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    Exposure apparatus and exposure method using the same
    3.
    发明授权
    Exposure apparatus and exposure method using the same 有权
    曝光装置和曝光方法使用相同

    公开(公告)号：US09316923B2

    公开(公告)日：2016-04-19

    申请号：US13082081

    申请日：2011-04-07

    申请人： Chang-Hoon Kim ,  Gug-Rae Jo ,  Hong-Suk Yoo ,  Bo-Kyoung Ahn

    发明人： Chang-Hoon Kim ,  Gug-Rae Jo ,  Hong-Suk Yoo ,  Bo-Kyoung Ahn

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/7035 ,  G03F7/70058 ,  G03F7/7015

    摘要： Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.

    摘要翻译： 提供一种曝光装置和使用该装置的曝光方法。 曝光装置包括：配置为发光的光源单元; 支撑衬底的衬底台，所述衬底包括曝光区域和非曝光区域; 以及设置在所述光源单元和所述基板台之间的棱镜单元，所述棱镜单元可移动以将光透射到所述曝光区域并阻挡来自所述非曝光区域的光。

    EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME
    4.
    发明申请
    EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME 有权
    曝光装置和曝光方法

    公开(公告)号：US20120013876A1

    公开(公告)日：2012-01-19

    申请号：US13082081

    申请日：2011-04-07

    申请人： Chang-Hoon Kim ,  Gug-Rae Jo ,  Hong-Suk Yoo ,  Bo-Kyoung Ahn

    发明人： Chang-Hoon Kim ,  Gug-Rae Jo ,  Hong-Suk Yoo ,  Bo-Kyoung Ahn

    IPC分类号： G03B27/54 ,  G03B27/70

    CPC分类号： G03F7/7035 ,  G03F7/70058 ,  G03F7/7015

    摘要： Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.

    摘要翻译： 提供一种曝光装置和使用其的曝光方法。 曝光装置包括：配置为发光的光源单元; 支撑衬底的衬底台，所述衬底包括曝光区域和非曝光区域; 以及设置在所述光源单元和所述基板台之间的棱镜单元，所述棱镜单元可移动以将光透射到所述曝光区域并阻挡来自所述非曝光区域的光。

    PHOTOLITHOGRAPHY EXPOSURE APPARATUS HAVING BLINDING PLATES AND METHOD OF DRIVING THE SAME
    6.
    发明申请
    PHOTOLITHOGRAPHY EXPOSURE APPARATUS HAVING BLINDING PLATES AND METHOD OF DRIVING THE SAME 失效
    具有发泡板的光刻曝光装置及其驱动方法

    公开(公告)号：US20120086930A1

    公开(公告)日：2012-04-12

    申请号：US13086293

    申请日：2011-04-13

    申请人： Chang-Hoon KIM ,  Bo-Kyoung Ahn ,  Hong-Suk Yoo

    发明人： Chang-Hoon KIM ,  Bo-Kyoung Ahn ,  Hong-Suk Yoo

    IPC分类号： G03B27/72

    CPC分类号： G03F7/2008 ,  G03F7/7055

    摘要： An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.

    摘要翻译： 曝光装置包括用于提供光刻曝光光的脉冲的光源，用于向光刻曝光灯施加图案的掩模，用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器 驾驶可变长度盲人。 盲板包括多个可移动阻挡板。 盲驱动器包括多个电动机和电动机控制单元，其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗，使得不会在 底物。 在一个实施例中，基板是在其上形成有多个LCD子基板的母基板。

    Photolithography exposure apparatus having blinding plates and method of driving the same
    7.
    发明授权
    Photolithography exposure apparatus having blinding plates and method of driving the same 失效
    具有盲板的光刻曝光装置及其驱动方法

    公开(公告)号：US08564762B2

    公开(公告)日：2013-10-22

    申请号：US13086293

    申请日：2011-04-13

    申请人： Chang-Hoon Kim ,  Bo-Kyoung Ahn ,  Hong-Suk Yoo

    发明人： Chang-Hoon Kim ,  Bo-Kyoung Ahn ,  Hong-Suk Yoo

    IPC分类号： G02B26/02 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/2008 ,  G03F7/7055

    摘要： An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.

    摘要翻译： 曝光装置包括用于提供光刻曝光光的脉冲的光源，用于向光刻曝光灯施加图案的掩模，用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器 驾驶可变长度盲人。 盲板包括多个可移动阻挡板。 盲驱动器包括多个电动机和电动机控制单元，其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗，使得不会在 底物。 在一个实施例中，基板是在其上形成有多个LCD子基板的母基板。

    Exposure apparatus, exposure method, and blind for exposure apparatus
    8.
    发明授权
    Exposure apparatus, exposure method, and blind for exposure apparatus 有权
    曝光装置，曝光方法，以及曝光装置的盲人

    公开(公告)号：US08842258B2

    公开(公告)日：2014-09-23

    申请号：US13071962

    申请日：2011-03-25

    申请人： Bo-Kyoung Ahn ,  Hong-Suk Yoo ,  Chang-Hoon Kim

    发明人： Bo-Kyoung Ahn ,  Hong-Suk Yoo ,  Chang-Hoon Kim

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70066

    摘要： An exposure apparatus includes a mask, a substrate which passes through a region disposed below the mask while moving in a first direction, a light source unit disposed above the mask, where the light source irradiates light on the substrate through the mask, and at least one blind disposed below the light source unit, where the blind blocks the light irradiated from the light source unit, where a second direction is perpendicular to the first direction in a same plane as the first direction, the blind is a polyhedron having a width, a length and a thickness and is disposed such that a direction of the length is substantially parallel to the second direction, and the blind is rotatable around a rotation axis substantially parallel to the second direction, and where the width is greater than the thickness.

    摘要翻译： 曝光装置包括掩模，在第一方向移动时穿过掩模下方的区域的基板，设置在掩模上方的光源单元，其中光源通过掩模将光照射在基板上，并且至少 一个盲设置在所述光源单元下方，其中所述盲区阻挡从所述光源单元照射的光，其中第二方向在与所述第一方向相同的平面中垂直于所述第一方向，所述盲是具有宽度的多面体， 长度和厚度被布置成使得长度方向基本上平行于第二方向，并且盲板可绕基本平行于第二方向的旋转轴线旋转，并且其中宽度大于厚度。

    Organic thin film transistor array panel
    9.
    发明授权
    Organic thin film transistor array panel 有权
    有机薄膜晶体管阵列面板

    公开(公告)号：US07777220B2

    公开(公告)日：2010-08-17

    申请号：US12148485

    申请日：2008-04-17

    申请人： Tae-Young Choi ,  Soo-Wan Yoon ,  Bo-Kyoung Ahn

    发明人： Tae-Young Choi ,  Soo-Wan Yoon ,  Bo-Kyoung Ahn

    IPC分类号： H01L51/52

    CPC分类号： H01L51/0003 ,  H01L27/283 ,  H01L51/0545

    摘要： An organic thin film transistor array panel includes a substrate, a gate line formed on the substrate and including a gate electrode. A gate insulating layer is formed on the gate electrode and a data line is formed on the gate insulating layer, intersecting the gate line, and including a drain electrode. A source electrode is formed on the gate insulating layer and is spaced apart from the drain electrode, enclosed by the drain electrode. A bank insulating layer includes a first opening exposing the drain electrode and the source electrode and a second opening which exposes at least a portion of the source electrode. An organic semiconductor is formed in the first opening and contacts the drain electrode and the source electrode. A pixel electrode contacts the source electrode through the second opening.

    摘要翻译： 有机薄膜晶体管阵列面板包括基板，形成在基板上并包括栅电极的栅极线。 在栅电极上形成栅极绝缘层，并且在栅极绝缘层上形成数据线，与栅极线相交，并且包括漏电极。 源电极形成在栅极绝缘层上，并与漏电极间隔开，由漏电极包围。 堤绝缘层包括露出漏电极和源电极的第一开口和暴露源电极的至少一部分的第二开口。 在第一开口中形成有机半导体，并与漏电极和源电极接触。 像素电极通过第二开口接触源电极。