公开(公告)号：US09694389B2

公开(公告)日：2017-07-04

申请号：US13892241

申请日：2013-05-10

申请人： Fa-Gung Fan ,  David Bohling ,  David Michael Keicher ,  Marcelino Essien

发明人： Fa-Gung Fan ,  David Bohling ,  David Michael Keicher ,  Marcelino Essien

IPC分类号： B05D5/12 ,  B29C67/00

CPC分类号： B05D5/12 ,  B29C64/112 ,  B29C67/0051 ,  B33Y30/00

摘要： The object of the invention is the provision of methods for controlled production of continuous multi-component filaments or discreet structures using a multi-component liquid jet issuing from an orifice. A multi-component jet consists of two or more liquids. The liquids may be miscible or immiscible, and form a co-axially propagating flow along the central axis of a flow cell. The working distance between the exit orifice and a substrate can be as large as 50 mm, so that in-flight processing of the jet is possible. The coaxial flow consists of an outer sheath liquid and an inner sample liquid or composite of liquids. The flow cell and the exit channel of the deposition head are heated so that the pressurized sheath liquid temperature is raised to near or above the boiling point of the sheath liquid at the local atmospheric pressure. The jet exits the deposition head through the orifice, and the outer liquid is evaporated as the jet falls at atmospheric pressure. The sheath liquid is processed thermally, optically, or chemically during flight to form a protective or insulating layer for the inner liquid or liquids. The inner liquids may contrastingly consist of an ultraviolet (UV) curable ink that is processed in-flight or after deposition. Since UV curable inks contain no volatile components, the coaxial jetted filament can be processed without producing cracks or bubbles in the sheath layer. Line widths are produced in the range from approximately 1 to 1000 microns.

公开(公告)号：US20160193627A1

公开(公告)日：2016-07-07

申请号：US14927380

申请日：2015-10-29

申请人： Marcelino Essien

发明人： Marcelino Essien

IPC分类号： B05D1/02 ,  B05D3/04 ,  B05B1/02

CPC分类号： B41J3/407

摘要： The object of the invention is the provision of apparatuses and methods for maskless direct printing of continuous films or discreet structures on a substrate using aerodynamic focusing. The method uses an interchangeable and variable aerodynamic lens system and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a multi-orifice lens or a single-orifice lens or lenses coupled to a converging fluid dispense nozzle. A combined annular sheath and aerosol flow is propagated through at least two orifices. A liquid atomizer with temperature control, variable continuous or pulsed excitation, and constant or variable frequency, is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The combined flow through the lens system produces a narrow, highly stable subsonic jet that remains collimated for as much as one centimeter beyond the orifice of the nozzle. The method produces well-defined traces on a substrate with line widths in a range from approximately 10 to 1000 microns.

摘要翻译： 本发明的目的是提供使用空气动力学聚焦在基片上无连续直接印刷连续薄膜或分散结构的设备和方法。 该方法使用可互换和可变的空气动力学透镜系统和环形流动的护套气体，以产生高度准直的微米尺寸的气雾化液滴流。 透镜系统由多孔透镜或联合到会聚流体分配喷嘴的单孔透镜或透镜组成。 组合的环形护套和气溶胶流通过至少两个孔传播。 具有温度控制，可变连续或脉冲激励以及恒定或可变频率的液体雾化器用于产生与空气动力学透镜系统的功能范围重叠的气溶胶尺寸分布。 通过透镜系统的组合流产生窄的，高度稳定的亚音速射流，其保持准直超过喷嘴的孔口一厘米。 该方法在基板上产生良好定义的迹线，线宽在约10至1000微米的范围内。

公开(公告)号：US08919899B2

公开(公告)日：2014-12-30

申请号：US13891982

申请日：2013-05-10

申请人： Marcelino Essien ,  David Michael Keicher

发明人： Marcelino Essien ,  David Michael Keicher

IPC分类号： B41J29/38 ,  B41J2/07 ,  B29C67/00 ,  B41J2/21

CPC分类号： B41J2/07 ,  B29C64/112 ,  B29C67/0059 ,  B41J2/211

摘要： The object of the invention is the provision of methods and apparatuses for controlled direct printing of continuous films or discreet structures using a two-component liquid jet issuing from an orifice. The two liquids may be miscible or immiscible, and form an annularly propagating flow along the axis of a deposition head. The flow consists of an outer sheath liquid with a boiling point temperature that is approximately 10 to 40 degrees lower than that of an inner sample liquid. The exit channel of the head is heated so that the pressurized outer sheath liquid is raised to a temperature greater than the boiling point of the sheath liquid at the local atmospheric pressure. The outer liquid is evaporated as the jet exits the orifice and falls at atmospheric pressure. Deposited sample line widths are produced in the range from approximately 1 to 1000 microns.

摘要翻译： 本发明的目的是提供使用从孔口发出的双组分液体射流来控制直接印刷连续薄膜或离散结构的方法和装置。 两种液体可以是可混溶的或不混溶的，并且沿着沉积头的轴线形成环形传播流。 该流程由沸腾温度比内部样品液体低约10至40度的外护套液体组成。 头部的出口通道被加热，使得加压的外护套液体在局部大气压下升高到大于鞘液的沸点的温度。 当喷射器离开孔口并在大气压下降时，外部液体被蒸发。 沉积的样品线宽度在约1至1000微米的范围内。

公开(公告)号：US08110247B2

公开(公告)日：2012-02-07

申请号：US11430636

申请日：2006-05-08

申请人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

发明人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

IPC分类号： B41J2/015

CPC分类号： H05K3/102 ,  H05K3/105 ,  H05K2203/086 ,  H05K2203/087 ,  H05K2203/107 ,  H05K2203/1344 ,  Y10S428/901

摘要： A method of depositing various materials onto heat-sensitive targets, particularly oxygen-sensitive materials. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts. Cover gases and/or forming gases may be used during thermal processing to change the material properties, for example by preventing oxidation.

摘要翻译： 将各种材料沉积在热敏性靶材上，特别是氧敏感材料的方法。 热敏靶标通常定义为具有低于处理沉积材料所需温度的热损伤阈值的靶。 本发明使用前体溶液和/或颗粒或胶态悬浮液以及任选的预沉积处理和/或沉积后处理以降低将沉积物驱动到其最终状态所需的激光功率。 本发明使用无掩模中尺度材料沉积（M3D TM）以精确，高度局部化的方式将材料直接沉积到靶上。 具有小至4微米的线宽的特征可能被沉积，很少或没有材料浪费。 优选使用激光加热材料以加工以获得期望的状态，例如通过化学分解，烧结，聚合等。 该激光处理可以在具有小于100毫瓦的激光功率的周围环境中进行。 可以在热处理期间使用覆盖气体和/或成形气体来改变材料性质，例如通过防止氧化。

公开(公告)号：US20180015730A1

公开(公告)日：2018-01-18

申请号：US15619503

申请日：2017-06-11

申请人： Marcelino Essien ,  David Michael Keicher

发明人： Marcelino Essien ,  David Michael Keicher

IPC分类号： B41J2/175

CPC分类号： B41J2/17596 ,  B41J29/02

摘要： The object of the invention is the provision of apparatuses and methods for stable direct printing of continuous films or discreet structures on a substrate using an internal pneumatic shutter. The invention uses an aerodynamic focusing technique, with a print head comprising an aerosolization source, a flow cell, an aerodynamic lens system, and a pneumatic shutter assembly. The method uses an interchangeable and variable aerodynamic lens system mounted in the flow cell, and an annularly flowing sheath gas to produce a highly collimated micrometer-size stream of aerosolized droplets. The lens system is comprised of a single-orifice or multi-orifice lens coupled to a converging fluid dispense nozzle. A liquid atomizer with temperature control is used to produce an aerosol size distribution that overlaps the functional range of the aerodynamic lens system. The shutter assembly can be attached directly to the print head, or mounted external to the print head in a control module. The preferred embodiment of the invention contains no moving parts internal to the print head, and provides non-contact shuttering of an aerosol stream. Internal shuttering of the aerosol stream is accomplished using co-propagating compressed gas and vacuum flows, a single vacuum exhaust flow, or by redirecting an aerosol carrier gas from the input port of an aerosol chamber to a continuously propagating sheath gas flow. The apparatus uses no external parts to collect or redirect the aerosol stream outside the print head. The internal shutter design allows for a reduced printer working distance, so that a substrate may be placed at the focal point of small aerosol droplets focused near the print head exit nozzle. The method produces well-defined traces on a substrate with line widths in a range from approximately 10 to 1000 microns, with sub-micron edge definition and shuttering times as small as 10 milliseconds.

公开(公告)号：US07938079B2

公开(公告)日：2011-05-10

申请号：US11011366

申请日：2004-12-13

申请人： Bruce H. King ,  Michael J. Renn ,  Marcelino Essien ,  Gregory J. Marquez ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

发明人： Bruce H. King ,  Michael J. Renn ,  Marcelino Essien ,  Gregory J. Marquez ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

IPC分类号： B05C5/00 ,  B05C19/00 ,  F23D11/10

CPC分类号： H05K3/125

摘要： Method and apparatus for improved maskless deposition of electronic and biological materials using an extended nozzle. The process is capable of direct deposition of features with linewidths varying from a few microns to a fraction of a millimeter, and can be used to deposit features on targets with damage thresholds near 100° C. or less. Deposition and subsequent processing may be performed under ambient conditions and produce linewidths as low as 1 micron, with sub-micron edge definition. The extended nozzle reduces particle overspray and has a large working distance; that is, the orifice to target distance may be several millimeters or more, enabling direct write onto non-planar surfaces. The nozzle allows for deposition of features with linewidths that are approximately as small as one-twentieth the size of the nozzle orifice diameter, and is preferably interchangeable, enabling rapid variance of deposited linewidth.

摘要翻译： 使用扩展喷嘴改善电子和生物材料的无掩模沉积的方法和装置。 该过程能够直线沉积具有从几微米变化到几分之一毫米的线宽的特征，并且可以用于在具有接近100℃或更低的损伤阈值的靶上沉积特征。 沉积和后续处理可以在环境条件下进行，并产生低至1微米的线宽，具有亚微米边缘定义。 扩展喷嘴可以减少颗粒过度喷涂，工作距离大; 也就是说，孔到目标距离可以是几毫米或更多，使得能够直接写在非平面表面上。 喷嘴允许具有大约等于喷嘴孔直径的二十分之二的线宽的特征的沉积，并且优选地是可互换的，使得沉积线宽的快速变化。

公开(公告)号：US20050129383A1

公开(公告)日：2005-06-16

申请号：US10952108

申请日：2004-09-27

申请人： Michael Renn ,  Bruce King ,  Marcelino Essien

发明人： Michael Renn ,  Bruce King ,  Marcelino Essien

IPC分类号： B05D1/02 ,  B05D1/12 ,  B05D1/40 ,  B05D3/00 ,  B05D3/06 ,  B05D5/12 ,  B05D7/02 ,  B23K20060101 ,  C08F2/46 ,  C08J7/04 ,  C08J7/18 ,  C23C18/02 ,  C23C18/14 ,  G02B6/00 ,  H01L51/00

CPC分类号： H05K3/125 ,  B05D1/02 ,  B05D3/06 ,  C08F2/46 ,  C23C18/02 ,  C23C18/14 ,  H01L51/0009

摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.

摘要翻译： 将各种材料沉积在热敏靶上的方法。 热敏靶标通常定义为具有低于处理沉积材料所需温度的热损伤阈值的靶。 本发明使用前体溶液和/或颗粒或胶态悬浮液以及任选的预沉积处理和/或沉积后处理以降低将沉积物驱动到其最终状态所需的激光功率。 本发明使用无掩模中尺度材料沉积（M 3 S D D TM）以精确，高度局部化的方式将材料直接沉积到靶上。 具有小至4微米的线宽的特征可能被沉积，很少或没有材料浪费。 优选使用激光加热材料以加工以获得期望的状态，例如通过化学分解，烧结，聚合等。 该激光处理可以在具有小于100毫瓦的激光功率的周围环境中进行。

公开(公告)号：US07294366B2

公开(公告)日：2007-11-13

申请号：US10952108

申请日：2004-09-27

申请人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

发明人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Manampathy G. Giridharan ,  Jyh-Cherng Sheu

IPC分类号： B05D3/06

CPC分类号： H05K3/125 ,  B05D1/02 ,  B05D3/06 ,  C08F2/46 ,  C23C18/02 ,  C23C18/14 ,  H01L51/0009

摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.

摘要翻译： 将各种材料沉积在热敏靶上的方法。 热敏靶标通常定义为具有低于处理沉积材料所需温度的热损伤阈值的靶。 本发明使用前体溶液和/或颗粒或胶态悬浮液以及任选的预沉积处理和/或沉积后处理以降低将沉积物驱动到其最终状态所需的激光功率。 本发明使用无掩模中尺度材料沉积（M 3 S D D TM）以精确，高度局部化的方式将材料直接沉积到靶上。 具有小至4微米的线宽的特征可能被沉积，很少或没有材料浪费。 优选使用激光加热材料以加工以获得期望的状态，例如通过化学分解，烧结，聚合等。 该激光处理可以在具有小于100毫瓦的激光功率的周围环境中进行。

公开(公告)号：US07045015B2

公开(公告)日：2006-05-16

申请号：US10346935

申请日：2003-01-17

申请人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Lemna J. Hunter

发明人： Michael J. Renn ,  Bruce H. King ,  Marcelino Essien ,  Lemna J. Hunter

IPC分类号： B05C11/06

CPC分类号： B05D1/02 ,  B05D3/06 ,  B05D3/068 ,  B05D5/00 ,  B05D5/12 ,  C23C18/06 ,  C23C18/14 ,  H05K3/1241

摘要： Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

公开(公告)号：US6075220A

公开(公告)日：2000-06-13

申请号：US135513

申请日：1998-02-12

申请人： Marcelino Essien ,  David M. Keicher ,  M. Eric Schlienger ,  James L. Jellison

发明人： Marcelino Essien ,  David M. Keicher ,  M. Eric Schlienger ,  James L. Jellison

IPC分类号： B23K26/03 ,  B23K26/00

CPC分类号： B23K26/032

摘要： An apparatus and method for determining the penetration of the weld pool created from pulsed laser welding and more particularly to an apparatus and method of utilizing an optical technique to monitor the weld vaporization plume velocity to determine the depth of penetration. A light source directs a beam through a vaporization plume above a weld pool, wherein the plume changes the intensity of the beam, allowing determination of the velocity of the plume. From the velocity of the plume, the depth of the weld is determined.

摘要翻译： 一种用于确定由脉冲激光焊接产生的熔池的穿透的装置和方法，更具体地涉及一种利用光学技术监测焊接蒸发羽流速度以确定穿透深度的装置和方法。 光源引导光束穿过熔池上方的蒸发羽流，其中羽流改变光束的强度，从而允许确定羽流的速度。 从羽流的速度，确定焊缝的深度。