公开(公告)号：US20100021273A1

公开(公告)日：2010-01-28

申请号：US12506575

申请日：2009-07-21

申请人： ALEXANDER S. POLYAK ,  TOM K. CHO ,  JOSEPH YUDOVSKY ,  ANTHONY VESCI

发明人： ALEXANDER S. POLYAK ,  TOM K. CHO ,  JOSEPH YUDOVSKY ,  ANTHONY VESCI

IPC分类号： H01L21/677 ,  B29C45/14

CPC分类号： C23C14/56 ,  C23C16/44 ,  H01J37/32467 ,  H01L21/67236 ,  H01L21/67772

摘要： The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays, solar cells, or other electronic devices. The processing system and/or the vacuum chambers as well as their components and supporting structure are constructed of less costly materials and in a more energy efficient manner than that of current large area substrate processing systems. In one embodiment, the processing system chamber bodies and their supporting structures are constructed of reinforced concrete. In one embodiment, system processing chambers include a vacuum tight lining disposed inside reinforced concrete chamber bodies.

摘要翻译： 本发明体现了用于处理平板显示器，太阳能电池或其他电子设备的基板的处理系统和真空室。 处理系统和/或真空室以及它们的部件和支撑结构由比当前的大面积基板处理系统的成本较低的材料和更节能的方式构成。 在一个实施例中，处理系统室主体及其支撑结构由钢筋混凝土构成。 在一个实施例中，系统处理室包括设置在钢筋混凝土室体内的真空密封衬里。

公开(公告)号：US07377002B2

公开(公告)日：2008-05-27

申请号：US10976012

申请日：2004-10-28

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B1/04

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20130171757A1

公开(公告)日：2013-07-04

申请号：US13732662

申请日：2013-01-02

申请人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

发明人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  C23C14/568 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/6776

摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.

摘要翻译： 本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。 在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。 处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室 （例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

公开(公告)号：US20130059092A1

公开(公告)日：2013-03-07

申请号：US13605449

申请日：2012-09-06

申请人： HEMANT P. MUNGEKAR ,  Alexander S. Polyak ,  Michael S. Cox

发明人： HEMANT P. MUNGEKAR ,  Alexander S. Polyak ,  Michael S. Cox

IPC分类号： C23C16/513 ,  H05H1/24

CPC分类号： H01J37/3244 ,  C23C16/45504 ,  C23C16/45557 ,  C23C16/45563 ,  C23C16/4584 ,  C23C16/50 ,  C23C16/52 ,  C23C16/54 ,  H01J37/32779

摘要： A method and apparatus for processing a substrate is described. One embodiment of the invention provides an apparatus for forming thin films. The apparatus comprises a chamber defining an internal volume, a plasma source disposed within the internal volume, and at least one gas injection source disposed adjacent the plasma source within the internal volume, wherein the at least one gas injection source comprises a first channel and a second channel for delivering gases to the internal volume, the first channel delivering a gas at a first pressure or a first density and the second channel delivering a gas at a second pressure or a second density, the first pressure or the first density being different than the second pressure or the second density.

摘要翻译： 描述了用于处理衬底的方法和设备。 本发明的一个实施例提供了一种用于形成薄膜的装置。 该装置包括限定内部体积的室，设置在内部体积内的等离子体源以及在内部体积内与等离子体源相邻设置的至少一个气体注入源，其中至少一个气体注入源包括第一通道和 用于将气体输送到内部容积的第二通道，所述第一通道以第一压力或第一密度输送气体，所述第二通道输送处于第二压力或第二密度的气体，所述第一压力或所述第一密度不同于 第二压力或第二密度。

公开(公告)号：US20080292433A1

公开(公告)日：2008-11-27

申请号：US11747391

申请日：2007-05-11

申请人： Robert Z. Bachrach ,  Avi Tepman ,  Alexander S. Polyak

发明人： Robert Z. Bachrach ,  Avi Tepman ,  Alexander S. Polyak

IPC分类号： B65H5/00

CPC分类号： C23C16/54 ,  C23C14/568 ,  H01L31/18

摘要： The present invention generally comprises equipment for an automated high volume batch work-piece manufacturing factory comprising work-piece handling and work-piece processing in a high productivity factory architecture capable of producing 1,000 or more work-piece an hour. The work-pieces may be presented to the equipment from a stacked supply to a parallel array. Additionally, the work-pieces may be transferred between manufacturing architectures by an array to array batch transfer. The work-pieces may be transferred within the manufacturing architecture in a parallel to parallel batch transfer operation. The robotic operations may be between robotic devices, between robotic devices and processing equipment, and within processing equipment.

摘要翻译： 本发明通常包括用于自动化大批量批量工件制造工厂的设备，其包括能够每小时生产1,000个或更多个工件的高生产率工厂结构中的工件处理和工件加工。 工件可以从堆叠的供应提供给设备到并行阵列。 另外，工件可以通过阵列在制造架构之间转移到阵列批量传输。 工件可以在并行批量传输操作的同时在制造架构内转移。 机器人操作可以在机器人设备之间，机器人设备和处理设备之间以及处理设备内。

公开(公告)号：US20080210258A1

公开(公告)日：2008-09-04

申请号：US12102846

申请日：2008-04-14

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B7/00 ,  A47L25/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US6080270A

公开(公告)日：2000-06-27

申请号：US892610

申请日：1997-07-14

申请人： M. Shams Tabrez ,  Dwight C. Chew ,  Patrick J. Stafford ,  Richard C. Riddle ,  Alexander S. Polyak

发明人： M. Shams Tabrez ,  Dwight C. Chew ,  Patrick J. Stafford ,  Richard C. Riddle ,  Alexander S. Polyak

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01J37/32229 ,  H01J37/32266 ,  H01J37/32357 ,  H05B6/701 ,  H05B6/705 ,  H05B6/707 ,  H05B6/806

摘要： A compact microwave downstream plasma system includes, within a significantly small portable housing unit, a power supply, a microwave generator, a non-linear waveguide, a circulator, a dummy load, a plasma applicator, and an igniter. The microwave generator supplies microwaves to the guide to the applicator. The guide includes several curved regions that allow for a more compact design. The applicator is configured to generate a plasma and output reactants that can be used to remove photoresist layers from a wafer within a process reactor.

摘要翻译： 紧凑型微波下游等离子体系统在显着小的便携式外壳单元内包括电源，微波发生器，非线性波导，循环器，虚拟负载，等离子体施加器和点火器。 微波发生器向施加器的引导器提供微波。 导轨包括几个弯曲区域，允许更紧凑的设计。 施加器被配置为产生等离子体并输出可用于从工艺反应器内的晶片去除光致抗蚀剂层的反应物。

公开(公告)号：US20080279672A1

公开(公告)日：2008-11-13

申请号：US11747525

申请日：2007-05-11

申请人： ROBERT Z. BACHRACH ,  Avi Tepman ,  Alexander S. Polyak

发明人： ROBERT Z. BACHRACH ,  Avi Tepman ,  Alexander S. Polyak

IPC分类号： B65G59/00

CPC分类号： B65G65/00 ,  B65G37/02 ,  B65G2201/0297 ,  H01L21/67236 ,  H01L21/67276 ,  H01L21/67715 ,  H01L21/67721 ,  H01L21/67727 ,  H01L21/67733 ,  H01L21/67748 ,  H01L21/67769

摘要： The present invention generally comprises equipment for an automated high volume batch work-piece manufacturing factory comprising work-piece handling and work-piece processing in a high productivity factory architecture capable of producing 1,000 or more work-piece an hour. The work-pieces may be presented to the equipment from a stacked supply to a parallel array. Additionally, the work-pieces may be transferred between manufacturing architectures by an array to array batch transfer. The work-pieces may be transferred within the manufacturing architecture in a parallel to parallel batch transfer operation. The robotic operations may be between robotic devices, between robotic devices and processing equipment, and within processing equipment.

摘要翻译： 本发明通常包括用于自动化大批量批量工件制造工厂的设备，其包括能够每小时生产1,000个或更多个工件的高生产率工厂结构中的工件处理和工件加工。 工件可以从堆叠的供应提供给设备到并行阵列。 另外，工件可以通过阵列在制造架构之间转移到阵列批量传输。 工件可以在并行批量传输操作的同时在制造架构内转移。 机器人操作可以在机器人设备之间，机器人设备和处理设备之间以及处理设备内。

公开(公告)号：US06939210B2

公开(公告)日：2005-09-06

申请号：US10428914

申请日：2003-05-02

申请人： Alexander S. Polyak ,  Avi Tepman

发明人： Alexander S. Polyak ,  Avi Tepman

IPC分类号： B24B37/04 ,  B24B57/02 ,  B24B9/00

CPC分类号： B24B37/04 ,  B24B37/042 ,  B24B57/02

摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the delivery arm is controllable.

摘要翻译： 已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。 分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。 限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。 在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。 在另一个实施例中，输送臂的位置是可控的。

公开(公告)号：US20130273262A1

公开(公告)日：2013-10-17

申请号：US13447035

申请日：2012-04-13

申请人： Manoj Vellaikal ,  Michael S. Cox ,  Hemant P. Mungekar ,  Chikuang C. Wang ,  Lin Zhang ,  Hari K. Ponnekanti ,  Michael P. Stewart ,  Edward P. Hammond, IV ,  Alexander S. Polyak

发明人： Manoj Vellaikal ,  Michael S. Cox ,  Hemant P. Mungekar ,  Chikuang C. Wang ,  Lin Zhang ,  Hari K. Ponnekanti ,  Michael P. Stewart ,  Edward P. Hammond, IV ,  Alexander S. Polyak

IPC分类号： C23C16/50

CPC分类号： C23C16/45565 ,  C23C16/45589 ,  C23C16/50 ,  C23C16/54

摘要： Methods and apparatus for controlling film deposition using a linear plasma source are described herein. The apparatus include a showerhead having openings therein for flowing a gas therethrough, a conveyor to support one or more substrates thereon disposed adjacent to the showerhead, and a power source for ionizing the gas. The ionized gas can be a source gas used to deposit a material on the substrate. The deposition profile of the material on the substrate can be adjusted, for example, using a gas-shaping device included in the apparatus. Additionally or alternatively, the deposition profile may be adjusted by using an actuatable showerhead. The method includes exposing a substrate to an ionized gas to deposit a film on the substrate, wherein the ionized gas is influenced with a gas-shaping device to uniformly deposit the film on the substrate as the substrate is conveyed proximate to the showerhead.

摘要翻译： 本文描述了使用线性等离子体源来控制膜沉积的方法和装置。 该装置包括：喷嘴，其中具有用于使气体流过其中的开口;输送机，用于支撑其上邻近喷淋头设置的一个或多个基板;以及用于使气体离子化的电源。 电离气体可以是用于在衬底上沉积材料的源气体。 可以例如使用包括在该装置中的气体整形装置来调节衬底上的材料的沉积轮廓。 附加地或替代地，沉积轮廓可以通过使用可启动喷头来调节。 该方法包括将衬底暴露于电离气体以在衬底上沉积膜，其中当衬底被输送到靠近喷头时，电离气体受到气体整形装置的影响，从而将膜均匀地沉积在衬底上。