公开(公告)号：US09850540B2

公开(公告)日：2017-12-26

申请号：US12922184

申请日：2009-02-18

Applicant: Sung Whan An ,  Young Ho Moon ,  Tae Jeong Oh

Inventor： Sung Whan An ,  Young Ho Moon ,  Tae Jeong Oh

IPC: C12Q1/70 ,  C12P19/34 ,  C07H21/04 ,  C12Q1/68

CPC classification number: C12Q1/6886 ,  C12Q2600/112 ,  C12Q2600/154 ,  C12Q2600/156

Abstract: The present invention relates to a method for detecting lung cancer using a lung cancer-specific biomarker, and more particularly to a biomarker for lung cancer diagnosis, which can detect methylation of PCDHGA12 gene whose 5′UTR or exon 1 region is specifically methylated in lung cancer cells, and to a method of detecting lung cancer and the stage of its progression using the biomarker. The diagnostic kit according to the present invention makes it possible to diagnose lung cancer at an early stage in an accurate and rapid manner compared to conventional methods and can be used for prognosis and monitoring of lung cancer and the stage of its progression.

公开(公告)号：US09745622B2

公开(公告)日：2017-08-29

申请号：US13508534

申请日：2010-10-14

Applicant: Sung Whan An ,  Young Ho Moon ,  Tae Jeong Oh ,  Hyun Cheol Chung

Inventor： Sung Whan An ,  Young Ho Moon ,  Tae Jeong Oh ,  Hyun Cheol Chung

IPC: C12Q1/68

CPC classification number: C12Q1/686 ,  C12Q1/6886 ,  C12Q2600/154 ,  C12Q2523/125

Abstract: The present invention relates to a method for detecting the methylation of colorectal cancer-specific marker genes for colorectal cancer diagnosis, and more particularly to a method of detecting colorectal cancer-specific marker genes, which are methylated specifically in colorectal cancer cells, to provide information for diagnosing colorectal cancer. The use of the inventive method for detecting methylation and the inventive composition, kit and nucleic chip for diagnosing colorectal cancer makes it possible to diagnose colorectal cancer at an early transformation stage, thus enabling the early diagnosis of colorectal cancer. In addition, the inventive method enables colorectal cancer to be effectively diagnosed in an accurate and rapid manner compared to conventional methods.

公开(公告)号：US09267024B2

公开(公告)日：2016-02-23

申请号：US14232241

申请日：2012-07-11

Applicant: Woo-Jeong Oh ,  Yong Chun ,  Eung-Soo Kim ,  Min Nam ,  Hyeon-Don Kim ,  Gi-Dae Choi

Inventor： Woo-Jeong Oh ,  Yong Chun ,  Eung-Soo Kim ,  Min Nam ,  Hyeon-Don Kim ,  Gi-Dae Choi

IPC: C08L23/14 ,  B60R21/203 ,  B60R21/215

CPC classification number: C08L23/14 ,  B60R21/203 ,  B60R21/215 ,  B60R2021/21543 ,  C08L23/0876 ,  C08L23/142 ,  C08L23/16 ,  C08L51/06 ,  C08L53/00 ,  C08L2205/035 ,  C08L23/26 ,  C08L25/08 ,  C08L23/02

Abstract: The present invention relates to a polyolefin-based thermoplastic elastomer composition for a vehicle airbag cover, including a polypropylene-based resin, a denatured polypropylene resin, an ionomer resin, an olefin-based copolymer elastomer and a styrene-based copolymer elastomer, an airbag cover material using the composition, and an airbag module using the airbag cover material.

Abstract translation: 本发明涉及一种用于车辆安全气囊罩的聚烯烃基热塑性弹性体组合物，包括聚丙烯基树脂，变性聚丙烯树脂，离聚物树脂，烯烃基共聚物弹性体和苯乙烯基共聚物弹性体，气囊 使用该组合物的覆盖材料和使用该安全气囊盖材料的气囊模块。

公开(公告)号：US20130279195A1

公开(公告)日：2013-10-24

申请号：US13976842

申请日：2011-12-30

Applicant: Kyoung Soo Ahn ,  Sang Jun Park ,  Jae Hyuk Jang ,  Jong Sun Kim ,  Jeong Oh Lee

Inventor： Kyoung Soo Ahn ,  Sang Jun Park ,  Jae Hyuk Jang ,  Jong Sun Kim ,  Jeong Oh Lee

IPC: F21V8/00

CPC classification number: G02B6/0011 ,  G02B6/0021 ,  G02B6/0036 ,  G02B6/0083 ,  G02B6/0091 ,  G02F1/133615

Abstract: The present invention relates to a structure of an edge-type back light unit, particularly to a structure comprising a light source receiving part, which receives a light source such as LED formed to the central direction of an optical plate at one side or the other side of the optical plate.The present invention has excellent optical property and has an effect of wide application to various LCDs because it comprises a light source receiving part, which can install a printed circuit board mounting the light source such as LED to an embedded form in an edge-type back light unit.

Abstract translation: 本发明涉及一种边缘型背光单元的结构，特别涉及一种包括光源接收部分的结构，该光源接收部分在一侧或另一侧接收形成在光学板的中心方向上的诸如LED的光源 一侧的光学板。 本发明具有优异的光学性能，并且具有广泛应用于各种LCD的效果，因为它包括光源接收部分，其可以将安装诸如LED的光源的印刷电路板以嵌入的形式安装在边缘型背面 光单元。

公开(公告)号：US20130071836A9

公开(公告)日：2013-03-21

申请号：US11279894

申请日：2006-04-15

Applicant: Sungwhan An ,  Chiwang Yoon ,  Youngho Moon ,  Tae Jeong Oh ,  Dae Kyoung Yoon ,  Myungsoon Kim

Inventor： Sungwhan An ,  Chiwang Yoon ,  Youngho Moon ,  Tae Jeong Oh ,  Dae Kyoung Yoon ,  Myungsoon Kim

IPC: C12Q1/68 ,  C07H21/04

CPC classification number: C12Q1/6886 ,  C12Q1/6827 ,  C12Q2600/154 ,  C12Q2565/501 ,  C12Q2525/117

Abstract: The present application discloses an epigenetic marker for colon cancer.

Abstract translation: 本申请公开了一种结肠癌的表观遗传学标记物。

公开(公告)号：US08228455B2

公开(公告)日：2012-07-24

申请号：US12256840

申请日：2008-10-23

Applicant: Joon Young Yang ,  Jung Il Lee ,  Jeong Oh Kim ,  Yu Kyeong Ahn ,  Young Kwon Kang ,  Sang Jin Lee ,  Jung Ho Bang

Inventor： Joon Young Yang ,  Jung Il Lee ,  Jeong Oh Kim ,  Yu Kyeong Ahn ,  Young Kwon Kang ,  Sang Jin Lee ,  Jung Ho Bang

IPC: G02F1/136 ,  G02F1/13 ,  G03F1/00 ,  G03F7/00

CPC classification number: H01L27/1288 ,  G03F1/36 ,  G03F1/44 ,  G03F1/50 ,  G03F7/0005 ,  H01L27/1214 ,  H01L27/124

Abstract: The present invention relates a method for forming a pattern includes the steps of forming a thin film on a substrate, coating a photoresist film on the thin film, aligning a mask over the photoresist film, the mask formed on a base material, including a light shielding portion having a linear supporting portion and an uneven portion at a boundary of the supporting portion, and a transmission portion defined at regions excluding the light shielding portion, exposing the photoresist film with the mask thereon to a UV beam of a wavelength greater than 300nm to cause refraction in the vicinity of the uneven portion, and developing the photoresist film exposed thus to form a photoresist film pattern, and patterning the thin film by using the photoresist film pattern thus formed.

Abstract translation: 本发明涉及一种用于形成图案的方法，包括以下步骤：在基底上形成薄膜，在薄膜上涂覆光致抗蚀剂膜，对准光致抗蚀剂膜上的掩模，形成在基材上的掩模，包括光 屏蔽部分在支撑部分的边界处具有线性支撑部分和不平坦部分，以及限定在除了遮光部分之外的区域处的透射部分，将具有掩模的光致抗蚀剂膜暴露于波长大于300nm的UV光束 在不均匀部分附近引起折射，并使曝光的光致抗蚀剂膜显影以形成光致抗蚀剂图案，并且通过使用由此形成的光致抗蚀剂膜图案来图案化薄膜。

公开(公告)号：US20120084954A1

公开(公告)日：2012-04-12

申请号：US13270951

申请日：2011-10-11

Applicant: Tai Yon Cho ,  Kwan Hyeong Kim ,  Jae Bum Cho ,  Jeong Oh Hong

Inventor： Tai Yon Cho ,  Kwan Hyeong Kim ,  Jae Bum Cho ,  Jeong Oh Hong

IPC: H01G9/00

CPC classification number: H01G9/07 ,  C25D11/04 ,  C25D11/26 ,  H01G9/0032 ,  H01G9/0036 ,  H01G9/028

Abstract: There is provided a method of manufacturing a solid electrolytic capacitor including: forming a conductive polymer layer on a surface of a metal pellet; and forming a dielectric layer between the metal pellet and the conductive polymer layer. Because the conductive polymer layer is directly formed on the surface of the metal pellet, the conductive polymer layer can be uniformly formed, and because there is no need to form an electrode on the surface of the dielectric layer, the process can be reduced. In addition, because the uniform polymer film is formed irrespective of the size of metal pores and the shape of the capacitor, a capacity of the capacitor can be maximized.

Abstract translation: 提供一种制造固体电解电容器的方法，包括：在金属颗粒的表面上形成导电聚合物层; 以及在金属颗粒和导电聚合物层之间形成介电层。 由于导电聚合物层直接形成在金属颗粒的表面上，所以可以均匀地形成导电聚合物层，并且由于不需要在电介质层的表面上形成电极，所以可以降低该过程。 此外，由于形成均匀的聚合物膜，与金属孔的尺寸和电容器的形状无关，所以可以使电容器的容量最大化。

公开(公告)号：US20110116247A1

公开(公告)日：2011-05-19

申请号：US12769830

申请日：2010-04-29

Applicant: Tong-Suk KIM ,  Heung-Kyu Kwon ,  Jeong-Oh Ha ,  Hyun-A Kim

Inventor： Tong-Suk KIM ,  Heung-Kyu Kwon ,  Jeong-Oh Ha ,  Hyun-A Kim

IPC: H05K7/00 ,  H01L23/538

CPC classification number: H01L23/488 ,  H01L23/49816 ,  H01L24/73 ,  H01L25/105 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48225 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2225/06572 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/15331 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device having a printed circuit board and a semiconductor chip. The printed circuit board includes a chip region, a plurality of first ball lands adjacent to the chip region, and at least one second ball land adjacent to the first ball lands. The semiconductor chip is mounted on the chip region. The first ball lands are arranged to have a first pitch. One of the first ball lands which is nearest to the second ball land, and the second ball land have a second pitch greater than the first pitch.

Abstract translation: 一种具有印刷电路板和半导体芯片的半导体器件。 印刷电路板包括芯片区域，与芯片区域相邻的多个第一球区域和与第一球区相邻的至少一个第二球区域。 半导体芯片安装在芯片区域上。 第一个球场布置成具有第一个球场。 最靠近第二球区的第一球场之一，而第二球场具有大于第一球距的第二球距。

公开(公告)号：US20100022382A1

公开(公告)日：2010-01-28

申请号：US12239288

申请日：2008-09-26

Applicant: Sung Hyung KANG ,  Young Tae Kim ,  Kang Heon Hur ,  Jeong Oh Hong ,  Su Jin Kim

Inventor： Sung Hyung KANG ,  Young Tae Kim ,  Kang Heon Hur ,  Jeong Oh Hong ,  Su Jin Kim

IPC: C04B35/468

CPC classification number: C04B35/468 ,  C04B2235/3203 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3229 ,  C04B2235/3239 ,  C04B2235/3241 ,  C04B2235/3244 ,  C04B2235/3251 ,  C04B2235/3262 ,  C04B2235/3272 ,  C04B2235/3275 ,  C04B2235/3279 ,  C04B2235/3418 ,  C04B2235/3817 ,  C04B2235/3839 ,  C04B2235/5409 ,  C04B2235/6025 ,  C04B2235/79

Abstract: Provided are a dielectric composition and a ceramic electronic component including the same. The dielectric composition includes (a) barium titanate having a specific surface area of 2.5 m2/g to 6.0 m2/g; (b) a mixture containing at least one or more materials selected from the group consisting of any one oxide of Mg, Ca, Sr, Ba and Zr, and any one carbide thereof; (c) oxide containing at least one or more materials selected from the group consisting of Sc, Y, La, Ac, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu; (d) oxide containing at least one or more material selected from the group consisting of Cr, Mn, Fe, Co, and Ni; (e) oxide containing at least one or more material selected from the group consisting of V, Nb, and Ta; and (f) oxide containing at least one or more material selected from the group consisting of Si and Al. The dielectric composition can satisfy X8R characteristic, can be sintered at a low temperature, and can obtain high reliability.

Abstract translation: 提供了一种电介质组合物和包括其的陶瓷电子部件。 电介质组合物包括（a）比表面积为2.5m 2 / g至6.0m 2 / g的钛酸钡; （b）含有选自Mg，Ca，Sr，Ba和Zr中的任一种氧化物中的至少一种以上的材料的混合物及其任何一种碳化物; （c）含有选自Sc，Y，La，Ac，Ce，Pr，Nd，Pm，Sm，Eu，Gd，Tb，Dy，Ho，Er，Tm，Yb中的至少一种以上的材料的氧化物 ，卢; （d）含有选自Cr，Mn，Fe，Co和Ni中的至少一种或多种材料的氧化物; （e）含有选自V，Nb和Ta中的至少一种或多种材料的氧化物; 和（f）含有选自Si和Al的至少一种或多种材料的氧化物。 电介质组成可满足X8R特性，可在低温烧结，可获得高可靠性。

公开(公告)号：US20080123044A1

公开(公告)日：2008-05-29

申请号：US11812949

申请日：2007-06-22

Applicant: Jae Young Oh ,  Young Seung Jee ,  Jeong Oh Kim ,  Soopool Kim

Inventor： Jae Young Oh ,  Young Seung Jee ,  Jeong Oh Kim ,  Soopool Kim

IPC: G02F1/13

CPC classification number: G02F1/136227 ,  G02F1/134363 ,  G02F2001/134372 ,  G02F2201/40

Abstract: A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.

Abstract translation: 一种制造具有增强的开口率和亮度的LCD的方法包括：在第一掩模处理中形成栅极线，栅电极，公共电极和公共线; 沉积覆盖栅极线，栅电极和公共电极的栅极绝缘层; 在栅极绝缘层上形成有源层，在第二掩模工艺中在有源层上形成欧姆接触层; 在第三掩模工艺中形成面对源电极的数据线，源电极和漏电极; 在数据线，源电极和漏电极上沉积保护层; 在第四掩模处理中形成像素接触孔; 以及形成像素电极，其中，在使用倒锥形光刻胶图案的第五掩模工艺中，像素电极通过像素接触孔连接到漏电极。