Abstract:
Provided is a complex biometric sensor. The complex biometric sensor includes a substrate including a light emitting region, a first light receiving region, and a second light receiving region, a light emitting part disposed adjacent to the substrate in the light emitting region, a color conversion layer disposed on the substrate in the light emitting region and vertically overlapping the light emitting part; a first light receiving layer disposed on the substrate in the first light receiving region, and a second light receiving layer disposed on the substrate in the second light receiving region. The light emitting part generates light of a first wavelength. The color conversion layer receives light of the first wavelength and emits the light of the first wavelength and light of the second wavelength. The first light receiving layer detects the light of the first wavelength. The second light receiving layer detects the light of the second wavelength.
Abstract:
A display panel includes pixels, the pixels being configured to be driven in either a reflection mode or a light emission mode, the pixels comprises a first substrate comprising a light-transmitting material, a second substrate opposite to the first substrate, a light emitting element layer on the first electrode, the light emitting element layer comprising a light emitting material, the light emitting material being configured to emit light in the light emission mode by an oxidation of the light emitting material and a reduction of the light emitting material, a second electrode on a surface of the second substrate in a direction of the first substrate, a reflective element layer on the second electrode, the reflective element layer comprising a reflective material, the reflective material being configured to be colored or bleached in the reflection mode by an oxidation of the reflective material and a reduction of the reflective material.
Abstract:
Provided is a pixel circuit. The pixel circuit includes a conversion element configured to form a voltage of an input level corresponding to a magnitude of a received energy at a first node, a first transistor configured to adjust the voltage of the first node to a first level in response to a first signal received at a first time interval, a first capacitive element configured to form a voltage at a second node based on the voltage of the first node, a second transistor configured to adjust a level of the voltage of the second node to a second level in response to the first signal, a third transistor configured to form a voltage at a third node, the voltage having a level corresponding to the level of the voltage of the second node, a fourth transistor configured to output a current corresponding to the voltage of the third node in response to a second signal received in a second time interval after the first time interval, and a fifth transistor configured to adjust the voltage of the third node to a third level in response to a third signal received in a third time interval after the second time interval.
Abstract:
Provided is a method of fabricating a light scattering layer. The method includes: coating a first surface of a substrate with a nano structure; and etching the substrate exposed to the nano structure by using the nano structure as an etching mask to allow the first surface of the substrate to have a recess to form first partitions protruding from the first surface of the substrate.
Abstract:
Provided is an active camouflage device including a reflective layer, a first electrode disposed on the reflective layer, a second electrode facing the first electrode, and an electrolyte provided between the first and second electrodes. The first electrode includes a transparent electrode, and the second electrode includes a metal mesh.
Abstract:
Provided are an optical device and a manufacturing method thereof. The method of manufacturing an optical device may include providing a substrate structure, and depositing an array including curved structures on the substrate structure. The curved structures may include a crystalline organic compound.
Abstract:
A dual mode display apparatus according to the inventive concept includes a lower substrate, a first lower electrode on the lower substrate, a light switching layer on the first lower electrode, a first upper electrode on the light switching layer, a passivation layer on the first upper electrode, a contact plug connected to the first upper electrode and penetrating the passivation layer, a second lower electrode on the contact plug and the passivation layer, an organic light-emitting layer on the second lower electrode, a second upper electrode on the organic light-emitting layer, and an upper substrate on the second upper electrode.
Abstract:
Provided is a stretchable display including an elastic body, a light emitting unit on the elastic body, and a wiring unit on the elastic body, wherein the light emitting unit includes a first substrate unit on the elastic body, a buffer layer on the first substrate unit, and a light emitting element on the buffer layer, the wiring unit includes a second substrate unit on the elastic body, a driving element configured to control the light emitting element, a wiring configured to electrically connect the driving element and the light emitting element, and an insulation layer configured to cover the driving element and the wiring, the light emitting unit and the wiring unit have respective corrugation structures, a thickness of the light emitting unit is larger than that of the wiring unit, a modulus of elasticity of the buffer layer is larger than that of the insulation layer, and a modulus of elasticity of the elastic body is smaller than that of the insulation layer.
Abstract:
A composition for forming film having wrinkle structure and a method of forming the film are disclosed. The composition includes photo-curable agent and photoinitiator dissolved in the photo-curable agent. The cut off wavelength of light transmittance of the photo-curable agent is greater than the cut off wavelength of light absorbance of the photoinitiator. Photo-cured thin film is formed at the upper portion of composition layer at an initial time period of irradiation. By subsequent contraction, the photo-cured thin film forms wrinkles. The wrinkle structure is controlled by the relation of the cut off wavelength of light transmittance of the photo-curable agent and the cut off wavelength of light absorbance of the photoinitiator, the photo-curing rate of the composition and the thickness of the composition layer, and the photoinitiator concentration, etc., before photo-curing. The film may increase the emission efficiency of LED and OLED and the sensing effect of sensor.
Abstract:
Provided is a method of manufacturing an organic light-emitting diode including forming an anode on a substrate, forming an organic light-emitting layer on the anode, forming a cathode on the organic light-emitting layer, and forming a light scattering film on the cathode. The light scattering film is a polycrystalline dielectric material composed of anisotropic crystals, and a surface roughness Ra of a top surface of the light scattering film is greater than or equal to about 50 nm by an anisotropic crystal growth of particles of the dielectric material.