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    CARBON SPARK EVAPORATION
    2.
    发明申请
    CARBON SPARK EVAPORATION 有权
    碳泡沫蒸发

    公开(公告)号：US20140054165A1

    公开(公告)日：2014-02-27

    申请号：US14110982

    申请日：2012-03-26

    申请人： Jürgen Ramm ,  Beno Widrig ,  Kurt Ruhm

    发明人： Jürgen Ramm ,  Beno Widrig ,  Kurt Ruhm

    IPC分类号： H01J37/32 ,  H05B7/20 ,  H05B7/148

    CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/32064 ,  H05B7/148 ,  H05B7/20 ,  H05H2001/4682

    摘要： The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

    摘要翻译： 本发明涉及一种操作脉冲不连续火花放电的方法。 火花通过电容器馈电。 在脉冲之间有关闭时间间隔，在此期间没有火花电流流动。 在脉冲内，也就是说，在接通时间间隔期间，在达到电流阈值时停止供电，并且重新开始，从而在脉冲内发生子脉冲。 根据本发明选择时间间隔和子脉冲，使得当电容器再次接通时，火花放电容易再次点燃。

    METHOD FOR REMOVING HARD CARBON LAYERS
    4.
    发明申请
    METHOD FOR REMOVING HARD CARBON LAYERS 有权
    去除硬碳层的方法

    公开(公告)号：US20140224768A1

    公开(公告)日：2014-08-14

    申请号：US14124394

    申请日：2012-05-31

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

    摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    摘要翻译： 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

    Synthesis of metal oxides by reactive cathodic arc evaporation
    6.
    发明授权
    Synthesis of metal oxides by reactive cathodic arc evaporation 有权

    公开(公告)号：US10711341B2

    公开(公告)日：2020-07-14

    申请号：US13579956

    申请日：2011-02-10

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C14/32

    摘要： In these investigations, an attempt has been made to correlate the deposition parameters of the reactive cathodic arc evaporation with processes at the surface of the composite Al—Cr targets and the nucleation and phase formation of the synthesized Al—Cr—O layers. The oxygen partial pressure and the pulsed operation of the arc current influence the formation of intermetallic phases and solid solutions at the target surface. The nucleation of the ternary oxides at the substrate site appears to be, to some extent, controllable by the intermetallics or solid solutions formed at the target surface. A specific nucleation process at substrate site can therefore be induced by the free choice of target composition in combination with the partial pressure of the oxygen reactive gas. It also allows the control over the oxide island growth at the target surface which occurs occasionally at higher oxygen partial pressure. This hypothesis is supported by the X-ray diffraction analysis of the layers as well as of the target surface.

    Method for manufacturing poorly conductive layers
    7.
    发明授权
    Method for manufacturing poorly conductive layers 有权
    制造导电不良层的方法

    公开(公告)号：US07857948B2

    公开(公告)日：2010-12-28

    申请号：US11458444

    申请日：2006-07-19

    申请人： Jürgen Ramm ,  Beno Widrig ,  Christian Wohlrab

    发明人： Jürgen Ramm ,  Beno Widrig ,  Christian Wohlrab

    IPC分类号： C23C14/34

    CPC分类号： C23C14/325 ,  H01J37/32055 ,  H01J37/3266 ,  H01J37/34

    摘要： Method for producing poorly conductive and in particular nonconductive layers on at least one work piece by means of a vacuum-coating process in which an electric arc discharge is activated between at least one anode and the cathode of an arc source in a reactive-gas atmosphere, whereby on the surface of a target that is electrically connected to the cathode either none or only a small outer magnetic field is generated that extends essentially perpendicular to the target surface for assisting the evaporation process, the degree of recoating of the target surface by other coating sources is less than 10%, and the magnetic field is generated with a magnet system that encompasses at least one axially polarized coil with a geometry similar to the circumference of the target.

    摘要翻译： 通过真空镀膜工艺在至少一个工件上制造导电不良且特别是非导电层的方法，其中电弧放电在反应气体气氛中的电弧源的至少一个阳极和阴极之间被激活 ，由此在与阴极电连接的靶的表面上，不产生仅仅基本上垂直于目标表面延伸的辅助蒸发过程的小的外部磁场，由另外的目标表面重涂的程度 涂覆源小于10％，并且磁场是用包含至少一个轴向极化线圈的磁体系统产生的，其具有类似于目标周长的几何形状。

    Method for removing hard carbon layers
    9.
    发明授权
    Method for removing hard carbon layers 有权
    去除硬碳层的方法

    公开(公告)号：US09230778B2

    公开(公告)日：2016-01-05

    申请号：US14124394

    申请日：2012-05-31

    申请人： Jürgen Ramm ,  Beno Widrig

    发明人： Jürgen Ramm ,  Beno Widrig

    IPC分类号： H01L21/302 ,  H01L21/461 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F3/00 ,  H01J37/32 ,  H01L21/311 ,  C23C16/02 ,  H01L21/02 ,  H01L29/66

    CPC分类号： H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

    摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    摘要翻译： 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

    Layer system with at least one mixed crystal layer of a multi-oxide
    10.
    发明授权
    Layer system with at least one mixed crystal layer of a multi-oxide 有权
    具有至少一个多氧化物混合晶层的层系统

    公开(公告)号：US07939181B2

    公开(公告)日：2011-05-10

    申请号：US11548529

    申请日：2006-10-11

    申请人： Jürgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    发明人： Jürgen Ramm ,  Beno Widrig ,  Michael Ante ,  Christian Wohlrab

    IPC分类号： B32B18/00 ,  B32B15/04

    CPC分类号： C23C14/027 ,  B29C33/38 ,  B29C33/56 ,  B29K2907/04 ,  C23C14/0021 ,  C23C14/022 ,  C23C14/08 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/12667

    摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.

    摘要翻译： 用于涂覆工件的PVD层系统包括具有以下组成的多氧化物的至少一个混晶层：（Me11-xMe2x）2O3，其中Me1和Me2各自表示元素Al，Cr， Fe，Li，Mg，Mn，Nb，Ti，Sb或V.Me1和Me2的元素彼此不同。 PVD层系统中的混晶层的晶格具有刚玉结构，其在混合晶体层的x射线衍射分析光谱中的特征在于与刚玉结构相关联的至少三条线。 还公开了一种用于制备多氧化物的混合层的真空涂覆方法，以及相应地涂覆的工具和组件。