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23 条记录 (耗时 0.024 秒)

    Vacuum plasma generator
    1.
    发明授权
    Vacuum plasma generator 有权
    真空等离子发生器

    公开(公告)号：US07455755B2

    公开(公告)日：2008-11-25

    申请号：US11817443

    申请日：2006-03-20

    申请人： Gerhard Tuymer ,  Jürgen Ramm ,  Daniel Lendi

    发明人： Gerhard Tuymer ,  Jürgen Ramm ,  Daniel Lendi

    IPC分类号： C23C14/00

    CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H02M7/10

    摘要： The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9′) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9′). The DC/DC voltage converter (7) has at least two floating transformer secondary circuits (23) and comprises a switch-over device (20) with a switch controller (22) for optionally switching the floating transformer secondary circuits (23) in parallel or in series.

    摘要翻译： 本发明涉及一种用于通过脉冲等离子体处理在真空室（2）中提供用于处理工件（5）的等离子体放电（10）的真空等离子体发生器。 所述真空等离子体发生器包括具有AC电源（6a）的发电机输出（9,9'），用于将AC电源电压整流为DC电压的AC / DC电源整流器系统（6），滤波电容器 b），作为时钟的DC / DC电压转换器（7）的第一级，具有用于调节产生中间电路电压（Uz）的DC输出电压的装置，包括受控电源开关（7a），其馈送一个 变压器（14），其次级绕组连接到整流器（15）和下游中间电容器（12），并构成浮动变压器次级电路（23）。 所述次级电路连接到作为脉冲输出级（8）并连接到发电机输出（9,9'）的下游第二级。 DC / DC电压转换器（7）具有至少两个浮动变压器次级电路（23），并且包括具有开关控制器（22）的切换装置（20），用于可选地平行地切换浮动变压器次级电路（23） 或串联。

    METHOD FOR PRODUCING COATINGS WITH A SINGLE COMPOSITE TARGET
    5.
    发明申请
    METHOD FOR PRODUCING COATINGS WITH A SINGLE COMPOSITE TARGET 有权
    用单一复合材料制造涂料的方法

    公开(公告)号：US20120160665A1

    公开(公告)日：2012-06-28

    申请号：US13386093

    申请日：2010-07-16

    申请人： Jürgen Ramm ,  Beno Widrìg ,  Helmut Rudígìer

    发明人： Jürgen Ramm ,  Beno Widrìg ,  Helmut Rudígìer

    IPC分类号： C23C14/32

    CPC分类号： C23C14/325 ,  C23C14/0084 ,  C23C14/06

    摘要： The invention pertains to a method for the production of coatings by physical vapor deposition (PVD), wherein a binary target or a target with more than two constituents is evaporated in a curvilinear cathodic arc discharge, causing the ions with different masses (elements) to be splitted and the ion splitting results in variations for the ratio of the different masses (elements) at different positions in the deposition chamber.

    摘要翻译： 本发明涉及通过物理气相沉积（PVD）制备涂层的方法，其中在曲线阴极电弧放电中蒸发具有多于两种成分的二元靶或靶，导致具有不同质量（元素）的离子 被分裂并且离子分裂导致沉积室中不同位置处的不同质量（元素）的比率的变化。

    Process for manufacturing coated plastic body
    6.
    发明授权
    Process for manufacturing coated plastic body 失效
    制造涂层塑料体的工艺

    公开(公告)号：US06383573B1

    公开(公告)日：2002-05-07

    申请号：US09572089

    申请日：2000-05-17

    申请人： Eugen Beck ,  Jürgen Ramm ,  Heinrich Zimmermann

    发明人： Eugen Beck ,  Jürgen Ramm ,  Heinrich Zimmermann

    IPC分类号： C08J718

    CPC分类号： C23C14/022 ,  C23C16/0245

    摘要： A process is provided for producing coated synthetic bodies during which, before the coating, the surface to be coated is subjected to a pretreatment in an excited gas atmosphere. The surface is then coated. The gas atmosphere is predominantly formed of a noble gas and nitrogen and/or hydrogen, and the ionic energy in the gas atmosphere and in the are of the surface to be coated is not more than 50 eV. The ionic energy is selected to be not more than 20 eV, preferable not more than 10 eV. The gas atmosphere is excited by means of a plasma discharge or by means of UV radiation.

    摘要翻译： 提供了一种制造涂覆合成物体的方法，其中在涂覆之前，待被涂覆的表面在受激气体气氛中进行预处理。 然后涂覆表面。 气体气氛主要由惰性气体和氮气和/或氢气形成，气体气氛中和被涂覆表面的离子能量不超过50eV。 离子能量选择为不超过20eV，优选不大于10eV。 通过等离子体放电或通过紫外线辐射来激发气体气氛。

    Method for removing hard carbon layers
    8.
    发明授权
    Method for removing hard carbon layers 有权
    去除硬碳层的方法

    公开(公告)号：US09230778B2

    公开(公告)日：2016-01-05

    申请号：US14124394

    申请日：2012-05-31

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： H01L21/302 ,  H01L21/461 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F3/00 ,  H01J37/32 ,  H01L21/311 ,  C23C16/02 ,  H01L21/02 ,  H01L29/66

    CPC分类号： H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

    摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    摘要翻译： 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

    CARBON SPARK EVAPORATION
    9.
    发明申请
    CARBON SPARK EVAPORATION 有权
    碳泡沫蒸发

    公开(公告)号：US20140054165A1

    公开(公告)日：2014-02-27

    申请号：US14110982

    申请日：2012-03-26

    申请人： Jürgen Ramm ,  Beno Widrig ,  Kurt Ruhm

    发明人： Jürgen Ramm ,  Beno Widrig ,  Kurt Ruhm

    IPC分类号： H01J37/32 ,  H05B7/20 ,  H05B7/148

    CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/32064 ,  H05B7/148 ,  H05B7/20 ,  H05H2001/4682

    摘要： The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

    摘要翻译： 本发明涉及一种操作脉冲不连续火花放电的方法。 火花通过电容器馈电。 在脉冲之间有关闭时间间隔，在此期间没有火花电流流动。 在脉冲内，也就是说，在接通时间间隔期间，在达到电流阈值时停止供电，并且重新开始，从而在脉冲内发生子脉冲。 根据本发明选择时间间隔和子脉冲，使得当电容器再次接通时，火花放电容易再次点燃。

    Layer system with at least one mixed crystal layer of a multi-oxide
    10.
    发明授权
    Layer system with at least one mixed crystal layer of a multi-oxide 有权
    具有至少一个多氧化物混合晶层的层系统

    公开(公告)号：US07939181B2

    公开(公告)日：2011-05-10

    申请号：US11548529

    申请日：2006-10-11

    申请人： Jürgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    发明人： Jürgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    IPC分类号： B32B18/00 ,  B32B15/04

    CPC分类号： C23C14/027 ,  B29C33/38 ,  B29C33/56 ,  B29K2907/04 ,  C23C14/0021 ,  C23C14/022 ,  C23C14/08 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/12667

    摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.

    摘要翻译： 用于涂覆工件的PVD层系统包括具有以下组成的多氧化物的至少一个混晶层：（Me11-xMe2x）2O3，其中Me1和Me2各自表示元素Al，Cr， Fe，Li，Mg，Mn，Nb，Ti，Sb或V.Me1和Me2的元素彼此不同。 PVD层系统中的混晶层的晶格具有刚玉结构，其在混合晶体层的x射线衍射分析光谱中的特征在于与刚玉结构相关联的至少三条线。 还公开了一种用于制备多氧化物的混合层的真空涂覆方法，以及相应地涂覆的工具和组件。