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公开(公告)号:US09536769B1
公开(公告)日:2017-01-03
申请号:US15268087
申请日:2016-09-16
Applicant: Applied Materials, Inc.
Inventor: Reza Sadjadi , Wendell Glen Boyd, Jr. , Vijay D. Parkhe , Maxim Mikhailovich Noginov
IPC: H01L21/683 , H01L27/12 , H01J37/32 , H01L21/67
CPC classification number: H01L21/28556 , C23C16/00 , G06K2009/00738 , H01J37/32697 , H01J37/32715 , H01J2237/334 , H01L21/02252 , H01L21/02274 , H01L21/0228 , H01L21/0262 , H01L21/265 , H01L21/3065 , H01L21/31116 , H01L21/31138 , H01L21/32136 , H01L21/67063 , H01L21/67103 , H01L21/6833 , H01L27/1255 , H01L29/93 , H04N7/181 , H04N7/188
Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.
Abstract translation: 本文所述的实施例提供了用于像素化静电卡盘的夹持电路,其能够在静电卡盘和放置在其上的基板之间的RF耦合的侧向和方位调谐。 在一个实施例中,用于静电卡盘(ESC)的夹紧电路具有设置在ESC的电介质体中的一个或多个夹持电极,设置在电介质体中的多个像素电极以及具有一个或多个卡盘 电极和多个像素电极,所述夹持电路可操作以将基板静电吸附到ESC的工件支撑表面,所述夹持电路具有多个次级电路,其中每个次级电路包括多个电容器中的至少一个电容器 每个次级电路被配置为独立地控制像素电极之一和地之间的阻抗。
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公开(公告)号:US09805965B2
公开(公告)日:2017-10-31
申请号:US15395938
申请日:2016-12-30
Applicant: Applied Materials, Inc.
Inventor: Reza Sadjadi , Wendell Glen Boyd, Jr. , Vijay D. Parkhe , Maxim Mikhailovich Noginov
CPC classification number: H01L21/28556 , C23C16/00 , G06K2009/00738 , H01J37/32697 , H01J37/32715 , H01J2237/334 , H01L21/02252 , H01L21/02274 , H01L21/0228 , H01L21/0262 , H01L21/265 , H01L21/3065 , H01L21/31116 , H01L21/31138 , H01L21/32136 , H01L21/67063 , H01L21/67103 , H01L21/6833 , H01L27/1255 , H01L29/93 , H04N7/181 , H04N7/188
Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.
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公开(公告)号:US09646843B2
公开(公告)日:2017-05-09
申请号:US14829662
申请日:2015-08-19
Applicant: Applied Materials, Inc.
Inventor: Andrew Nguyen , Tza-Jing Gung , Haitao Wang , Maxim Mikhailovich Noginov , Reza Sadjadi , Chunlei Zhang , Xue Yang
IPC: H01J37/32 , H01L21/3065 , C23C16/50 , C23C16/455 , C23C14/22 , H01L21/02
CPC classification number: H01L21/3065 , C23C14/22 , C23C16/45565 , C23C16/46 , C23C16/50 , C23C16/505 , H01J37/32082 , H01J37/32669 , H01L21/02274
Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.
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公开(公告)号:US10811233B2
公开(公告)日:2020-10-20
申请号:US15673403
申请日:2017-08-09
Applicant: APPLIED MATERIALS, INC.
Inventor: Andrew Nguyen , Xue Yang Chang , Haitao Wang , Kei-Yu Ko , Reza Sadjadi
IPC: H01J37/32
Abstract: Process chambers having a tunable showerhead and a tunable liner are disclosed herein. In some embodiments, a processing chamber includes a showerhead; a chamber liner; a first impedance circuit coupled to the showerhead to tune an impedance of the showerhead; a second impedance circuit coupled to the chamber liner to tune an impedance of the chamber liner; and a controller coupled to the first and second impedance circuits to control relative impedances of the showerhead and the chamber liner.
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