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1.发明授权Source-collector device, lithographic apparatus, and device manufacturing method 有权源极集电极器件，光刻设备和器件制造方法公开(公告)号：US09411238B2
公开(公告)日：2016-08-09
申请号：US14372950
申请日：2013-01-10
Applicant: ASML Netherlands B.V.
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Michel Riepen , Hendrikus Gijsbertus Schimmel , Viacheslav Medvedev
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G21K1/067 , G21K2201/064 , H05G2/008
Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
Abstract translation: 源极 - 集电极器件包括具有等离子体形成材料的靶表面的靶单元和用于产生被引导到靶表面上的辐射束以形成来自所述等离子体形成材料的等离子体的激光单元。 提供污染物阱以减少由等离子体产生的颗粒污染物的传播。 辐射收集器包括一个或多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束，并且滤光器被配置为衰减光束的至少一个波长范围。
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2.发明申请Grazing Incidence Reflectors, Lithographic Apparatus, Methods for Manufacturing a Grazing Incidence Reflector and Methods for Manufacturing a Device 有权放射入射反射器，平版印刷设备，制造放射入射反射器的方法和制造器件的方法公开(公告)号：US20140078486A1
公开(公告)日：2014-03-20
申请号：US13983214
申请日：2012-01-18
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/702 , B82Y10/00 , G02B5/0891 , G03F7/70058 , G21K1/062 , G21K2201/061
Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.
Abstract translation: 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。
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公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
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公开(公告)号：US20170264071A1
公开(公告)日：2017-09-14
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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Patent Agency Ranking
公开(公告)号：US10437154B2
公开(公告)日：2019-10-08
申请号：US15789702
申请日：2017-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Erik Roelof Loopstra , Wouter Joep Engelen , Johannes Antonius Gerardus Akkermans
IPC: G03B27/42 , H01J31/48 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US09728931B2
公开(公告)日：2017-08-08
申请号：US15035674
申请日：2014-11-27
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
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8.发明申请SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 有权源收集器件，光刻设备和器件制造方法公开(公告)号：US20140375974A1
公开(公告)日：2014-12-25
申请号：US14372950
申请日：2013-01-10
Applicant: ASML Netherlands B.V.
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Michel Riepen , Hendrikus Gijsbertus Schimmel , Viacheslav Medvedev
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G21K1/067 , G21K2201/064 , H05G2/008
Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.
Abstract translation: 源极 - 集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。
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公开(公告)号：US11170907B2
公开(公告)日：2021-11-09
申请号：US15770688
申请日：2016-11-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Willem Herman De Jager , Sipke Jacob Bijlsma , Olav Waldemar Vladimir Frijns , Andrey Alexandrovich Nikipelov , Nicolaas Ten Kate , Antonius Theodorus Anna Maria Derksen , Jacobus Johannus Leonardus Hendricus Verspay , Robert Gabriël Maria Lansbergen , Aukje Arianne Annette Kastelijn
IPC: G21G1/10 , G21G1/12 , H05H7/08 , H01S3/09 , G02B27/10 , G21K5/00 , G21K5/04 , G21K1/08 , G21K1/093 , G21G1/00
Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
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公开(公告)号：US10103508B2
公开(公告)日：2018-10-16
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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