公开(公告)号：US11126007B2

公开(公告)日：2021-09-21

申请号：US16913698

申请日：2020-06-26

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/20 ,  G02B27/28 ,  G01N21/47 ,  G01N21/956

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US10048591B2

公开(公告)日：2018-08-14

申请号：US14592755

申请日：2015-01-08

Applicant: ASML HOLDING N.V.

Inventor： Stanislav Y. Smirnov ,  Yevgeniy Konstantinovich Shmarev

IPC: G01N22/00 ,  G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G02B21/00 ,  G02B21/04 ,  G02B17/08

Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.

公开(公告)号：US12140872B2

公开(公告)日：2024-11-12

申请号：US17796640

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Stephen Roux ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/00 ,  G03F9/00

Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

公开(公告)号：US10724961B2

公开(公告)日：2020-07-28

申请号：US15683473

申请日：2017-08-22

Applicant: ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich Shmarev ,  Stanislav Smirnov

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  G03F7/207 ,  G03F7/20

Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.

公开(公告)号：US10754259B2

公开(公告)日：2020-08-25

申请号：US16313816

申请日：2017-06-16

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Yevgeniy Konstantinovich Shmarev ,  Markus Franciscus Antonius Eurlings

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/47 ,  G02B26/08 ,  G02B27/28 ,  G02B5/00

Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.

公开(公告)号：US10107761B2

公开(公告)日：2018-10-23

申请号：US15387610

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich Shmarev ,  Stanislav Smirnov ,  Chien-Hung Tseng ,  Armand Eugene Albert Koolen

IPC: G01B11/26 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20

Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.

公开(公告)号：US10747010B2

公开(公告)日：2020-08-18

申请号：US16217424

申请日：2018-12-12

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G01N21/956 ,  G03F7/20 ,  G02B27/28 ,  G01N21/47

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US09904173B2

公开(公告)日：2018-02-27

申请号：US14970247

申请日：2015-12-15

Applicant: ASML Holding N.V.

Inventor： Yevgeniy Konstantinovich Shmarev ,  Stanislav Smirnov

IPC: G03B27/72 ,  G03F7/20 ,  G01N21/47 ,  G02B5/04 ,  G02B27/10

CPC classification number: G03F7/70133 ,  G01N21/4738 ,  G01N2201/061 ,  G01N2201/06113 ,  G01N2201/068 ,  G02B5/04 ,  G02B27/106 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70208

Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one beam and less than a depth of focus in the pupil plane of the objective optical system.

公开(公告)号：US08982481B2

公开(公告)日：2015-03-17

申请号：US13687630

申请日：2012-11-28

Applicant: ASML Holding N.V.

Inventor： Stanislav Y. Smirnov ,  Adel Joobeur ,  Yevgeniy Konstantinovich Shmarev ,  Arun Mahadevan Venkataraman

IPC: G02B17/00 ,  G02B17/08 ,  G03F7/20

CPC classification number: G02B17/08 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70625 ,  G03F7/70633

Abstract: A system and method is described for correcting aberrations caused by field curvature with a catadioptric objective. In one example, a catadioptric optical system includes a first catadioptric element and a second catadioptric element. The first catadioptric element includes a first surface positioned to reflect a beam and a second surface positioned to focus the beam reflected by the first surface. The second catadioptric element is configured to receive the beam reflected by the second surface of the first catadioptric element. The second catadioptric element includes a third surface positioned to reflect the beam, and a fourth reflective surface positioned to focus the beam reflected by the third reflective surface. A curvature of the third or fourth surfaces of the second catadioptric element is chosen to apply a positive contribution to a field curvature associated with the first catadioptric element.

Abstract translation: 描述了一种系统和方法，用于校正由反射折射物镜由场曲率引起的像差。 在一个示例中，反射折射光学系统包括第一反射折射元件和第二反射折射元件。 第一反射折射元件包括被定位成反射光束的第一表面和被定位成聚焦由第一表面反射的光束的第二表面。 第二反射折射元件被配置为接收由第一反射折射元件的第二表面反射的光束。 第二反射折射元件包括被定位成反射光束的第三表面和被定位成聚焦由第三反射表面反射的光束的第四反射表面。 选择第二反射折射元件的第三或第四表面的曲率以对与第一反射折射元件相关联的场曲率施加正贡献。