公开(公告)号：US20090218214A1

公开(公告)日：2009-09-03

申请号：US12177632

申请日：2008-07-22

申请人： Andreas SAUER ,  Juergen HENRICH ,  Thomas GEBELE

发明人： Andreas SAUER ,  Juergen HENRICH ,  Thomas GEBELE

IPC分类号： C23C14/04

CPC分类号： C23C14/042 ,  C23C14/56 ,  C23C14/564 ,  C23C16/45519 ,  H01J37/32477 ,  H01J37/32623 ,  H01J37/32761

摘要： A backside coating prevention device adapted for a coating chamber for coating plate-shaped substrates is provided, said coating chamber being adapted for coating continuously or discontinuously transported plate-shaped substrates, comprising a front wall having a substrate feeding opening and a rear wall having a substrate discharge opening, a coating material source adapted for dispensing coating material into the coating chamber, and a transport system, a front side of the transport system facing the coating material source, the transport system being adapted for continuously or discontinuously transporting a plurality of plate-shaped substrates along a transport path on the front side of the transport system, wherein said backside coating prevention device is adapted for providing a gas barrier at the front side of the transport system and adjacent to the backsides of the plurality of plate-shapes substrates for preventing backside coating of the plate-shaped substrates.

摘要翻译： 提供一种适用于涂布板状基板的涂布室的背面涂布防止装置，所述涂布室适用于连续地或不连续地传送的板状基材，包括具有基板供给口的前壁和具有基板供给口的后壁 基材排出口，用于将涂料分配到涂布室中的涂料源和运输系统，运送系统的正面与涂料源相对，运输系统适于连续或不连续运送多个板 沿着运输系统前侧的输送路径形成基板，其中所述背面涂层防止装置适用于在输送系统的前侧提供气体屏障并且邻近多个板状基板的背面 用于防止板状基板的背面涂覆。

公开(公告)号：US20110104627A1

公开(公告)日：2011-05-05

申请号：US12612633

申请日：2009-11-04

申请人： Michael SCHAEFER ,  Tobias BERGMANN ,  Josef HOFFMANN ,  Andreas SAUER ,  Juergen HENRICH ,  Andreas GEISS

发明人： Michael SCHAEFER ,  Tobias BERGMANN ,  Josef HOFFMANN ,  Andreas SAUER ,  Juergen HENRICH ,  Andreas GEISS

IPC分类号： F27D3/00

CPC分类号： H01L21/67706 ,  C03B35/183 ,  C03B35/184 ,  C03B35/189

摘要： A substrate transport system adapted for transporting a substrate moving in a substrate transport direction in a processing chamber is provided. The substrate transport system includes a plurality of transport rollers each having a transport shaft and a transport wheel. The transport shaft and the transport wheel are adapted for supporting the moving substrate. A heating means is arranged between the position of the moving substrate and the transport shaft and is adapted for heating the moving substrate.

摘要翻译： 提供了一种适于传送在处理室中沿基板输送方向移动的基板的基板输送系统。 基板输送系统包括多个输送辊，每个输送辊具有输送轴和输送轮。 输送轴和输送轮适于支撑移动的基板。 在移动基板的位置和输送轴之间设置加热装置，并且适于加热移动的基板。

公开(公告)号：US20200165721A1

公开(公告)日：2020-05-28

申请号：US16075914

申请日：2016-02-12

申请人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

发明人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK

IPC分类号： C23C14/56 ,  C23C16/54 ,  B65G39/18 ,  B05C9/14 ,  B05C1/08 ,  C23C16/458 ,  C23C16/511

摘要： A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

公开(公告)号：US20200240008A1

公开(公告)日：2020-07-30

申请号：US15759801

申请日：2017-03-17

申请人： Sebastian Gunther ZANG ,  Andreas SAUER ,  Applied Materials, Inc.

发明人： Sebastian Gunther ZANG ,  Andreas SAUER

IPC分类号： C23C14/56 ,  C23C14/24 ,  F16K51/02

摘要： The present disclosure provides an apparatus for vacuum processing of a substrate. The apparatus includes a processing vacuum chamber, a maintenance vacuum chamber, an opening for transferring at least a portion of a material deposition source between the processing vacuum chamber and the maintenance vacuum chamber, and a magnetic closing arrangement for magnetically closing the opening.

公开(公告)号：US20200017957A1

公开(公告)日：2020-01-16

申请号：US16485573

申请日：2017-03-17

申请人： Sebastian Gunther ZANG ,  Andreas SAUER ,  Applied Materials, Inc.

发明人： Sebastian Gunther ZANG ,  Andreas SAUER

IPC分类号： C23C14/56 ,  C23C16/44 ,  F16K31/08 ,  H01L51/56 ,  H01L51/00

摘要： The present disclosure provides an apparatus (100) for vacuum processing of a substrate (10). The apparatus (100) includes a first vacuum region (110), a second vacuum region (120), an opening (130) between the first vacuum region (100) and the second vacuum region (130), and a closing arrangement (140) for closing the opening (130). The closing arrangement includes one or more first permanent magnets, one or more second permanent magnets, and a magnet device configured to change a magnetization of the one or more first permanent magnets.

公开(公告)号：US20200016557A1

公开(公告)日：2020-01-16

申请号：US15764311

申请日：2017-04-07

申请人： Andre BRÜNING ,  Andreas SAUER ,  Applied Materials, Inc.

发明人： Andre BRÜNING ,  Andreas SAUER

IPC分类号： B01J3/02 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H01L51/56

摘要： A supply line guide for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement including a plurality of connected elements, wherein the connected elements are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube provided around the guiding arrangement.

公开(公告)号：US20160340776A1

公开(公告)日：2016-11-24

申请号：US15112800

申请日：2014-01-22

申请人： Andreas Sauer ,  Florian Ries ,  Thomas Deppisch ,  Applied Materials, Inc.

发明人： Andreas SAUER ,  Florian RIES ,  Thomas DEPPISCH

IPC分类号： C23C14/56 ,  C23C14/34 ,  C23C14/54 ,  C23C16/505 ,  C23C16/46 ,  C23C14/24 ,  C23C16/52

CPC分类号： C23C14/562 ,  C23C14/24 ,  C23C14/34 ,  C23C14/50 ,  C23C14/541 ,  C23C14/568 ,  C23C16/463 ,  C23C16/505 ,  C23C16/52 ,  C23C16/545

摘要： A processing apparatus for processing a flexible substrate in a vacuum chamber is described. The processing apparatus includes a processing drum for processing the flexible substrate while being guided on the processing drum, a roller arrangement having one or more rollers configured to contact the flexible substrate along a portion of one or more circumferences of the one or more rollers before the flexible substrate is guided on the processing drum, wherein the combined length of contact along one or more portions of the one or more circumferences of the one or more rollers is 270 mm or above, and wherein an individual length of contact along each of the one or more portions of the one or more circumferences of the one or more rollers is 500 mm or below, and a temperature adjustment element adjusting the temperature of the one or more rollers.

摘要翻译： 描述了一种在真空室中处理柔性基板的处理装置。 处理装置包括处理滚筒，用于在处理滚筒上被引导时处理柔性基板;滚筒装置，其具有一个或多个辊子，该滚筒装置构造成沿着一个或多个滚筒的一个或多个圆周的一部分接触柔性基板 柔性基底在处理滚筒上引导，其中沿一个或多个滚筒的一个或多个圆周的一个或多个部分的组合接触长度为270mm或更大，并且其中沿着一个或多个滚筒中的每一个的单独的接触长度 一个或多个辊的一个或多个圆周的多个部分或更多部分为500mm以下，以及调节一个或多个辊的温度的温度调节元件。

公开(公告)号：US20110140023A1

公开(公告)日：2011-06-16

申请号：US12641822

申请日：2009-12-18

申请人： Andreas SAUER ,  Harald WURSTER ,  Josef HOFFMANN ,  Goetz GOERISCH

发明人： Andreas SAUER ,  Harald WURSTER ,  Josef HOFFMANN ,  Goetz GOERISCH

IPC分类号： F16K1/20

CPC分类号： F16K49/007 ,  F16K1/2028 ,  F16K1/205 ,  F16K51/02 ,  H01L21/67109 ,  H01L21/67126

摘要： A lock valve is adapted for locking a process chamber. The lock valve includes a valve flap adapted for sealing an aperture of the process chamber where a substrate to be processed may be inserted or ejected. A cooling unit is adapted for cooling the valve flap by means of a cooling fluid. At least one valve flap hinge is adapted for connecting the process chamber with the valve flap. The valve flap hinge furthermore includes at least one pipe in fluid communication with the cooling unit of the valve flap.

摘要翻译： 锁阀适于锁定处理室。 锁阀包括适于密封处理室的孔口的阀瓣，其中待加工的基底可被插入或弹出。 冷却单元适于通过冷却流体冷却阀瓣。 至少一个阀瓣铰链适于将处理室与阀瓣连接。 阀瓣铰链还包括与阀瓣的冷却单元流体连通的至少一个管。