- 专利标题： Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
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申请号： US10670328申请日： 2003-09-26
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公开(公告)号： US20050035300A1公开(公告)日： 2005-02-17
- 发明人: Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
- 申请人： Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Canon Kabushiki Kaisha,Hitachi, Ltd.
- 当前专利权人： Canon Kabushiki Kaisha,Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 优先权： JP2002-291710(PAT. 20021003; JP2002-291709(PAT. 20021003; JP2002-313423(PAT. 20021028
- 主分类号： H01J37/147
- IPC分类号： H01J37/147
摘要：
A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
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