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    Immersion exposure apparatus and device manufacturing method
    1.
    发明授权
    Immersion exposure apparatus and device manufacturing method 有权
    浸渍曝光装置及装置的制造方法

    公开(公告)号：US08035796B2

    公开(公告)日：2011-10-11

    申请号：US12133206

    申请日：2008-06-04

    申请人： Yuichi Iwasaki

    发明人： Yuichi Iwasaki

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70716

    摘要： An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.

    摘要翻译： 通过液体露出基板的浸渍曝光装置包括照明光学系统，投影光学系统，卡盘，液体支撑板，台架和拒液性回收单元。 照明光学系统用来自曝光光源的曝光光照射原稿。 投影光学系统将原稿的图案投影到基板上。 卡盘夹持基板。 液体支撑板与由卡盘保持的基板一起支撑液体。 液体支撑板的表面包括金属氧化物的表面。 该台设置有卡盘和液体支撑板并且是可移动的。 液体排斥性回收单元被构造为回收关于液体的金属氧化物表面的拒水性。

    IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    倾斜曝光装置和装置制造方法

    公开(公告)号：US20090002649A1

    公开(公告)日：2009-01-01

    申请号：US12133206

    申请日：2008-06-04

    申请人： Yuichi Iwasaki

    发明人： Yuichi Iwasaki

    IPC分类号： G03B27/52

    CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70716

    摘要： An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.

    摘要翻译： 通过液体露出基板的浸渍曝光装置包括照明光学系统，投影光学系统，卡盘，液体支撑板，台架和拒液性回收单元。 照明光学系统用来自曝光光源的曝光光照射原稿。 投影光学系统将原稿的图案投影到基板上。 卡盘夹持基板。 液体支撑板与由卡盘保持的基板一起支撑液体。 液体支撑板的表面包括金属氧化物的表面。 该台设置有卡盘和液体支撑板并且是可移动的。 液体排斥性回收单元被构造为回收关于液体的金属氧化物表面的拒水性。

    Method for forming fine structure
    6.
    发明授权
    Method for forming fine structure 失效
    形成精细结构的方法

    公开(公告)号：US06475704B1

    公开(公告)日：2002-11-05

    申请号：US09150837

    申请日：1998-09-10

    申请人： Yuichi Iwasaki ,  Ichiro Tanaka

    发明人： Yuichi Iwasaki ,  Ichiro Tanaka

    IPC分类号： G03C500

    CPC分类号： C23F1/20 ,  C23F1/02 ,  C23F1/26 ,  G02B5/1857 ,  G03F7/0005

    摘要： In order to form three or more steps on a substrate with high precision, a first mask is formed to an area on the substrate corresponding with every other step, and also etching is performed on the area of the substrate to which the first mask is not formed, a second mask is formed to an area on the substrate to which the first mask has not been formed, and also etching is performed on the area on the substrate to which the first and the second masks are not formed.

    摘要翻译： 为了在基板上高精度地形成三个以上的台阶，对于与其他工序相对应的基板上的区域形成第一掩模，并且对基板的不是第一掩模的区域进行蚀刻 形成的第二掩模形成在未形成第一掩模的基板上的区域上，并且对未形成第一和第二掩模的基板上的区域进行蚀刻。

    Method of forming an optical element
    8.
    发明授权
    Method of forming an optical element 失效
    形成光学元件的方法

    公开(公告)号：US06514674B1

    公开(公告)日：2003-02-04

    申请号：US09521380

    申请日：2000-03-08

    申请人： Yuichi Iwasaki

    发明人： Yuichi Iwasaki

    IPC分类号： G02B518

    CPC分类号： G02B1/11 ,  G02B5/1857

    摘要： The back surface of a BOE (binary optical element) having a binary optical structure formed thereon is coated with a resist film. Chromium is then deposited on the BOE by means of electron beam evaporation so as to form an island structure with an island size of about 50 nm and an island-to-island distance of about 80 nm. The BOE is then etched with an etchant to a depth of 55 nm using the island structure as a mask thereby forming a pillar-shaped microstructure. The island structure used as the mask is removed by means of wet etching using an etchant, and the resist film on the back surface of the BOE is removed using a resist remover. Thus, a microstructure is obtained which has antireflection capability allowing suppression of reflection to a level of 1% or less for a wavelength of 248 nm.

    摘要翻译： 在其上形成有二元光学结构的BOE（二进制光学元件）的背面涂覆有抗蚀剂膜。 然后通过电子束蒸发将铬沉积在BOE上，以便形成岛尺寸为约50nm，岛至岛距离为约80nm的岛状结构。 然后使用岛结构作为掩模，用蚀刻剂蚀刻BOE至55nm的深度，从而形成柱状微结构。 通过使用蚀刻剂的湿蚀刻除去用作掩模的岛结构，并使用抗蚀剂去除剂去除BOE背面上的抗蚀剂膜。 因此，获得了具有抗反射能力的微结构，其允许在248nm的波长下抑制反射至1％或更低的水平。

    Exposure apparatus
    9.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US07679717B2

    公开(公告)日：2010-03-16

    申请号：US11563885

    申请日：2006-11-28

    申请人： Yuichi Iwasaki

    发明人： Yuichi Iwasaki

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70341

    摘要： An exposure apparatus for exposing a pattern of a reticle onto a substrate includes a projection optical system for projecting the pattern onto a substrate, the exposure apparatus exposing the substrate through a flammable liquid that is filled in a space between the substrate and a final lens of the projection optical system closest to the substrate, and an explosion-proof unit for shielding an ignition source that can ignite the liquid or vapor of the liquid, from the liquid and the vapor.

    摘要翻译： 用于将掩模版的图案曝光到基板上的曝光装置包括用于将图案投影到基板上的投影光学系统，曝光装置通过可燃液体曝光，该可燃液体填充在基板和最终透镜之间的空间中 最靠近基板的投影光学系统，以及用于屏蔽可以从液体和蒸汽点燃液体的液体或蒸气的点火源的防爆单元。

    Method of manufacturing diffractive optical element
    10.
    发明授权
    Method of manufacturing diffractive optical element 失效
    衍射光学元件的制造方法

    公开(公告)号：US06930834B2

    公开(公告)日：2005-08-16

    申请号：US10023689

    申请日：2001-12-21

    申请人： Makoto Ogusu ,  Yuichi Iwasaki

    发明人： Makoto Ogusu ,  Yuichi Iwasaki

    IPC分类号： C23F1/02 ,  G02B5/18 ,  G03F1/52 ,  G03F1/70 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G02B5/1857 ,  C23F1/02 ,  G03F7/0005 ,  G03F7/0035

    摘要： A method of manufacturing a diffractive optical element, including a process for forming a resist mask of blazed shape upon a substrate and for etching the substrate by use of the resist mask so that the blazed shape is transferred to the substrate. The method includes a process for forming, before the etching, an element being effective to prevent a taper shape, to be produced at an edge of the blazed shape of the resist mask, from being transformed to the substrate.

    摘要翻译： 一种制造衍射光学元件的方法，包括在衬底上形成闪耀形状的抗蚀剂掩模并通过使用抗蚀剂掩模蚀刻衬底的工艺，使得闪耀形状被转印到衬底。 该方法包括在蚀刻之前形成有效防止在抗蚀剂掩模的闪耀形状的边缘处产生的锥形形状的元件被转变为基板的工艺。