公开(公告)号：US20240096605A1

公开(公告)日：2024-03-21

申请号：US17946947

申请日：2022-09-16

Applicant: Applied Materials, Inc.

Inventor： Arun Kumar Kotrappa ,  CHANDRASHEKARA BAGINAGERE ,  RAMCHARAN SUNDAR ,  SEYYED FAZELI ,  ANANTHA SUBRAMANI ,  SIYU ZHU ,  AKHIL SINGHAL ,  PHILIP ALLAN KRAUS

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C16/505 ,  H01L21/687

CPC classification number: H01J37/32715 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/4584 ,  C23C16/46 ,  C23C16/505 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/68742 ,  H01J37/32082 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/332

Abstract: Embodiments disclosed herein include a semiconductor processing tool. In an embodiment, the semiconductor processing tool comprises a chamber, a pedestal in the chamber, and a first gas feed system on a first side of the pedestal. In an embodiment, the first gas feed system comprises a first exhaust line with a first valve to open and close the first exhaust line, and a first source gas feed line with a second valve to open and close the first source gas feed line. In an embodiment, the semiconductor processing tool further comprises a second gas feed system on a second side of the pedestal. In an embodiment, the second gas feed system comprises a second exhaust line with a third valve to open and close the second exhaust line, and a second source gas feed line with a fourth valve to open and close the second source gas feed line.

公开(公告)号：US20240018646A1

公开(公告)日：2024-01-18

申请号：US17865255

申请日：2022-07-14

Applicant: Applied Materials, Inc.

Inventor： ANANTHA SUBRAMANI ,  YANG GUO ,  JOHN FORSTER ,  WADE HARRELSON ,  ANDREW TOMKO ,  ANTHONY CHAN ,  SATHYA SWAROOP GANTA ,  MIKE MURTAGH ,  SANJEEV BALUJA

IPC: C23C14/50 ,  H01L21/683 ,  H01L21/687

CPC classification number: C23C14/505 ,  H01L21/6833 ,  H01L21/68785

Abstract: Embodiments disclosed herein include semiconductor processing tools. In an embodiment, the semiconductor processing tool comprises a chamber, a chuck within the chamber, where the chuck is configured to rotate, a pedestal holder around the chuck, and a utility column coupled to the chuck. In an embodiment, the utility column comprises a magnetic coupler to enable rotation of portions of the utility column and the chuck, and a rotary electrical feedthrough.

公开(公告)号：US20190353919A1

公开(公告)日：2019-11-21

申请号：US16414975

申请日：2019-05-17

Applicant: APPLIED MATERIALS, INC.

Inventor： BENCHERKI MEBARKI ,  JOUNG JOO LEE ,  FARZAD HOUSHMAND ,  ANANTHA SUBRAMANI ,  KEITH MILLER ,  XIANMIN TANG ,  PRASHANTH KOTHNUR

IPC: G02B27/30 ,  H01J37/34

Abstract: Multi-zone collimators and process chambers including multi-zone collimators for use with a multi-zone magnetron source are provided herein. In some embodiments, a multi-zone collimator for use with a multi-zone magnetron source, comprising a first collimator plate, a second collimator plate, wherein a first collimator zone having a first width is formed between the first collimator plate and the second collimator plate; and a third collimator plate, wherein a second collimator zone having a second width is formed between the second first collimator plate and the third collimator plate, wherein a length of each of the first, second and third collimator plates are different from each other.