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1.发明申请APPARATUS AND METHODS FOR PRODUCING FLOAT GLASS HAVING REDUCED DEFECT DENSITY 审中-公开用于生产具有减少缺陷密度的浮法玻璃的装置和方法公开(公告)号：US20070227190A1
公开(公告)日：2007-10-04
申请号：US11760194
申请日：2007-06-08
申请人： Charlene Smith , George Pecoraro
发明人： Charlene Smith , George Pecoraro
IPC分类号： C03B5/04
摘要： A float glass chamber and related methods include a hot section having an atmosphere in at least the lower plenum with less than 3 percent hydrogen based on volume and a cold section having a different volume percent hydrogen.
摘要翻译： 浮法玻璃室和相关方法包括在至少下部气室中具有气氛的热段，基于体积具有小于3％的氢气和具有不同体积百分比氢气的冷段。
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公开(公告)号：US20070037688A1
公开(公告)日：2007-02-15
申请号：US11584265
申请日：2006-10-20
申请人： Charlene Smith , George Pecoraro
发明人： Charlene Smith , George Pecoraro
摘要： A method for reducing the defect density of glass comprising melting a glass composition comprising from 65-75 wt. % of SiO2; from 10-20 wt. % of Na2O; from 5-15 wt. % of CaO; from 0-5 wt. % of MgO; from 0-5 wt. % of Al2O3; from 0-5 wt. % of K2O; from 0-2 wt. % Fe2O3; and from 0-2% FeO, wherein the glass composition has a total field strength index of greater than or equal to 1.23 is disclosed.
摘要翻译： 一种用于降低玻璃的缺陷密度的方法，包括熔化含有65-75wt。 ％SiO 2％ 10-20重量％ ％Na 2 O; 5-15重量％ CaO％; 0-5wt。 ％的MgO; 0-5wt。 ％的Al 2 O 3 3％; 0-5wt。 K 2 O的％; 0-2重量％ ％Fe 2 O 3 O 3; 和0-2％的FeO，其中玻璃组合物的总场强指数大于或等于1.23。
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公开(公告)号：US06242136B1
公开(公告)日：2001-06-05
申请号：US09397573
申请日：1999-09-16
申请人： Lisa A. Moore , Charlene Smith
发明人： Lisa A. Moore , Charlene Smith
IPC分类号： G03F900
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/12 , G03F1/60 , Y02P40/57
摘要： High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
摘要翻译： 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。
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4.发明申请Synthetic silica glass optical material having high resistance to optically induced index change 失效合成石英玻璃光学材料具有高的光诱导指数变化公开(公告)号：US20050112380A1
公开(公告)日：2005-05-26
申请号：US10996507
申请日：2004-11-24
申请人： Heather Boek , Christine Heckle , Johannes Moll , Charlene Smith
发明人： Heather Boek , Christine Heckle , Johannes Moll , Charlene Smith
IPC分类号： G02B1/00 , B32B9/04 , B32B15/00 , C03B8/04 , C03B20/00 , C03C3/06 , C03C15/00 , C03C17/30 , C03C17/32 , C03C19/00
摘要： Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength region of less than about 250 nm and particularly, exhibiting a low laser induced density change. The synthetic silica glass optical material of the present invention contains at least about 0.1 ppm of aluminum and H2 concentration levels greater than about 0.5×1017 molecules/cm2. Additionally, the synthetic silica optical material of the present invention exhibits an H2 to Al ratio of greater than about 1.2, as measured in ×1017/cm3 molecules H2 per ppm Al.
摘要翻译： 公开了一种合成石英玻璃光学材料，其特征在于在小于约250nm的波长区域，特别是具有低激光诱导密度变化的紫外线波长范围内具有高抗紫外线辐射的光学损伤。 本发明的合成石英玻璃光学材料包含至少约0.1ppm的铝和大于约0.5×10 17分子/ cm 2的H 2 O 2浓度水平 。 此外，本发明的合成二氧化硅光学材料的显示出H 2/2比率大于约1.2，如在x 10 17 / cm 3 / SUP>分子H 2 2 / ppm。
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公开(公告)号：US5735921A
公开(公告)日：1998-04-07
申请号：US762513
申请日：1996-12-10
CPC分类号： C03B19/1453 , C03B19/1415 , C03C3/06 , C03B2201/02 , C03B2201/20 , C03B2207/32 , Y10S65/90
摘要： The invention relates to the production of high purity fused silica glass which is highly resistant to 248 nm excimer laser-induced optical damage. In particular, this invention relates to a fused silica optical member or blank.
摘要翻译： 本发明涉及高纯度熔融石英玻璃的生产，其高度抗248nm准分子激光诱导的光学损伤。 特别地，本发明涉及熔融硅石光学构件或坯料。
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6.发明申请Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same 有权具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置公开(公告)号：US20060137399A1
公开(公告)日：2006-06-29
申请号：US11241075
申请日：2005-09-30
申请人： Douglas Alan , Dana Bookbinder , Ulrich Neukirch , Charlene Smith
发明人： Douglas Alan , Dana Bookbinder , Ulrich Neukirch , Charlene Smith
CPC分类号： C03B19/1453 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C2201/23 , C03C2203/54
摘要： Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
摘要翻译： 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当经受约193nm的准分子激光脉冲时，二氧化硅玻璃在633nm处测量的偏振诱发双折射小于约0.1nm / cm，具有约40μJ·cm -2的注量。 对于5×10 9个脉冲，脉冲 -1 和约25ns的脉冲长度。
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7.发明申请Group iia metal fluoride single crystals suitable for below 200 nm optical lithography and a method for selecting such crystals 审中-公开适用于低于200nm光刻的第iia族金属氟化物单晶和选择这种晶体的方法公开(公告)号：US20050031970A1
公开(公告)日：2005-02-10
申请号：US10900757
申请日：2004-07-27
申请人： Chong An , Charlene Smith
发明人： Chong An , Charlene Smith
CPC分类号： G03F7/70958 , G01N21/33
摘要： The invention is directed to a method for determining metal fluoride crystals that are suitable for use in below 200 nm optical lithography by correlation of thermally stimulated current (TSC) measurements to fluence dependent transmission (FDT) measurements; and to metal fluoride crystals suitable for below 200 nm optical lithography, such crystals having a fluent dependent transmission slope that is linearly dependent on the thermally stimulated peak maximum. Crystals suitable for below 200 nm lithography can be determined by using the standard linear relationship between the TSC peak strengths and the FDT slopes without further more FDT measurements.
摘要翻译： 本发明涉及一种通过将受热刺激电流（TSC）测量与流量相关传输（FDT）测量相关联来确定适合用于低于200nm光刻的金属氟化物晶体的方法; 以及适合于低于200nm光刻的金属氟化物晶体，这种晶体具有与热刺激的峰值最大值线性相关的流动依赖的透射斜率。 可以通过使用TSC峰强度和FDT斜率之间的标准线性关系来确定适合于低于200nm光刻的晶体，而不需要进一步的FDT测量。
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公开(公告)号：US06492072B2
公开(公告)日：2002-12-10
申请号：US09799987
申请日：2001-03-06
申请人： Lisa A. Moore , Charlene Smith
发明人： Lisa A. Moore , Charlene Smith
IPC分类号： G03F900
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/12 , G03F1/60 , Y02P40/57
摘要： High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
摘要翻译： 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。
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公开(公告)号：US5668067A
公开(公告)日：1997-09-16
申请号：US697094
申请日：1996-08-19
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2207/32 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/54 , Y10S501/90 , Y10S501/905
摘要： The invention relates to the production of high purity fused silica glass which is highly resistant to optical damage by ultraviolet radiation in the laser wavelength of about 300 nm or shorter. In particular, this invention relates to a fused silica optical member or blank which exhibits substantially no optical damage up to 10.sup.7 pulses (350 mJ/cm.sup.2) at the KrF laser wavelength region of about 248 nm, and at the ArF laser wavelength region of about 193 nm.
摘要翻译： 本发明涉及高纯度熔融石英玻璃的生产，该玻璃在激光波长为约300nm或更短的范围内通过紫外线辐射具有很高的抗光损伤性。 特别地，本发明涉及一种在大约248nm的KrF激光波长区域和在大约248nm的ArF激光波长区域基本上不表现出高达107个脉冲（350mJ / cm 2）的光损伤的熔融石英光学部件或坯料 193nm。
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10.发明申请Synthetic silica material with low fluence-dependent-transmission and method of making the same 有权合成二氧化硅材料，具有低通量依赖性传输和制作相同的方法公开(公告)号：US20070004579A1
公开(公告)日：2007-01-04
申请号：US11261005
申请日：2005-10-28
申请人： Dana Bookbinder , Kenneth Hrdina , Glenn Kohnke , Lisa Moore , Susan Schiefelbein , Charlene Smith , Ulrich Neukirch
发明人： Dana Bookbinder , Kenneth Hrdina , Glenn Kohnke , Lisa Moore , Susan Schiefelbein , Charlene Smith , Ulrich Neukirch
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/54
摘要： Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].
摘要翻译： 在本申请中公开了具有低注射度依赖性透射率，特别是约193nm的合成二氧化硅玻璃及其制造方法。 当在约248nm激活时，该玻璃可期望地在290和390nm处表现出低水平的荧光。 玻璃可能期望显示低水平的LIWFD，[SiH *]和/或[ODC]。
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