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1.发明申请BACKSIDE COATING PREVENTION DEVICE, COATING CHAMBER COMPRISING A BACKSIDE COATING PREVENTION DEVICE, AND METHOD OF COATING 审中-公开背面涂层防护装置，包括背面涂层防止装置的涂布室和涂布方法公开(公告)号：US20090218214A1
公开(公告)日：2009-09-03
申请号：US12177632
申请日：2008-07-22
申请人： Andreas SAUER , Juergen HENRICH , Thomas GEBELE
发明人： Andreas SAUER , Juergen HENRICH , Thomas GEBELE
IPC分类号： C23C14/04
CPC分类号： C23C14/042 , C23C14/56 , C23C14/564 , C23C16/45519 , H01J37/32477 , H01J37/32623 , H01J37/32761
摘要： A backside coating prevention device adapted for a coating chamber for coating plate-shaped substrates is provided, said coating chamber being adapted for coating continuously or discontinuously transported plate-shaped substrates, comprising a front wall having a substrate feeding opening and a rear wall having a substrate discharge opening, a coating material source adapted for dispensing coating material into the coating chamber, and a transport system, a front side of the transport system facing the coating material source, the transport system being adapted for continuously or discontinuously transporting a plurality of plate-shaped substrates along a transport path on the front side of the transport system, wherein said backside coating prevention device is adapted for providing a gas barrier at the front side of the transport system and adjacent to the backsides of the plurality of plate-shapes substrates for preventing backside coating of the plate-shaped substrates.
摘要翻译： 提供一种适用于涂布板状基板的涂布室的背面涂布防止装置，所述涂布室适用于连续地或不连续地传送的板状基材，包括具有基板供给口的前壁和具有基板供给口的后壁 基材排出口，用于将涂料分配到涂布室中的涂料源和运输系统，运送系统的正面与涂料源相对，运输系统适于连续或不连续运送多个板 沿着运输系统前侧的输送路径形成基板，其中所述背面涂层防止装置适用于在输送系统的前侧提供气体屏障并且邻近多个板状基板的背面 用于防止板状基板的背面涂覆。
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2.发明申请GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD 审中-公开气体供应系统，抽水系统，涂装系统，气体供应方法和抽水方法公开(公告)号：US20100095890A1
公开(公告)日：2010-04-22
申请号：US12256091
申请日：2008-10-22
申请人： Thomas GEBELE , Juergen HENRICH , Thomas LEIPNITZ , Stefan KLEIN
发明人： Thomas GEBELE , Juergen HENRICH , Thomas LEIPNITZ , Stefan KLEIN
CPC分类号： G05D7/0652 , C23C14/56 , C23C16/4412 , G05D16/204 , Y10T137/0324 , Y10T137/0379 , Y10T137/85986 , Y10T137/86027 , Y10T137/86083 , Y10T137/877 , Y10T137/87772
摘要： A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
摘要翻译： 提供了一种用于将气体供应到泵送系统10中的气体供应系统20，该泵送系统包括多个泵送装置14,16，气体供应系统包括气体入口22和多个气体导管24,25，其流体连接到 气体入口并且每个具有可流体地连接到泵送系统10的气体出口27,28，其中多个气体导管的气体出口并联可流动地连接到泵送系统，并且每个气体导管设置有梯度调节装置 适于提供供应到泵送系统的气体量的至少一个梯度。
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3.发明申请公开(公告)号：US20150179486A1
公开(公告)日：2015-06-25
申请号：US14642475
申请日：2015-03-09
IPC分类号： H01L21/67
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。
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公开(公告)号：US20180211823A1
公开(公告)日：2018-07-26
申请号：US15746032
申请日：2015-08-24
发明人： Daniel SEVERIN , Thomas GEBELE , Thomas LEIPNITZ
IPC分类号： H01J37/32 , H01L21/285 , H01J37/34 , H01L27/12 , C23C14/34 , C23C14/00 , C23C14/08 , C23C14/35
CPC分类号： H01J37/32844 , C23C14/0042 , C23C14/0063 , C23C14/086 , C23C14/3464 , C23C14/352 , H01J37/32449 , H01J37/32834 , H01J37/3405 , H01J37/3473 , H01J37/3494 , H01J2237/0203 , H01J2237/182 , H01J2237/24585 , H01J2237/332 , H01L21/2855 , H01L27/1262 , Y02C20/30
摘要： A apparatus for vacuum sputter deposition is described. The apparatus includes, a vacuum chamber; three or more sputter cathodes within the vacuum chamber for sputtering material on a substrate; a gas distribution system for providing a processing gas including H2 to the vacuum chamber; a vacuum system for providing a vacuum inside the vacuum chamber; and a safety arrangement for reducing the risk of an oxy-hydrogen explosion, wherein the safety arrangement comprises a dilution gas feeding unit connected to the vacuum system for dilution of the H2-content of the processing gas.
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5.发明申请公开(公告)号：US20120097093A1
公开(公告)日：2012-04-26
申请号：US12912272
申请日：2010-10-26
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。
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