公开(公告)号：US20160223434A1

公开(公告)日：2016-08-04

申请号：US15005109

申请日：2016-01-25

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masakatsu HASUDA ,  Toshiyuki IWAHORI

IPC: G01N1/14

CPC classification number: G01N1/14 ,  H01J37/20 ,  H01J2237/202 ,  H01J2237/31745

Abstract: Disclosed herein is a sample carrying device that can easily stow a sample carrying rod in a small space. The sample carrying device includes the sample carrying rod that carries a sample in the left-right direction in a sample compartment and a preparatory sample compartment, a support body that supports the sample carrying rod, a case that supports the support body such that the support body can rotate around a rotational axis perpendicular to the left-right direction, and a third O-ring that is disposed between the support body and the case and seals the sample compartment and the preparatory sample compartment. The sample carrying rod can be switched between the use state where it can carry a sample and the stowed state where it has been moved in the up-down direction from the use state by rotation of the support body.

Abstract translation: 本文公开了一种可以容易地将样品携带杆收纳在小空间中的样品携带装置。 样品携带装置包括样品携带杆，样品携带杆在样品室中沿左右方向携带样品，准备样品室，支撑样品携带杆的支撑体，支撑支撑体的壳体，使得支撑体 主体可以围绕垂直于左右方向的旋转轴线旋转，以及设置在支撑体和壳体之间并密封样品室和准备样品室的第三O形环。 样品承载杆可以在可携带样品的使用状态和通过支撑体的旋转从使用状态沿上下方向移动的收起状态之间切换。

公开(公告)号：US20130240730A1

公开(公告)日：2013-09-19

申请号：US13839862

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masakatsu HASUDA

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/204 ,  H01J2237/31713

Abstract: A charged particle beam apparatus includes: a sample chamber; a sample stage; an electron beam irradiation system for irradiating the sample with an electron beam; a focused ion beam irradiation system for irradiating the sample with a focused ion beam; a sample stage drive unit having a rotational axis orthogonal to at least one of an irradiation axis of the electron beam irradiation system and an irradiation axis of the focused ion beam irradiation system; and a sample transporting mechanism for transporting the sample to the sample stage. The sample transporting mechanism includes a transportation path provided in the sample stage drive unit in a direction parallel to the rotational axis of the sample stage drive unit, and is configured to transport the sample to the sample stage through the transportation path.

Abstract translation: 带电粒子束装置包括：样品室; 样品台 用于用电子束照射样品的电子束照射系统; 聚焦离子束照射系统，用于用聚焦离子束照射样品; 样品台驱动单元，其具有与电子束照射系统的照射轴和聚焦离子束照射系统的照射轴中的至少一个正交的旋转轴; 以及用于将样品输送到样品台的样品传送机构。 样品输送机构包括在与样品台驱动单元的旋转轴平行的方向上设置在样品台驱动单元中的输送路径，并且被配置为通过输送路径将样品输送到样品台。

公开(公告)号：US20200310246A1

公开(公告)日：2020-10-01

申请号：US16785368

申请日：2020-02-07

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoshitomo NAKAGAWA ,  Mitsuto ASO ,  Katsumi SUZUKI ,  Mamoru OKABE ,  Masakatsu HASUDA

IPC: G03F1/74 ,  H01J37/317

Abstract: Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.

公开(公告)号：US20180286628A1

公开(公告)日：2018-10-04

申请号：US15936174

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masakatsu HASUDA

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20242 ,  H01J2237/31745

Abstract: Disclosed herein is a charged particle beam apparatus. The apparatus includes a charged particle beam column irradiating a sample with a charged particle beam, a sample stage unit moving the sample relative to the charged particle beam column, the sample stage unit including a rotary stage section having a base portion and a rotary mover rotating about a rotary axis relative to the base portion, a rotary connector placed coaxially with the rotary axis and fitted between the base portion and the rotary mover, and a first connection electrode disposed on the sample stage unit in electrical connection with the rotary connector. In the charged particle beam apparatus, the sample is able to be rapidly placed and replaced.

公开(公告)号：US20170271119A1

公开(公告)日：2017-09-21

申请号：US15461408

申请日：2017-03-16

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tsuyoshi OONISHI ,  Masakatsu HASUDA

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/09 ,  H01J37/023 ,  H01J37/20 ,  H01J37/28 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/022 ,  H01J2237/2809 ,  H01J2237/2813 ,  H01J2237/31745

Abstract: Disclosed herein is a composite charged particle beam apparatus including a focused ion beam column and an electron beam column, the apparatus preventing the electron beam column from being contaminated so as to emit an electron beam with high precision. The apparatus includes: a sample tray on which a sample is placed; a focused ion beam column irradiating the sample by using a focused ion beam; an electron beam column irradiating the sample by using an electron beam; a sample chamber receiving the sample tray, and the columns therein; an anti-contamination plate moving between an inserted position inserted into a space between a beam emission surface of the electron beam column and the sample tray, and an open position withdrawn from the space between the beam emission surface and the sample tray; and an operation unit operating the anti-contamination plate to move between the positions.