公开(公告)号：US6002740A

公开(公告)日：1999-12-14

申请号：US942757

申请日：1997-10-02

申请人： Franco Cerrina ,  Thomas B. Lucatorto

发明人： Franco Cerrina ,  Thomas B. Lucatorto

IPC分类号： G01B15/02 ,  G01B15/06 ,  G03F1/22 ,  G03F1/24 ,  G03F1/84 ,  G03F7/20

CPC分类号： G03F1/84 ,  G01B15/025 ,  G01B15/06 ,  G03F1/22 ,  G03F1/24 ,  G03F7/7065 ,  G03F7/70666

摘要： Inspection of objects such as X-ray lithography masks is carried out by passing X-rays or extreme ultraviolet light through an object which absorbs in a pattern to provide a patterned X-ray or ultraviolet image which is then directed to a converter. The converter converts the image incident upon it to an image formed by electrons emitted from the converter. The emitted electrons are magnified in an electron microscope and the magnified electron image is displayed by the electron microscope. The visible image may be further digitized and processed by a computer, including long-term storage or display on a computer monitor. X-ray lithography masks may be inspected by passing X-rays through masks of the same type that will be used for lithography so that the magnified image of the X-rays passed through the masks corresponds to the pattern of X-rays that will be incident on a photoresist, allowing accurate inspection of X-ray masks before use.

摘要翻译： 通过将X射线或极紫外光通过吸收图案的物体进行X射线光刻掩模等物体的检查，得到图案化的X射线或紫外线，然后将其导向转换器。 转换器将入射到其上的图像转换成由转换器发射的电子形成的图像。 发射的电子在电子显微镜中放大，放大的电子图像通过电子显微镜显示。 可视图像可以被计算机进一步数字化和处理，包括在计算机监视器上的长期存储或显示。 可以通过将X射线通过用于光刻的相同类型的掩模来检查X射线光刻掩模，使得通过掩模的X射线的放大图像对应于将被 入射到光致抗蚀剂上，允许在使用前对X射线掩模进行精确检查。

公开(公告)号：US20090080053A1

公开(公告)日：2009-03-26

申请号：US11859404

申请日：2007-09-21

申请人： Franco Cerrina ,  Omar Negrete

发明人： Franco Cerrina ,  Omar Negrete

IPC分类号： G02F1/01 ,  G02F1/00

CPC分类号： G03F7/70341 ,  B01J19/0046 ,  B01J2219/00434 ,  B01J2219/00439 ,  B01J2219/00448 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00608 ,  B01J2219/00659 ,  B01J2219/00689 ,  B01J2219/00722 ,  C40B50/14 ,  C40B60/14 ,  G02B17/061 ,  G03F7/70291 ,  G03F7/70725

摘要： A device and a method for synthesizing a microarray are provided. The device includes a reduction optics assembly and a target assembly. The reduction optics assembly is configured to receive a light array of selectable regions of light and dark areas, to reduce a size of the light array in two-dimensions, and to project a pattern of the light array on a target surface. The target assembly includes a first stage and a second stage. The first stage is configured to move the target surface in at least two directions in plane with the projected pattern with a first precision. The second stage is mounted to the first stage and is configured to move the target surface in the at least two directions in plane with the projected pattern with a second precision that is smaller than the first precision.

摘要翻译： 提供了一种用于合成微阵列的装置和方法。 该装置包括减速光学组件和目标组件。 还原光学组件被配置为接收光和暗区域的可选择区域的光阵列，以减小二维光阵列的尺寸，并将光阵列的图案投射在目标表面上。 目标组件包括第一阶段和第二阶段。 第一阶段被配置为以具有第一精度的投影图案在平面中的至少两个方向上移动目标表面。 第二阶段被安装到第一阶段，并且被配置为使平面中的至少两个方向上的目标表面以具有小于第一精度的第二精度的投影图案移动。

公开(公告)号：US07722824B2

公开(公告)日：2010-05-25

申请号：US11497544

申请日：2006-08-01

申请人： Viktoriya N. Golovkina ,  Franco Cerrina

发明人： Viktoriya N. Golovkina ,  Franco Cerrina

IPC分类号： B01J19/00

CPC分类号： B01J19/0046 ,  B01J2219/00286 ,  B01J2219/00434 ,  B01J2219/00439 ,  B01J2219/00441 ,  B01J2219/0045 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00689 ,  B01J2219/00722 ,  G02B17/0663 ,  G02B26/0833

摘要： Synthesis of arrays of chain molecules, such as oligonucleotides, in large quantities can be carried out utilizing projection onto an active substrate of a magnified image of a light emitting object array having selectable regions of light and dark areas forming a pattern. Projection optics formed entirely of mirrors are used to receive the light emitted from the object array and image the pattern of the array onto the active surface of the substrate. The mirrors in the projection optics include a first, concave mirror, a second, convex mirror, a third, concave mirror, and a fourth, convex mirror, each receiving the beam of light in turn, with the light reflected from the fourth mirror being imaged onto the active surface of the substrate with an image area greater than that of the original light emitting array.

摘要翻译： 可以通过投影到具有形成图案的光和暗区域的可选区域的发光物体阵列的放大图像的有源衬底上来进行大量的链分子例如寡核苷酸的阵列的合成。 完全由反射镜形成的投射光学器件用于接收从对象阵列发射的光并将阵列的图案成像到衬底的有源表面上。 投影光学元件中的反射镜包括第一凹面镜，第二凸面镜，第三凹面镜和第四凸面镜，每个反射镜依次接收光束，第四镜反射的光为 以比原始发光阵列大的图像面积成像到衬底的有源表面上。

公开(公告)号：US5536559A

公开(公告)日：1996-07-16

申请号：US343126

申请日：1994-11-22

申请人： Franco Cerrina ,  John P. Wallace

发明人： Franco Cerrina ,  John P. Wallace

IPC分类号： G03F1/00 ,  G03F1/22 ,  G03F7/20 ,  B32B9/00

CPC分类号： G03F1/22 ,  G03F7/707 ,  Y10T279/11 ,  Y10T428/24777 ,  Y10T428/24802

摘要： An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

摘要翻译： 一种成像装置和装置，其减少或消除了安装在其上的成像面罩中感应的应力。 支架包括支撑块和连接到其上的三个安装垫。 至少两个安装垫连接到支撑块，使得它们各自的位置在预定平面内是可调节的，该平面优选地基本上平行于待成像的基板的表面。 每个安装垫包括用于将成像掩模大致平行于预定平面固定的装置。 响应于光刻掩模的固定，可调安装焊盘在预定平面内调整的位置，使得成像掩模由于其固定而基本上未偏转。 由于其被固定到安装座上，成像掩模中不存在变形（并且因此应力）减少了通过掩模和压印表面的辐射的变形程度。

公开(公告)号：US5469263A

公开(公告)日：1995-11-21

申请号：US269978

申请日：1994-07-01

申请人： Whitson G. Waldo, III ,  Gong Chen ,  Franco Cerrina

发明人： Whitson G. Waldo, III ,  Gong Chen ,  Franco Cerrina

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7092 ,  G03F9/7076

摘要： A method for alignment in photolithographic processes includes providing a target (31) comprising features having a characteristic spatial period (P). An optical image of the target is captured, and components (33) of the image lacking the characteristic spatial period (P) are filtered out. The filtered image is integrated in the direction of the characteristic period (P) thereby creating an alignment signal (40). The alignment signal (40) is a symmetric signal which correlates to the symmetric target (31). A linear centroid (41) of the alignment signal is located, and corresponds to the precise linear center of the target (31). Consequently, the linear location of an object (10) upon which the target (31) is printed, can be accurately located. The process is performed in two perpendicular dimensions (x,y) so that the object (10) can be precisely located and positioned in two dimensions (x,y).

摘要翻译： 在光刻工艺中对准的方法包括提供包括具有特征空间周期（P）的特征的目标（31）。 拍摄目标的光学图像，并且滤出缺少特征空间周期（P）的图像的分量（33）。 滤波图像在特征周期（P）的方向上积分，从而产生对准信号（40）。 对准信号（40）是与对称目标（31）相关的对称信号。 定位对准信号的线性中心（41），并对应于目标（31）的精确线性中心。 因此，可以精确地定位打印有目标（31）的物体（10）的线性位置。 该过程在两个垂直维度（x，y）中进行，使得物体（10）可以精确地定位并且被定位在二维（x，y）中。

公开(公告)号：US5272714A

公开(公告)日：1993-12-21

申请号：US806024

申请日：1991-12-12

申请人： Gong Chen ,  Franco Cerrina

发明人： Gong Chen ,  Franco Cerrina

IPC分类号： H01S5/00 ,  H01S5/10 ,  H01S5/12 ,  H01S3/19

CPC分类号： H01S5/12 ,  H01S5/10 ,  H01S5/1039 ,  H01S5/1064 ,  H01S5/1243

摘要： A laser using a distributed phase shift structure is disclosed. The active medium is formed in the shape of a stripe having first and second surfaces and two ends. The stripe includes a large central portion and two end portions with the central portion being of different widths than the two end portions. A laser device which utilizes the active medium of the present invention further includes at least one P-guide layer and at least one N-guide layer, both having a higher bandgap energy than the active medium. The P-guide layer and the N-guide layer are located on opposing surfaces of the active medium. A current which is injected through the N-guide layer, the P-guide layer and the active medium induces single mode, narrow linewidth coherent light to issue from the active medium.

公开(公告)号：US09249175B2

公开(公告)日：2016-02-02

申请号：US13061022

申请日：2009-09-04

申请人： Masad Damha ,  Jeremy Lackey ,  Debbie Mitra ,  Marvin Wickens ,  Franco Cerrina ,  Saima A. Akhtar ,  Mark Somoza

发明人： Masad Damha ,  Jeremy Lackey ,  Debbie Mitra ,  Marvin Wickens ,  Franco Cerrina ,  Mark Somoza

IPC分类号： C40B30/04 ,  C07H21/02 ,  C40B40/06 ,  C07H19/10 ,  C07H19/20 ,  C07H19/067 ,  C07H19/167

CPC分类号： C07H21/02 ,  C07H19/067 ,  C07H19/167 ,  C12Q1/6806 ,  C12Q1/6837 ,  Y02P20/55

摘要： The present invention is directed to RNA monomers comprising O-acetal levulinyl protecting groups at the 2′ and/or the 5′-hydroxy functionalities of the ribose moiety. Said monomers may be incorporated into oligoribonucleotides or RNA polynucleotides. Furthermore, the invention is directed to methods for the synthesis of said RNA monomers, oligoribonucleotides and RNA polynucleotides, as well as methods for their deprotection and methods for the use of said compounds and compositions comprising said compounds. In particular, such compounds and compositions comprising them are used in methods for light-directed synthesis of RNA microarrays.

摘要翻译： 本发明涉及在核糖部分的2'和/或5'-羟基官能团上含有O-缩醛酰乙酰基保护基团的RNA单体。 所述单体可以掺入寡核糖核苷酸或RNA多核苷酸。 此外，本发明涉及用于合成所述RNA单体，寡核糖核苷酸和RNA多核苷酸的方法，以及其脱保护方法及使用所述化合物的方法和包含所述化合物的组合物。 特别地，包含它们的这些化合物和组合物用于RNA微阵列的光定向合成的方法中。

公开(公告)号：US07326514B2

公开(公告)日：2008-02-05

申请号：US10800195

申请日：2004-03-12

申请人： Junyan Dai ,  Christopher K. Ober ,  Lin Wang ,  Franco Cerrina ,  Paul Nealey

发明人： Junyan Dai ,  Christopher K. Ober ,  Lin Wang ,  Franco Cerrina ,  Paul Nealey

IPC分类号： G03C1/73 ,  G03F7/038 ,  G03F7/039

CPC分类号： G03F7/36 ,  C08F8/42 ,  G03F7/0758 ,  Y10S430/106

摘要： Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.

摘要翻译： 包含硅，硼或硅和硼的抗蚀剂组合物可以与紫外线光刻法和极紫外（EUV）光刻法一起使用，以增加抗蚀剂组合物的反应离子蚀刻电阻，改善抗蚀剂材料的透射， 并掺杂底物。

公开(公告)号：US20070183943A1

公开(公告)日：2007-08-09

申请号：US11497544

申请日：2006-08-01

申请人： Viktoriya Golovkina ,  Franco Cerrina

发明人： Viktoriya Golovkina ,  Franco Cerrina

IPC分类号： B01J19/12 ,  C12M3/00 ,  C12Q1/68

CPC分类号： B01J19/0046 ,  B01J2219/00286 ,  B01J2219/00434 ,  B01J2219/00439 ,  B01J2219/00441 ,  B01J2219/0045 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00689 ,  B01J2219/00722 ,  G02B17/0663 ,  G02B26/0833

摘要： Synthesis of arrays of chain molecules, such as oligonucleotides, in large quantities can be carried out utilizing projection onto an active substrate of a magnified image of a light emitting object array having selectable regions of light and dark areas forming a pattern. Projection optics formed entirely of mirrors are used to receive the light emitted from the object array and image the pattern of the array onto the active surface of the substrate. The mirrors in the projection optics include a first, concave mirror, a second, convex mirror, a third, concave mirror, and a fourth, convex mirror, each receiving the beam of light in turn, with the light reflected from the fourth mirror being imaged onto the active surface of the substrate with an image area greater than that of the original light emitting array.

摘要翻译： 可以通过投影到具有形成图案的光和暗区域的可选区域的发光物体阵列的放大图像的有源衬底上来进行大量的链分子例如寡核苷酸的阵列的合成。 完全由反射镜形成的投射光学器件用于接收从对象阵列发射的光并将阵列的图案成像到衬底的有源表面上。 投影光学元件中的反射镜包括第一凹面镜，第二凸面镜，第三凹面镜和第四凸面镜，每个反射镜依次接收光束，第四镜反射的光为 以比原始发光阵列大的图像面积成像到衬底的有源表面上。

公开(公告)号：US5675403A

公开(公告)日：1997-10-07

申请号：US654062

申请日：1996-05-28

申请人： Franco Cerrina ,  John P. Wallace

发明人： Franco Cerrina ,  John P. Wallace

IPC分类号： G03F1/00 ,  G03F1/22 ,  G03F7/20 ,  G03B27/53 ,  G03B27/62

CPC分类号： G03F1/22 ,  G03F7/707 ,  Y10T279/11 ,  Y10T428/24777 ,  Y10T428/24802

摘要： An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

摘要翻译： 一种成像装置和装置，其减少或消除了安装在其上的成像面罩中感应的应力。 支架包括支撑块和连接到其上的三个安装垫。 至少两个安装垫连接到支撑块，使得它们各自的位置在预定平面内是可调节的，该平面优选地基本上平行于待成像的基板的表面。 每个安装垫包括用于将成像掩模大致平行于预定平面固定的装置。 响应于光刻掩模的固定，可调安装焊盘在预定平面内调整的位置，使得成像掩模由于其固定而基本上未偏转。 由于其被固定到安装座上，成像掩模中不存在变形（并且因此应力）减少了通过掩模和压印表面的辐射的变形程度。