有其上可以设置有芯片焊盘和保护层的有源表面的半导体芯片。 可以在活性表面上提供焊料凸块并电连接到芯片焊盘。 并且可以在保护层的一部分上设置焊料条。 焊料棒可能会分散焊料凸点产生的热应力。 金属芯可以嵌入在焊条内。 倒装芯片器件可以安装在衬底上并倒装芯片结合到衬底上。 衬底可以具有焊盘，焊盘和焊条可以焊接到其上。 焊条增加了倒装芯片器件和衬底之间的接合面积，并加强了它们之间的焊接连接。

公开(公告)号：US08482129B2

公开(公告)日：2013-07-09

申请号：US13027594

申请日：2011-02-15

Applicant: In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

Inventor： In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

IPC: H01L23/48

CPC classification number: H01L21/76898 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11462 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13147 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01055 ,  H01L2924/0106 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/19043 ,  H01L2224/05552

Abstract: A method of manufacturing a semiconductor device includes forming an integrated circuit region on a semiconductor wafer. A first metal layer pattern is formed over the integrated circuit region. A via hole is formed to extend through the first metal layer pattern and the integrated circuit region. A final metal layer pattern is formed over the first metal layer pattern and within the via hole. A plug is formed within the via hole. Thereafter, a passivation layer is formed to overlie the final metal layer pattern.

Abstract translation: 一种制造半导体器件的方法包括在半导体晶片上形成集成电路区域。 在集成电路区域上形成第一金属层图案。 通孔形成为延伸穿过第一金属层图案和集成电路区域。 最终的金属层图案形成在第一金属层图案之上并且在通孔内。 在通孔内形成插头。 此后，形成钝化层以覆盖最终金属层图案。

公开(公告)号：US07943544B2

公开(公告)日：2011-05-17

申请号：US12007746

申请日：2008-01-15

Applicant: In-Young Lee ,  Jung-Bin Lee ,  Dong-Wha Kim

Inventor： In-Young Lee ,  Jung-Bin Lee ,  Dong-Wha Kim

IPC: B01J38/02

CPC classification number: B01J23/92 ,  B01J21/20 ,  B01J38/48 ,  B01J38/60 ,  B01J38/62 ,  Y10S502/514 ,  Y10S502/515 ,  Y10T436/22

Abstract: The present invention provides a method of recycling a spent flue gas denitration catalyst and a method of determining a washing time of the spent flue gas denitration catalyst. The method of recycling the spent flue gas denitration catalyst includes physically removing solids deposited in the spent flue gas denitration catalyst, removing poisoning substances deposited in the spent flue gas denitration catalyst by washing the spent flue gas denitration catalyst with a washing liquid for a washing time determined by measuring the hydrogen ion concentration of the washing liquid and drying the resulting spent flue gas denitration catalyst.

Abstract translation: 本发明提供了废废气脱硝催化剂的再循环方法和废烟气脱硝催化剂的洗涤时间的测定方法。 废弃废气脱硝催化剂的再循环方法包括物理去除废烟道气脱硝催化剂中沉积的固体，通过用洗涤液洗涤废烟道脱硝催化剂洗涤废废气脱硝催化剂中的中毒物质，洗涤时间 通过测量洗涤液的氢离子浓度和干燥所得到的废烟气脱硝催化剂来测定。

公开(公告)号：US07312143B2

公开(公告)日：2007-12-25

申请号：US11717691

申请日：2007-03-14

Applicant: Myeong-Soon Park ,  Hyun-Soo Chung ,  In-Young Lee ,  Jae-Sik Chung ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Young-Hee Song ,  Seung-Kwan Ryu

Inventor： Myeong-Soon Park ,  Hyun-Soo Chung ,  In-Young Lee ,  Jae-Sik Chung ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Young-Hee Song ,  Seung-Kwan Ryu

IPC: H01L23/48

CPC classification number: H01L23/3114 ,  H01L23/525 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02165 ,  H01L2224/02335 ,  H01L2224/02351 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05548 ,  H01L2224/05557 ,  H01L2224/05569 ,  H01L2224/10125 ,  H01L2224/13006 ,  H01L2224/13011 ,  H01L2224/13018 ,  H01L2224/13099 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2924/00 ,  H01L2224/05599

Abstract: A wafer level chip scale package may have a gap provided between a solder bump and a bump land. The gap may be filled with a gas. A method of manufacturing a wafer level chip scale package may involve forming a redistribution line having a first opening, forming a seed metal layer having a second opening including an undercut portion, and forming the gap using the first and the second openings.

Abstract translation: 晶片级芯片级封装可以具有设置在焊料凸块和凸起焊盘之间的间隙。 间隙可以填充气体。 制造晶片级芯片级封装的方法可以包括形成具有第一开口的再分配线，形成具有包括底切部分的第二开口的种子金属层，以及使用第一和第二开口形成间隙。

公开(公告)号：US20070205512A1

公开(公告)日：2007-09-06

申请号：US11785980

申请日：2007-04-23

Applicant: In-Young Lee ,  Gu-Sung Kim ,  Se-Young Jeong ,  Sun-Young Park

Inventor： In-Young Lee ,  Gu-Sung Kim ,  Se-Young Jeong ,  Sun-Young Park

IPC: H01L23/48

CPC classification number: H01L24/13 ,  H01L24/11 ,  H01L2224/05001 ,  H01L2224/05026 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05671 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13169 ,  H01L2224/136 ,  H01L2224/13611 ,  H01L2224/13613 ,  H01L2224/13616 ,  H01L2224/13639 ,  H01L2224/13644 ,  H01L2224/13647 ,  H01L2224/13655 ,  H01L2224/16 ,  H01L2924/0001 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/351 ,  H05K3/3436 ,  H05K2201/0367 ,  H05K2203/0465 ,  Y02P70/613 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A solder bump structure may have a metal stud formed on a chip pad of a semiconductor chip. Surfaces of the metal stud may be plated with a solder. The metal stud may be located on a substrate pad of the substrate. The substrate pad may have a pre-solder applied thereto. After a solder reflow, the solder bump may have a concave shape.

Abstract translation: 焊料凸块结构可以具有形成在半导体芯片的芯片焊盘上的金属螺柱。 金属螺柱的表面可以镀有焊料。 金属螺柱可以位于衬底的衬底焊盘上。 衬底垫可以具有施加到其上的预焊料。 在焊料回流之后，焊料凸点可以具有凹形。

公开(公告)号：US20070170556A1

公开(公告)日：2007-07-26

申请号：US11635011

申请日：2006-12-07

Applicant: Hyun-Soo Chung ,  Dong-Hyeon Jang ,  In-Young Lee ,  Dong-Ho Lee

Inventor： Hyun-Soo Chung ,  Dong-Hyeon Jang ,  In-Young Lee ,  Dong-Ho Lee

IPC: H01L23/495

CPC classification number: H01L24/10 ,  H01L24/13 ,  H01L2224/05001 ,  H01L2224/05022 ,  H01L2224/05024 ,  H01L2224/05548 ,  H01L2224/05557 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H05K1/111 ,  H05K3/062 ,  H05K3/3452 ,  H05K3/3457 ,  H05K2201/09745 ,  H05K2203/1184 ,  Y02P70/611 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/05099

Abstract: A semiconductor device may include a semiconductor element. A layer of material may be provided on the semiconductor element which may have an opening through which a bond pad may be exposed. At least one flange structure may be provided on the first bond pad, the at least one flange structure made of at least two metal layers with different etch rates.

Abstract translation: 半导体器件可以包括半导体元件。 可以在半导体元件上提供一层材料，该层可以具有可以暴露接合焊盘的开口。 可以在第一接合焊盘上提供至少一个凸缘结构，所述至少一个凸缘结构由具有不同蚀刻速率的至少两个金属层制成。

公开(公告)号：US20060214293A1

公开(公告)日：2006-09-28

申请号：US11186763

申请日：2005-07-22

Applicant: Myeong-Soon Park ,  Hyun-Soo Chung ,  In-Young Lee ,  Jae-Sik Chung ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Young-Hee Song ,  Seung-Kwan Ryu

Inventor： Myeong-Soon Park ,  Hyun-Soo Chung ,  In-Young Lee ,  Jae-Sik Chung ,  Sung-Min Sim ,  Dong-Hyeon Jang ,  Young-Hee Song ,  Seung-Kwan Ryu

IPC: H01L21/44 ,  H01L23/48

CPC classification number: H01L23/3114 ,  H01L23/525 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02165 ,  H01L2224/02335 ,  H01L2224/02351 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05548 ,  H01L2224/05557 ,  H01L2224/05569 ,  H01L2224/10125 ,  H01L2224/13006 ,  H01L2224/13011 ,  H01L2224/13018 ,  H01L2224/13099 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2924/00 ,  H01L2224/05599

Abstract: A wafer level chip scale package may have a gap provided between a solder bump and a bump land. The gap may be filled with a gas. A method of manufacturing a wafer level chip scale package may involve forming a redistribution line having a first opening, forming a seed metal layer having a second opening including an undercut portion, and forming the gap using the first and the second openings.

Abstract translation: 晶片级芯片级封装可以具有设置在焊料凸块和凸起焊盘之间的间隙。 间隙可以填充气体。 制造晶片级芯片级封装的方法可以包括形成具有第一开口的再分配线，形成具有包括底切部分的第二开口的种子金属层，以及使用第一和第二开口形成间隙。

公开(公告)号：US08119448B2

公开(公告)日：2012-02-21

申请号：US12817304

申请日：2010-06-17

Applicant: Son-Kwan Hwang ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

Inventor： Son-Kwan Hwang ,  In-Young Lee ,  Ho-Jin Lee ,  Dong-Hyeon Jang

IPC: H01L21/00

CPC classification number: H01L24/11 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/05599 ,  H01L2224/05647 ,  H01L2224/1147 ,  H01L2224/11902 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/9201 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/10329 ,  H01L2224/05552

Abstract: A semiconductor chip comprises a substrate including a front surface and a rear surface, the substrate having a first via hole formed in the front surface and a second via hole formed in the rear surface, a first conductive plug formed on the substrate, the first conductive plug including a first portion formed in the first via hole and a second portion protruding from the front surface of the substrate, and a second conductive plug formed on the first conductive plug, the second conductive plug having a smaller cross-sectional area than the first conductive plug.

Abstract translation: 一种半导体芯片，包括：具有前表面和后表面的基板，所述基板具有形成在所述前表面上的第一通孔和形成在所述后表面中的第二通孔，形成在所述基板上的第一导电塞，所述第一导电 所述插头包括形成在所述第一通孔中的第一部分和从所述基板的前表面突出的第二部分，以及形成在所述第一导电插塞上的第二导电插塞，所述第二导电插塞具有比所述第一通孔更小的横截面积 导电插头