公开(公告)号：US5350921A

公开(公告)日：1994-09-27

申请号：US94955

申请日：1993-07-23

Applicant: Takashi Aoyama ,  Yutaka Misawa

Inventor： Takashi Aoyama ,  Yutaka Misawa

IPC: H01J37/252 ,  H01J37/26 ,  H01J37/295 ,  H01J49/26 ,  G01N23/00

CPC classification number: H01J37/252 ,  H01J37/265

Abstract: An analytical electron microscope automatically identifies objects in a sample on the basis of shape of the object, change of thickness of the object and/or change of element (such as change of element type or concentration). Therefore, the operator of the analytical electron microscope can specify a desired object, and an example or examples of that object in a sample can be identified automatically. The characteristics need to identify the object are determined by detecting the effect of the sample on the electron beam of the analytical electron microscope, using, for example, an energy dispersive type X-ray analyzer and an electron energy loss spectrometer. Once an example of the object has been identified, it may be analyzed further. The analytical electron microscope may also analyze a sample to identify and classify the objects present.

Abstract translation: 分析电子显微镜根据物体的形状，物体的厚度变化和/或元素的变化（例如元件类型或浓度的变化）自动识别样品中的物体。 因此，分析电子显微镜的操作者可以指定期望的对象，并且可以自动识别样品中的该对象的示例或示例。 通过使用例如能量色散型X射线分析仪和电子能量损失光谱仪，通过检测样品对分析电子显微镜的电子束的影响来确定对象的特征。 一旦已经识别出对象的示例，则可以进一步分析该对象的示例。 分析电子显微镜还可以分析样品以鉴别和分类存在的物体。

公开(公告)号：US5294336A

公开(公告)日：1994-03-15

申请号：US896784

申请日：1992-06-09

Applicant: Masako Mizuno ,  Kenji Tochigi ,  Yutaka Misawa ,  Hiroyuki Miyagi ,  Yoshio Watanabe ,  Taro Nogami ,  Junkichi Miura ,  Yoshinori Takata

Inventor： Masako Mizuno ,  Kenji Tochigi ,  Yutaka Misawa ,  Hiroyuki Miyagi ,  Yoshio Watanabe ,  Taro Nogami ,  Junkichi Miura ,  Yoshinori Takata

IPC: G01N30/32 ,  B01D15/08 ,  B01J20/281 ,  G01N30/02 ,  G01N30/86 ,  G01N30/88 ,  G01N33/487 ,  G01N33/72

CPC classification number: G01N33/723 ,  B01D15/08 ,  G01N2030/027

Abstract: Stable hemoglobin A.sub.lc (s-A.sub.lc) can be separated from other hemoglobin components and quantitated in a short time by means of a liquid-chromatographic apparatus comprising a separation column packed with a packing material consisting essentially of a porous substance having a carboxyalkyl group combined thereinto, as ion exchanger, a means for injecting a sample into the separation column, a means for passing one or more eluents through the separation column, and a means for detecting hemoglobin, hemoglobin derivatives or glycosylated hemoglobin, the average particle size of the packing material in dry state being 4 .mu.m or less.

Abstract translation: 稳定的血红蛋白Alc（s-Alc）可以与其他血红蛋白成分分离，并通过液相色谱装置在短时间内定量，该​​液相色谱装置包括一个分离柱，该分离柱填充有基本上由其中组合有羧基烷基的多孔物质组成的包装材料 作为离子交换剂，将样品注入分离塔的方法，使一个或多个洗脱液通过分离塔的装置和用于检测血红蛋白，血红蛋白衍生物或糖基化血红蛋白的装置，包装材料的平均粒径 在干燥状态下为4（my）m或更小。

公开(公告)号：US5084355A

公开(公告)日：1992-01-28

申请号：US336788

申请日：1989-04-13

Applicant: Shigeru Takahashi ,  Takuya Fukuda ,  Toshiya Satoh ,  Seikichi Tanno ,  Michio Ohue ,  Naohiro Momma ,  Yutaka Misawa

Inventor： Shigeru Takahashi ,  Takuya Fukuda ,  Toshiya Satoh ,  Seikichi Tanno ,  Michio Ohue ,  Naohiro Momma ,  Yutaka Misawa

IPC: G11B7/243 ,  G11B7/244 ,  G11B7/253 ,  G11B7/2533 ,  G11B7/254 ,  G11B7/257 ,  G11B7/2578 ,  G11B7/26 ,  H01L23/14 ,  H01L23/498 ,  H05K3/38

CPC classification number: H05K3/388 ,  G11B7/2533 ,  G11B7/257 ,  G11B7/26 ,  H01L23/145 ,  H01L23/49866 ,  G11B2007/24306 ,  G11B2007/25706 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B7/2578 ,  H01L2924/0002 ,  Y10S428/90 ,  Y10S428/901 ,  Y10T428/31678

Abstract: A laminar structure comprising an organic material and an inorganic material; for example, a coating structure on an organic substrate comprising an organic material on which an inorganic film must be formed and a method of producing the structure, a structure which is suitable for increasing the reliability of an optical disk and a method of producing this, a wiring structure on an organic substrate comprising the organic material on which electric wiring must be formed and a method of producing this, and a structure suitable for increasing the reliability of a semiconductor integrated circuit device and a method of producing this. In order to provide a laminar structure which exhibits a high degree of reliability with respect to prevention of cracks or separation and which comprises an organic material and an inorganic material and a method of producing this structure and a device which utilizes this structure, the present invention provides a laminar structure on an organic substrate comprising the organic substrate comprising an organic material and a thin film which is caused to adhere to the surface of the organic substrate and which comprises an inorganic material a second element which produces a metal bonding or covalent bonding with the first element that forms the thin film being contained in the organic substrate in the vicinity of the surface thereof.

公开(公告)号：US4219373A

公开(公告)日：1980-08-26

申请号：US1163

申请日：1979-01-05

Applicant: Yasuhiro Mochizuki ,  Hiroaki Hachino ,  Yutaka Misawa ,  Yoko Wakui

Inventor： Yasuhiro Mochizuki ,  Hiroaki Hachino ,  Yutaka Misawa ,  Yoko Wakui

IPC: H01L21/225 ,  H01L21/332 ,  H01L21/761

CPC classification number: H01L29/66393 ,  H01L21/2254 ,  H01L21/761 ,  Y10S438/92

Abstract: A method of fabricating a semiconductor device of the type wherein aluminium layers are selectively deposited on the major surface of a silicon semiconductor substrate and thereafter aluminium is selectively diffused into the silicon semiconductor substrate by means of heat treatment in an atmosphere including an oxygen gas. Recesses are selectively formed in at least one major surface of the silicon semiconductor substrate, aluminium is deposited onto the recesses, and the silicon semiconductor substrate is then subjected to a heat treatment to selectively diffuse the aluminium into the silicon semiconductor substrate. Layers of oxide of silicon-aluminium alloy formed on the major surface subjected to the aluminium diffusion will not cause any damage of a photo-mask and at the same time accuracy in positioning the photo-mask may be improved. A failure to mount a semiconductor element onto a heat sink may also be prevented.

Abstract translation: 一种制造这样的半导体器件的方法，其中铝层被选择性地沉积在硅半导体衬底的主表面上，此后铝通过在包括氧气的气氛中的热处理而被选择性地扩散到硅半导体衬底中。 在硅半导体衬底的至少一个主表面中选择性地形成凹部，将铝沉积到凹部上，然后对硅半导体衬底进行热处理以选择性地将铝扩散到硅半导体衬底中。 形成在经受铝扩散的主表面上的硅铝合金的氧化物层不会对光掩模造成任何损坏，同时可以提高光掩模的定位精度。 还可以防止将半导体元件安装到散热器上的故障。

公开(公告)号：US5449534A

公开(公告)日：1995-09-12

申请号：US942397

申请日：1992-09-09

Applicant: Tomoji Oishi ,  Sachiko Maekawa ,  Akira Kato ,  Masahiro Nishizawa ,  Yoshifumi Tomita ,  Kojiro Okude ,  Kenji Tochigi ,  Yutaka Misawa

Inventor： Tomoji Oishi ,  Sachiko Maekawa ,  Akira Kato ,  Masahiro Nishizawa ,  Yoshifumi Tomita ,  Kojiro Okude ,  Kenji Tochigi ,  Yutaka Misawa

IPC: G02B1/11 ,  H01J29/89 ,  B05D3/06 ,  B05D5/06 ,  B05D5/12

CPC classification number: G02B1/11 ,  H01J29/896 ,  H01J2209/012

Abstract: An anti-reflection film is produced on the panel surface of a cathode-ray tube by:(A) preparing a solution for forming an anti-reflection film, which contains water and a metal alkoxide having the formula,M(OR).sub.nwherein M is a metal selected from the group consisting of Si, Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different,(B) coating the solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube, and(C) applying an ultraviolet light to the solution for forming an anti-reflection film coated on said surface to cure the solution to form a transparent film with fine roughness.This production method is carried out using an apparatus having:(a) a coating means for coating the above solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube,(b) a transferring means for transferring the solution-coated cathode-ray tube, and(c) an ultraviolet light-applying means for photocuring the solution coated on the cathode-ray tube during the transfer of the solution-coated cathode-ray tube.In the above method, when a silicon alkoxide is used as the metal alkoxide, there can be obtained a cathode-ray tube having an anti-reflection film made of alkali-free silica on the outermost surface of the panel, said anti-reflection film giving a ratio of Si-O-Si peak intensity to Si-OH peak intensity of 4 or more when measured for infrared spectrum.

Abstract translation: 在阴极射线管的面板表面上制造防反射膜：（A）制备含有水和金属醇盐的抗反射膜的溶液，所述金属醇盐具有式M（OR）n，其中 M是选自Si，Ti，Al，Zr，Sn，In，Sb和Zn的金属; R是具有1-10个碳原子的烷基; n为1〜8的整数， 当n不为1时，由R表示的烷基可以相同或不同，（B）在阴极射线管的面板的最外表面上涂布形成抗反射膜的溶液，（C ）向所述溶液施加紫外光以形成涂覆在所述表面上的抗反射膜，以使溶液固化以形成具有精细粗糙度的透明膜。 该制造方法使用以下装置进行：（a）在阴极射线管的面板的最表面上涂布上述用于形成防反射膜的溶液的涂布装置，（b）转印装置， 转移溶液涂覆的阴极射线管，以及（c）紫外线照射装置，用于在涂覆阴极射线管的转印期间光固化涂覆在阴极射线管上的溶液。 在上述方法中，当使用硅醇盐作为金属醇盐时，可以获得在面板的最外表面上具有由无碱二氧化硅制成的防反射膜的阴极射线管，所述防反射膜 当测量红外光谱时，Si-O-Si峰强度与Si-OH峰强度之比为4以上。

公开(公告)号：US5266815A

公开(公告)日：1993-11-30

申请号：US863530

申请日：1992-04-06

Applicant: Hideo Sunami ,  Toshikazu Nishino ,  Shoji Shukuri ,  Yasuo Wada ,  Yutaka Misawa ,  Takahiko Kato

Inventor： Hideo Sunami ,  Toshikazu Nishino ,  Shoji Shukuri ,  Yasuo Wada ,  Yutaka Misawa ,  Takahiko Kato

IPC: H01L23/532 ,  H01L39/02 ,  H01L39/14 ,  H01L39/24 ,  H01L29/00 ,  H01L39/22

CPC classification number: H01L23/53285 ,  H01L39/02 ,  H01L39/2464 ,  H01L2924/0002 ,  Y10S505/874

Abstract: Technology for using a wiring of a superconductive material in semiconductor integrated circuit device. An isolation layer and/or a barrier layer are provided for preventing diffusion of harmful composition of the superconductive material for the semiconductor device. Control of a circuit can be made utilizing the characteristics of a superconductive material. Also, the characteristics of a superconductive material may be controlled. A method of forming a layer of superconductive material, well compatible with the widely used process of manufacturing integrated circuit devices, is also disclosed.

Abstract translation: 在半导体集成电路器件中使用超导材料的布线的技术。 提供隔离层和/或阻挡层以防止用于半导体器件的超导材料的有害成分的扩散。 可以利用超导材料的特性来进行电路的控制。 而且，可以控制超导材料的特性。 还公开了形成与制造集成电路器件的广泛使用的工艺良好兼容的超导材料层的方法。

公开(公告)号：US4193826A

公开(公告)日：1980-03-18

申请号：US931399

申请日：1978-08-07

Applicant: Yasuhiro Mochizuki ,  Hiroaki Hachino ,  Yasumichi Yasuda ,  Yutaka Misawa ,  Takuzo Ogawa

Inventor： Yasuhiro Mochizuki ,  Hiroaki Hachino ,  Yasumichi Yasuda ,  Yutaka Misawa ,  Takuzo Ogawa

IPC: H01L21/223 ,  H01L21/28

CPC classification number: H01L21/223

Abstract: A method of fabricating a semiconductor device through selective diffusion of aluminum vapor into a silicon substrate by heating a sealed tube in which the silicon substrate and an aluminum source are disposed. The diffusion is effected with a low concentration of aluminum smaller than about 10.sup.17 atoms/cm.sup.3, thereby making it possible to use a silicon oxide film as a diffusion mask for the selective diffusion of aluminum at predetermined region of the silicon substrate.

Abstract translation: 一种制造半导体器件的方法，该方法通过加热其中设置有硅衬底和铝源的密封管将铝蒸气选择性地扩散到硅衬底中。 扩散是用小于约1017原子/ cm3的低浓度铝进行的，从而可以使用氧化硅膜作为扩散掩模，用于在硅衬底的预定区域选择性扩散铝。

公开(公告)号：US5817421A

公开(公告)日：1998-10-06

申请号：US446512

申请日：1995-05-22

Applicant: Tomoji Oishi ,  Sachiko Maekawa ,  Akira Kato ,  Masahiro Nishizawa ,  Yoshifumi Tomita ,  Kojiro Okude ,  Kenji Tochigi ,  Yutaka Misawa

Inventor： Tomoji Oishi ,  Sachiko Maekawa ,  Akira Kato ,  Masahiro Nishizawa ,  Yoshifumi Tomita ,  Kojiro Okude ,  Kenji Tochigi ,  Yutaka Misawa

IPC: G02B1/11 ,  H01J29/89 ,  B32B9/04

CPC classification number: G02B1/11 ,  H01J29/896 ,  H01J2209/012

Abstract: An anti-reflection film is produced on the panel surface of a cathode-ray tube by: (A) preparing a solution for forming an anti-reflection film, which contains water and a metal alkoxide having the formula, M(OR).sub.n wherein M is a metal selected from the group consisting of Si, Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different, (B) coating the solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube, and (C) applying an ultraviolet light to the solution for forming an anti-reflection film coated on said surface to cure the solution to form a transparent film with fine roughness. This production method is carried out using an apparatus having: (a) a coating means for coating the above solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube, (b) a transferring means for transferring the solution-coated cathode-ray tube, and (c) an ultraviolet light-applying means for photocuring the solution coated on the cathode-ray tube during the transfer of the solution-coated cathode-ray tube. In the above method, when a silicon alkoxide is used as the metal alkoxide, there can be obtained a cathode-ray tube having an anti-reflection film made of alkali-free silica on the outermost surface of the panel, said anti-reflection film giving a ratio of Si-O-Si peak intensity to Si-OH peak intensity of 4 or more when measured for infrared spectrum.

Abstract translation: 在阴极射线管的面板表面上，通过以下方法在阴极射线管的面板表面上产生防反射膜：（A）制备形成抗反射膜的溶液，该防反射膜含有水和具有式M（OR）n的金属醇盐，其中M 是选自由Si，Ti，Al，Zr，Sn，In，Sb和Zn组成的组的金属; R是具有1-10个碳原子的烷基; n为1〜8的整数， 当n不为1时，由R表示的烷基可以相同或不同，（B）在阴极射线管的面板的最外表面上涂布形成抗反射膜的溶液，（C ）向所述溶液施加紫外光以形成涂覆在所述表面上的抗反射膜，以使溶液固化以形成具有精细粗糙度的透明膜。 该制造方法使用以下装置进行：（a）在阴极射线管的面板的最表面上涂布上述用于形成防反射膜的溶液的涂布装置，（b）转印装置， 转移溶液涂覆的阴极射线管，以及（c）紫外线照射装置，用于在涂覆阴极射线管的转印期间光固化涂覆在阴极射线管上的溶液。 在上述方法中，当使用硅醇盐作为金属醇盐时，可以获得在面板的最外表面上具有由无碱二氧化硅制成的防反射膜的阴极射线管，所述防反射膜 当测量红外光谱时，Si-O-Si峰强度与Si-OH峰强度之比为4以上。

公开(公告)号：US5417853A

公开(公告)日：1995-05-23

申请号：US208043

申请日：1994-03-09

Applicant: Masako Mizuno ,  Kenji Tochigi ,  Yutaka Misawa

Inventor： Masako Mizuno ,  Kenji Tochigi ,  Yutaka Misawa

IPC: G01N30/26 ,  B01J20/281 ,  B01J20/285 ,  G01N1/00 ,  G01N1/28 ,  G01N1/40 ,  G01N21/25 ,  G01N30/34 ,  G01N30/46 ,  G01N30/62 ,  G01N30/86 ,  G01N30/88 ,  G01N33/72 ,  B01D15/08

CPC classification number: G01N33/723 ,  G01N30/88 ,  G01N1/40 ,  G01N2030/628 ,  G01N2030/8804 ,  G01N21/25 ,  G01N30/34 ,  G01N30/466 ,  G01N30/8658 ,  G01N30/8665 ,  G01N33/72 ,  G01N35/1097

Abstract: In a liquid chromatographic system for analyzing biological or vital components in blood, etc., a separation column packed with a packing material of organic porous material containing carboxyalkyl groups as functional groups and having pore diameter of 600 to 1,200 .ANG. in dry state and an ion exchange capacity of 0.1 to 0.5 meq/g on dry basis is used to improve the chromatographic performance of the separation column, 5-component and 6-component analysis are carried out by switching separation columns of different column length or diameter, and judgement of column life is made by evaluation parameters.

Abstract translation: 在用于分析血液等中的生物或重要成分的液相色谱系统中，分离柱装填有含有羧基烷基作为官能团并且具有干燥状态的孔径为600至1200的ANGSTROM的有机多孔材料的包装材料和离子 交换容量为0.1〜0.5meq / g用于提高分离柱的色谱性能，5组分和6组分分析通过切换不同柱长或直径的分离柱进行，并进行柱的判断 生命是通过评估参数进行的。

公开(公告)号：US4954855A

公开(公告)日：1990-09-04

申请号：US113360

申请日：1987-10-28

Applicant: Akio Mimura ,  Yoshikazu Hosokawa ,  Takaya Suzuki ,  Takashi Aoyama ,  Nobutake Konishi ,  Yutaka Misawa ,  Kenji Miyata

Inventor： Akio Mimura ,  Yoshikazu Hosokawa ,  Takaya Suzuki ,  Takashi Aoyama ,  Nobutake Konishi ,  Yutaka Misawa ,  Kenji Miyata

IPC: H01L21/336 ,  H01L29/45 ,  H01L29/49 ,  H01L29/786

CPC classification number: H01L29/66757 ,  H01L29/456 ,  H01L29/458 ,  H01L29/4908 ,  H01L29/7866 ,  H01L29/78675

Abstract: A thin film transistor formed on an insulating sulstrate is disclosed in which metal silicide layers are formed in a thin film made of a monocrystalline, polycrystalline, or amorphous semiconductor material, to be used as source and drain regions, and further a gate electrode includes a metal silicide layer.

Abstract translation: 公开了一种形成在绝缘硅片上的薄膜晶体管，其中金属硅化物层形成在由单晶，多晶或非晶半导体材料制成的薄膜中，用作源极和漏极区域，并且还包括一个栅电极 金属硅化物层。