公开(公告)号：US20190006216A1

公开(公告)日：2019-01-03

申请号：US16062596

申请日：2016-01-18

申请人： Simon LAU ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

发明人： Simon LAU ,  Wolfgang BUSCHBECK

IPC分类号： H01L21/677 ,  C23C14/35 ,  C23C14/50 ,  C23C14/56

摘要： An apparatus for transportation of a substrate carrier in a vacuum chamber is provided. The apparatus includes a first track providing a first transportation path for the substrate carrier, and a transfer device configured for contactlessly moving the substrate carrier from a first position on the first track to one or more second positions away from the first track. The one or more second positions include at least one of a position on a second track and a process position for processing of a substrate. The transfer device includes at least one first magnet device configured to provide a magnetic force acting on the substrate carrier to contactlessly move the substrate carrier from the first position to the one or more second positions.

公开(公告)号：US20110220489A1

公开(公告)日：2011-09-15

申请号：US12723490

申请日：2010-03-12

申请人： Lothar Lippert ,  Wolfgang Buschbeck

发明人： Lothar Lippert ,  Wolfgang Buschbeck

IPC分类号： C23C14/34 ,  C23C14/50

CPC分类号： H01J37/3491 ,  C23C14/3407 ,  C23C14/3414 ,  H01J37/3405 ,  H01J37/3435

摘要： A rotatable target for a sputtering installation and a method for producing a rotatable target are provided. The target includes a backing tube to which a target tube is shrink-fitted. The method includes setting a positive temperature difference between a target tube and a backing tube. The method further includes pulling the target tube over the backing tube while the temperature difference remains positive. Furthermore, a backing tube having a middle part with an outer lateral area and a notch extending in a longitudinal direction on the outer lateral area is provided.

摘要翻译： 提供了用于溅射设备的可旋转靶材以及用于制造可旋转靶材的方法。 目标包括一个背管，目标管被收缩配合到其上。 该方法包括设置目标管和背衬管之间的正温差。 该方法还包括在温度差保持为正时将目标管牵拉在背衬管上。 此外，提供了具有外侧横向区域的中间部分和在外侧区域上沿纵向方向延伸的凹口的背衬管。

公开(公告)号：US20130171757A1

公开(公告)日：2013-07-04

申请号：US13732662

申请日：2013-01-02

申请人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

发明人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  C23C14/568 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/6776

摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.

摘要翻译： 本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。 在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。 处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室 （例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

公开(公告)号：US6004109A

公开(公告)日：1999-12-21

申请号：US674535

申请日：1996-07-02

申请人： Thomas Gebele ,  Wolfgang Buschbeck

发明人： Thomas Gebele ,  Wolfgang Buschbeck

IPC分类号： F04B37/16 ,  B01J3/02 ,  F04B37/14 ,  F04B49/00 ,  F04C28/02 ,  F04B23/08 ,  F04C25/02

CPC分类号： F04C28/02 ,  F04B37/14 ,  F04B49/007 ,  F04C25/02

摘要： A first vacuum pump (14) is connected to a vacuum chamber (5) by a primary intake line (13) having a first vacuum valve (4) therein. A second vacuum pump (15) is connected to the output of the first vacuum pump (14) by a connecting line (20) having a second vacuum valve (12) therein. A blowout valve (17) is connected to the connecting line (20) between the first pump (14) and the second valve (12). A secondary intake line (19) having therein a third vacuum valve (13) is connected between the vacuum chamber (5) and the intake of the second vacuum pump (15).

摘要翻译： 第一真空泵（14）通过其中具有第一真空阀（4）的初级进气管（13）连接到真空室（5）。 第二真空泵（15）通过其中具有第二真空阀（12）的连接管线（20）连接到第一真空泵（14）的输出端。 吹气阀（17）连接到第一泵（14）和第二阀（12）之间的连接管线（20）。 其中具有第三真空阀（13）的次级进气管线（19）连接在真空室（5）和第二真空泵（15）的进气口之间。

公开(公告)号：US5228838A

公开(公告)日：1993-07-20

申请号：US936035

申请日：1992-08-26

申请人： Thomas Gebele ,  Wolfgang Buschbeck

发明人： Thomas Gebele ,  Wolfgang Buschbeck

IPC分类号： B01J3/00 ,  F04B37/14

CPC分类号： B01J3/006 ,  F04B37/14

摘要： For the evacuation of a low-vacuum chamber (4) and of a high-vacuum chamber (5), two pump trains (6, 7) are provided, each consisting of a vacuum pump unit (8, 9) and a forepump unit (10, 11). The forepump unit (11) of the pump train (7) of the high-vacuum chamber (5) can draw selectively from the vacuum pump unit (9) of the high-vacuum chamber (5) or from a high-vacuum pump unit (12) connected likewise to the high-vacuum chamber (5). The vacuum pump unit (9) can aspirate either from the highvacuum chamber (5) or from the low-vacuum chamber (4) and discharge to the forepump unit (10) of pump train (6) or to the forepump unit (11) of pump train (7).

摘要翻译： 为了排空低真空室（4）和高真空室（5），提供了两个泵系列（6,7），每个泵系列由真空泵单元（8,9）和前级泵单元 （10,11）。 高真空室（5）的泵排（7）的前泵单元（11）可以从高真空室（5）的真空泵单元（9）或高真空泵单元 （12）同样连接到高真空室（5）。 真空泵单元（9）可以从高真空室（5）或低真空室（4）吸出并排出到泵系（6）的前置泵单元（10）或前泵单元（11） 的泵列车（7）。

公开(公告)号：US5216742A

公开(公告)日：1993-06-01

申请号：US928970

申请日：1992-08-11

申请人： Thomas Krug ,  Friedrich Anderle ,  Albert Feuerstein ,  Eggo Sichmann ,  Wolfgang Buschbeck

发明人： Thomas Krug ,  Friedrich Anderle ,  Albert Feuerstein ,  Eggo Sichmann ,  Wolfgang Buschbeck

IPC分类号： C23C14/24

CPC分类号： C23C14/243

摘要： A crucible (9) of a nonmetallic material with an elongated cavity (42) to contain the material to be evaporated has on top a vapor emission slot (45) which is defined at its longitudinal edges (43, 44) by two elongated plates (40, 41) of a likewise nonmetallic material. In the cavity (42) two heating rods (46, 47) are disposed in a mirror-symmetrical relationship to a plane of symmetry (S) through the vapor emission slot (45), one under each of the plates (40, 41) defining the vapor emission slot (45). Additional heating means are provided outside of the crucible and inside of a thermal barrier system.

摘要翻译： 具有用于容纳待蒸发的材料的细长空腔（42）的坩埚（9）在其顶部形成有蒸气发射狭槽（45），其在其纵向边缘（43,44）处由两个细长板（ 40,41）同样的非金属材料。 在空腔（42）中，两个加热棒（46,47）通过蒸汽发射槽（45）与对称平面（S）以镜对称的关系设置，每个板（40,41）下方一个， 限定蒸汽发射槽（45）。 附加的加热装置设置在坩埚的外部和热障系统的内部。

公开(公告)号：US20150179486A1

公开(公告)日：2015-06-25

申请号：US14642475

申请日：2015-03-09

申请人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

发明人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

IPC分类号： H01L21/67

CPC分类号： H01L21/67201 ,  Y10T137/0379

摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.

摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。

公开(公告)号：US20130199891A1

公开(公告)日：2013-08-08

申请号：US13748271

申请日：2013-01-23

申请人： Wolfgang BUSCHBECK ,  Juergen HENRICH ,  Andreas LOPP ,  Susanne SCHLAEFER

发明人： Wolfgang BUSCHBECK ,  Juergen HENRICH ,  Andreas LOPP ,  Susanne SCHLAEFER

IPC分类号： H01L21/677

CPC分类号： H01L21/67739 ,  H01L21/67201

摘要： A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber.

摘要翻译： 提供一种动态负载锁定室，其包括沿其长度定位的多个致动器，以实现从室的大气压侧到处理压力侧的期望的压力梯度。 所述腔室包括连续运行通过所述腔室的输送带，以将衬底从所述大气压侧输送到所述腔室的处理压力侧，如果位于生产线的入口侧，以及从处理压力侧到大气压侧 如果位于生产线的出口侧。 分离机构可以附接到带上以将腔室内的离散区域分离成多个离散体积。 衬底可以设置在分离机构之间，使得当衬底被输送通过腔室时，保持室内的相邻压力区域之间的间隔。

公开(公告)号：US20120097093A1

公开(公告)日：2012-04-26

申请号：US12912272

申请日：2010-10-26

申请人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

发明人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

IPC分类号： H01L21/00 ,  B65D45/00

CPC分类号： H01L21/67201 ,  Y10T137/0379

摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.

摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。

公开(公告)号：US20110120862A1

公开(公告)日：2011-05-26

申请号：US12627159

申请日：2009-11-30

申请人： Wolfgang BUSCHBECK ,  Marcus BENDER ,  Ralph LINDENBERG ,  Wolfgang KLEIN ,  Thomas BERGER

发明人： Wolfgang BUSCHBECK ,  Marcus BENDER ,  Ralph LINDENBERG ,  Wolfgang KLEIN ,  Thomas BERGER

IPC分类号： C23C14/34

CPC分类号： C23C14/35 ,  H01J37/32541 ,  H01J37/3405

摘要： The present disclosure relates to an anode rod for a sputtering system comprising a target, a lateral surface area of the anode rod is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume. Further, the present disclosure relates to a sputtering system comprising at least one anode rod, wherein the anode rod having a lateral surface area that is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume, and at least one sputtering cathode assembly comprising a backing device selected of the group consisting of a backing plate for a planar target, and a target backing tube for a rotatable cylindrical target.

摘要翻译： 本公开涉及一种用于溅射系统的阳极棒，其包括靶，阳极杆的横向表面积比具有相同体积的圆柱体的侧表面积至少大2倍。 此外，本公开涉及一种包括至少一个阳极棒的溅射系统，其中阳极杆的侧表面积比具有相同体积的圆柱体的侧表面积至少大2倍，并且在 至少一个溅射阴极组件包括选自由用于平面靶的背板和用于可旋转圆柱形靶的目标背衬管组的背衬装置。