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26 条记录 (耗时 0.018 秒)

    Imaging reflectometer
    1.
    发明授权
    Imaging reflectometer 有权

    公开(公告)号：US10816464B2

    公开(公告)日：2020-10-27

    申请号：US16295173

    申请日：2019-03-07

    申请人： APPLIED MATERIALS, INC.

    发明人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Todd J. Egan

    IPC分类号： G01N21/55

    摘要： An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.

    Acoustically-monitored semiconductor substrate processing systems and methods
    4.
    发明授权
    Acoustically-monitored semiconductor substrate processing systems and methods 有权
    声控半导体衬底处理系统和方法

    公开(公告)号：US09429247B2

    公开(公告)日：2016-08-30

    申请号：US14180012

    申请日：2014-02-13

    申请人： Applied Materials, Inc.

    发明人： Kommisetti Subrahmanyam ,  Todd J. Egan ,  Joseph Yudovsky ,  Michael Johnson

    IPC分类号： F16K37/00 ,  G01N29/00 ,  H01L21/67

    CPC分类号： F16K37/0083 ,  H01L21/67253 ,  Y10T137/8158

    摘要： A semiconductor substrate processing system having acoustic monitoring is disclosed. The system includes a process chamber adapted to perform a process on a substrate, a process fluid source, a fluid conduit coupling the fluid source to the process chamber, and a flow control valve located along the fluid conduit and adapted to be operable to control a flow of a process fluid between the process fluid source and the process chamber. The system includes one or more acoustic sensors operable to sense acoustic noise coupled to at least one of the process fluid source, the fluid conduit, and the flow control valve, and an acoustic processor adapted to receive at least one signal from the one or more acoustic sensors. Acoustic monitoring methods are provided, as are other aspects.

    摘要翻译： 公开了一种具有声学监测的半导体衬底处理系统。 该系统包括适于在基板上执行处理的处理室，工艺流体源，将流体源连接到处理室的流体导管以及沿着流体导管定位的流量控制阀，并且适于可操作以控制 处理流体源和处理室之间的工艺流体的流动。 该系统包括一个或多个声学传感器，其可操作以感测耦合到过程流体源，流体导管和流量控制阀中的至少一个的声学噪声，以及适于从一个或多个 声传感器。 提供声学监测方法，以及其他方面。

    IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION
    6.
    发明申请
    IN-LINE MONITORING OF OLED LAYER THICKNESS AND DOPANT CONCENTRATION 有权

    公开(公告)号：US20210226182A1

    公开(公告)日：2021-07-22

    申请号：US17152688

    申请日：2021-01-19

    申请人： Applied Materials, Inc.

    发明人： Yeishin Tung ,  Byung Sung Kwak ,  Robert Jan Visser ,  Guoheng Zhao ,  Todd J. Egan

    IPC分类号： H01L51/56 ,  H01L51/00 ,  C23C14/12 ,  C23C14/24 ,  C23C14/50 ,  C23C14/54 ,  C23C14/56

    摘要： An organic light-emitting diode (OLED) deposition system includes two deposition chambers, a transfer chamber between the two deposition chambers, a metrology system having one or more sensors to perform measurements of the workpiece within the transfer chamber, and a control system to cause the system to form an organic light-emitting diode layer stack on the workpiece. Vacuum is maintained around the workpiece while the workpiece is transferred between the two deposition chambers and while retaining the workpiece within the transfer chamber. The control system is configured to cause the two deposition chambers to deposit two layers of organic material onto the workpiece, and to receive a first plurality of measurements of the workpiece in the transfer chamber from the metrology system.

    APPARATUS, SYSTEMS, AND METHODS FOR TEMPERATURE CONTROL OF SUBSTRATES USING EMBEDDED FIBER OPTICS AND EPOXY OPTICAL DIFFUSERS
    9.
    发明申请
    APPARATUS, SYSTEMS, AND METHODS FOR TEMPERATURE CONTROL OF SUBSTRATES USING EMBEDDED FIBER OPTICS AND EPOXY OPTICAL DIFFUSERS 审中-公开
    使用嵌入式光纤和环氧光学扩散器的基板温度控制的装置，系统和方法

    公开(公告)号：US20160007412A1

    公开(公告)日：2016-01-07

    申请号：US14738448

    申请日：2015-06-12

    申请人： Applied Materials, Inc.

    发明人： Matthew Busche ,  Wendell Boyd, JR. ,  Todd J. Egan ,  Gregory L. Kirk ,  Vijay D. Parkhe ,  Michael R. Rice ,  Leon Volfovski

    IPC分类号： H05B3/00 ,  H05B3/26 ,  H05B3/14 ,  H01L21/67 ,  H05B3/06

    摘要： Substrate temperature control apparatus and electronic device manufacturing systems provide pixelated light-based heating to a substrate in a process chamber. A substrate holder in the process chamber may include a baseplate. The baseplate has a top surface that may have a plurality of cavities and a plurality of grooves connected to the cavities. Optical fibers may be received in the grooves such that each cavity has a respective optical fiber terminating therein to transfer light thereto. Some or all of the cavities may have an epoxy optical diffuser disposed therein to diffuse light provided by the optical fiber. A ceramic plate upon which a substrate may be placed may be bonded to the baseplate. A thermal spreader plate may optionally be provided between the baseplate and the ceramic plate. Methods of controlling temperature across a substrate holder in an electronic device manufacturing system are also provided, as are other aspects.

    摘要翻译： 基板温度控制装置和电子装置制造系统向处理室中的基板提供像素化的基于光的加热。 处理室中的衬底保持器可以包括底板。 底板具有可以具有多个空腔的顶表面和连接到空腔的多个凹槽。 光纤可以被容纳在槽中，使得每个空腔具有终止于其中的相应光纤以将光传送到其上。 一些或所有空腔可以具有设置在其中的环氧光学漫射器以漫射由光纤提供的光。 可以将衬底放置在其上的陶瓷板可以结合到基板。 可以可选地在基板和陶瓷板之间设置散热板。 还提供了在电子设备制造系统中控制衬底保持器温度的方法，以及其他方面。