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1.发明授权Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same 有权彩色滤光片保护层用树脂组合物，使用相同的滤色片保护层，图像传感器等公开(公告)号：US08628698B2
公开(公告)日：2014-01-14
申请号：US12842063
申请日：2010-07-23
Applicant: Se-Young Choi , Jae-Hyun Kim , Nam-Gwang Kim , Eui-June Jeong , Sang-Kyun Kim , Kwen-Woo Han , Hyun-Hoo Sung
Inventor： Se-Young Choi , Jae-Hyun Kim , Nam-Gwang Kim , Eui-June Jeong , Sang-Kyun Kim , Kwen-Woo Han , Hyun-Hoo Sung
CPC classification number: G02B1/14 , C08K5/06 , C08L33/08 , C08L79/04 , C09D5/024 , C09D7/63 , C09D133/06 , C09D133/08 , C09D179/04 , G02B1/041 , G02B1/105 , G02B5/201 , Y10T428/10 , Y10T428/1005 , Y10T428/1036 , Y10T428/105 , C08L33/10 , C08L61/28
Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
Abstract translation: 本发明公开了一种滤色器用保护层用树脂组合物，其包括由化学式1〜3表示的重复单元，由化学式4表示的三聚氰胺系树脂，热酸生成剂（TAG） ）和溶剂。
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2.发明授权Photosensitive resin composition for pad protective layer, and method for making image sensor using the same 有权用于垫保护层的感光树脂组合物和使用其的图像传感器的制造方法公开(公告)号：US07851789B2
公开(公告)日：2010-12-14
申请号：US12329650
申请日：2008-12-08
Applicant: Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong , Kwen-Woo Han , O-Bum Kwon , Jung-Sik Choi , Jong-Seob Kim , Tu-Won Chang , Jung-Hyun Cho , Seul-Young Jeong
Inventor： Kil-Sung Lee , Jae-Hyun Kim , Chang-Min Lee , Eui-June Jeong , Kwen-Woo Han , O-Bum Kwon , Jung-Sik Choi , Jong-Seob Kim , Tu-Won Chang , Jung-Hyun Cho , Seul-Young Jeong
IPC: H01L35/24
CPC classification number: G03F7/033
Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
Abstract translation: 本发明提供一种用于垫保护层的感光性树脂组合物，其包含（A）碱溶性树脂，（B）反应性不饱和化合物，（C）光引发剂和（D）溶剂。 （A）碱溶性树脂包括共聚物，其包含约5至约50重量％的具有化学式1的单元，约1至约25重量％的具有化学式2的单元和约45至约90重量％ 具有化学式3的单元的％，以及使用该感光性树脂组合物制造图像传感器的方法。
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3.发明授权公开(公告)号：US09312122B2
公开(公告)日：2016-04-12
申请号：US14090003
申请日：2013-11-26
Applicant: Jin-Hee Bae , Han-Song Lee , Wan-Hee Lim , Go-Un Kim , Taek-Soo Kwak , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Youn-Jin Cho , Kwen-Woo Han , Byeong-Gyu Hwang
Inventor： Jin-Hee Bae , Han-Song Lee , Wan-Hee Lim , Go-Un Kim , Taek-Soo Kwak , Bo-Sun Kim , Sang-Kyun Kim , Yoong-Hee Na , Eun-Su Park , Jin-Woo Seo , Hyun-Ji Song , Youn-Jin Cho , Kwen-Woo Han , Byeong-Gyu Hwang
CPC classification number: H01L21/0206 , C08G77/54 , C08G77/62 , C09D183/14 , C09D183/16 , C11D7/266 , C11D7/5022 , C11D11/0047 , H01L21/02087 , H01L21/0209 , H01L21/02164 , H01L21/02214 , H01L21/02222 , H01L21/02282 , H01L21/02326 , H01L27/1085 , H01L28/40
Abstract: A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
Abstract translation: 一种用于绝缘层的冲洗液，所述漂洗液包括由以下化学式1表示的溶剂：
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4.发明申请公开(公告)号：US20140315367A1
公开(公告)日：2014-10-23
申请号：US14090003
申请日：2013-11-26
Applicant: Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
Inventor： Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
IPC: H01L21/02 , H01L27/108
CPC classification number: H01L21/0206 , C08G77/54 , C08G77/62 , C09D183/14 , C09D183/16 , C11D7/266 , C11D7/5022 , C11D11/0047 , H01L21/02087 , H01L21/0209 , H01L21/02164 , H01L21/02214 , H01L21/02222 , H01L21/02282 , H01L21/02326 , H01L27/1085 , H01L28/40
Abstract: A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
Abstract translation: 一种用于绝缘层的冲洗液，所述漂洗液包括由以下化学式1表示的溶剂：
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5.发明申请PHOTOSENSITIVE RESIN COMPOSITION FOR PAD PROTECTIVE LAYER, AND METHOD FOR MAKING IMAGE SENSOR USING THE SAME 有权用于保护层的感光性树脂组合物及使用其形成图像传感器的方法公开(公告)号：US20090146236A1
公开(公告)日：2009-06-11
申请号：US12329650
申请日：2008-12-08
Applicant: Kil-Sung LEE , Jae-Hyun KIM , Chang-Min LEE , Eui-June JEONG , Kwen-Woo HAN , O-Bum KWON , Jung-Sik CHOI , Jong-Seob KIM , Tu-Won CHANG , Jung-Hyun CHO , Seul-Young JEONG
Inventor： Kil-Sung LEE , Jae-Hyun KIM , Chang-Min LEE , Eui-June JEONG , Kwen-Woo HAN , O-Bum KWON , Jung-Sik CHOI , Jong-Seob KIM , Tu-Won CHANG , Jung-Hyun CHO , Seul-Young JEONG
IPC: H01L31/0232 , G03F7/004 , G03F7/20
CPC classification number: G03F7/033
Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
Abstract translation: 本发明提供一种用于垫保护层的感光性树脂组合物，其包含（A）碱溶性树脂，（B）反应性不饱和化合物，（C）光引发剂和（D）溶剂。 （A）碱溶性树脂包括共聚物，其包含约5至约50重量％的具有化学式1的单元，约1至约25重量％的具有化学式2的单元和约45至约90重量％ 具有化学式3的单元的％，以及使用该感光性树脂组合物制造图像传感器的方法。
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Patent Agency Ranking
6.发明申请RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING SAME 有权使用相同的底漆组合物和制造集成电路装置的方法公开(公告)号：US20130037921A1
公开(公告)日：2013-02-14
申请号：US13571751
申请日：2012-08-10
Applicant: Kwen-Woo HAN , Mi-Young KIM , Woo-Jin LEE , Han-Song LEE , Seung-Hee HONG , Sang-Kyun KIM , Jin-Wook LEE
Inventor： Kwen-Woo HAN , Mi-Young KIM , Woo-Jin LEE , Han-Song LEE , Seung-Hee HONG , Sang-Kyun KIM , Jin-Wook LEE
CPC classification number: C08L83/06 , G03F7/0752 , G03F7/091 , G03F7/094
Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
Abstract translation: 包含溶剂的抗蚀剂底层组合物和由化学式1表示的化合物，由化学式2表示的化合物和由化学式3表示的化合物制备的水解产物的有机硅烷缩聚产物。
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7.发明申请RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME 有权使用相同的底层组合物和制造集成电路装置的方法公开(公告)号：US20120270981A1
公开(公告)日：2012-10-25
申请号：US13539971
申请日：2012-07-02
Applicant: Mi-Young KIM , Woo-Jin LEE , Kwen-Woo HAN , Han-Song LEE , Sang-Kyun KIM , Jong-Seob KIM
Inventor： Mi-Young KIM , Woo-Jin LEE , Kwen-Woo HAN , Han-Song LEE , Sang-Kyun KIM , Jong-Seob KIM
CPC classification number: H01L21/0332 , C08G77/80 , C09D183/04 , G03F7/0752 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
Abstract: A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X [Chemical Formula 1] [R2O]3Si—R3 [Chemical Formula 2] [R4O]3Si—Si[OR5]3. [Chemical Formula 3]
Abstract translation: 抗蚀剂底层组合物包括溶剂和由以下化学式1表示的化合物，由以下化学式2表示的化合物和由以下化学式3表示的化合物的有机硅烷缩聚产物[R1O] 3Si-X [化学式1] [R2O] 3Si-R3 [化学式2] [R4O] 3Si-Si [OR5] 3。 [化学式3]
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8.发明申请Resin Composition for Protection Layer of Color Filter, Protection Layer of Color Filter Using Same and Image Sensor Including Same 有权彩色滤光片保护层用树脂组合物，使用相同的滤色片保护层及包含其的图像传感器公开(公告)号：US20110156185A1
公开(公告)日：2011-06-30
申请号：US12842063
申请日：2010-07-23
Applicant: Se-Young CHOI , Jae-Hyun KIM , Nam-Gwang KIM , Eui-June JEONG , Sang-Kyun KIM , Kwen-Woo HAN , Hyun-Hoo SUNG
Inventor： Se-Young CHOI , Jae-Hyun KIM , Nam-Gwang KIM , Eui-June JEONG , Sang-Kyun KIM , Kwen-Woo HAN , Hyun-Hoo SUNG
IPC: H01L31/0232 , C08L39/04 , C08K5/06
CPC classification number: G02B1/14 , C08K5/06 , C08L33/08 , C08L79/04 , C09D5/024 , C09D7/63 , C09D133/06 , C09D133/08 , C09D179/04 , G02B1/041 , G02B1/105 , G02B5/201 , Y10T428/10 , Y10T428/1005 , Y10T428/1036 , Y10T428/105 , C08L33/10 , C08L61/28
Abstract: Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent.
Abstract translation: 本发明公开了一种滤色器用保护层用树脂组合物，其包括由化学式1〜3表示的重复单元，由化学式4表示的三聚氰胺系树脂，热酸生成剂（TAG） ）和溶剂。
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9.发明授权Resist underlayer composition and process of producing integrated circuit devices using the same 有权抗蚀底层组合物和使用其制造集成电路器件的工艺公开(公告)号：US08962747B2
公开(公告)日：2015-02-24
申请号：US13539971
申请日：2012-07-02
Applicant: Mi-Young Kim , Woo-Jin Lee , Kwen-Woo Han , Han-Song Lee , Sang-Kyun Kim , Jong-Seob Kim
Inventor： Mi-Young Kim , Woo-Jin Lee , Kwen-Woo Han , Han-Song Lee , Sang-Kyun Kim , Jong-Seob Kim
IPC: C08L83/00 , H01L21/033 , G03F7/075 , G03F7/09 , H01L21/02
CPC classification number: H01L21/0332 , C08G77/80 , C09D183/04 , G03F7/0752 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
Abstract: A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, [R1O]3Si—X [Chemical Formula 1] [R2O]3Si—R3 [Chemical Formula 2] [R4O]3Si—Si[OR5]3. [Chemical Formula 3]
Abstract translation: 抗蚀剂底层组合物包括溶剂和由以下化学式1表示的化合物，由以下化学式2表示的化合物和由以下化学式3表示的化合物的有机硅烷缩聚产物[R1O] 3Si-X [化学式1] [R2O] 3Si-R3 [化学式2] [R4O] 3Si-Si [OR5] 3。 [化学式3]
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10.发明授权Resist underlayer composition and process of producing integrated circuit devices using same 有权抗蚀底层组成和使用其制造集成电路器件的工艺公开(公告)号：US08841218B2
公开(公告)日：2014-09-23
申请号：US13571751
申请日：2012-08-10
Applicant: Kwen-Woo Han , Mi-Young Kim , Woo-Jin Lee , Han-Song Lee , Seung-Hee Hong , Sang-Kyun Kim , Jin-Wook Lee
Inventor： Kwen-Woo Han , Mi-Young Kim , Woo-Jin Lee , Han-Song Lee , Seung-Hee Hong , Sang-Kyun Kim , Jin-Wook Lee
IPC: H01L21/311 , C08L83/06
CPC classification number: C08L83/06 , G03F7/0752 , G03F7/091 , G03F7/094
Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3.
Abstract translation: 包含溶剂的抗蚀剂底层组合物和由化学式1表示的化合物，由化学式2表示的化合物和由化学式3表示的化合物制备的水解产物的有机硅烷缩聚产物。
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