公开(公告)号：US08512934B2

公开(公告)日：2013-08-20

申请号：US12681784

申请日：2008-09-29

申请人： Pascal Hayoz ,  Hitoshi Yamato

发明人： Pascal Hayoz ,  Hitoshi Yamato

IPC分类号： G03F7/004 ,  G03F7/031 ,  G03F7/30 ,  C07C321/28 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039

CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C07C321/28 ,  C07C381/12 ,  C09D4/00 ,  C09D11/101 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

摘要： Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如为氢，R1或COT; T表示T1或O-T2; 例如，T 1和T 2是氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 6 -C 14芳基，C 3 -C 12杂芳基，被一个或多个D，C 2 -C 20烷基取代的C 1 -C 20烷基，被一个或多个 E，被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1，R2，R3，R4，Ra，Rb和Rc为T1; D是例如R5，OR5，SR5或Q1; E例如为O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基，C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L，L1，L2，L3，L4，L5，L6，L7和L8中的至少一个不是氢; 并且（i）T1或T2中的至少一个是组Q; 或（ii）至少一个D为基团Q1; 或（iii）至少一个E为基团Q2; 适合作为光催化剂。

公开(公告)号：US20110171569A1

公开(公告)日：2011-07-14

申请号：US12996795

申请日：2009-06-02

申请人： Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

发明人： Yuichi Nishimae ,  Toshikage Asakura ,  Hitoshi Yamato

IPC分类号： G03F7/004 ,  C07D335/08 ,  C07D339/08 ,  C07D413/02 ,  C07D285/16 ,  C07D327/08 ,  C08F228/06 ,  G03F7/20 ,  G03F1/00

CPC分类号： C07D339/08 ,  C07D327/08

摘要： Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X− is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.

摘要翻译： 式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30 - 环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3 - 烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。

公开(公告)号：US20100297541A1

公开(公告)日：2010-11-25

申请号：US12681786

申请日：2008-09-29

申请人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

发明人： Pascal Hayoz ,  Hitoshi Yamato ,  Toshikage Asakura

IPC分类号： G03F1/00 ,  G03F7/004 ,  G03F7/20 ,  C07D409/12 ,  C07D407/12 ,  C07C255/34 ,  C07C321/26

CPC分类号： G03F7/0045 ,  C07C381/12 ,  C07D307/64 ,  C07D333/34 ,  G03F7/0007 ,  G03F7/038

摘要： Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

公开(公告)号：US20090042114A1

公开(公告)日：2009-02-12

申请号：US12154333

申请日：2008-05-22

申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

IPC分类号： C07D209/82 ,  C07C317/12 ,  G03F7/004 ,  C07D335/04

CPC分类号： C07C251/48 ,  B33Y70/00 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/40 ,  C07D209/86 ,  C07D307/91 ,  C07D333/76 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

摘要： Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.

摘要翻译： 式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-phenylene或-Ar''1-A1-Y1-A1-Ar'1,1- 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部被取代; A1是例如直接键，-O - ， - S - 或-NR 6 - ; Y1特别是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特​​别适合作为光潜酸。

公开(公告)号：US20050153244A1

公开(公告)日：2005-07-14

申请号：US10495710

申请日：2003-01-28

申请人： Akira Matsumoto ,  Hitoshi Yamato ,  Toshikage Asakura ,  Peter Murer

发明人： Akira Matsumoto ,  Hitoshi Yamato ,  Toshikage Asakura ,  Peter Murer

IPC分类号： C07C301/00 ,  C07C309/67 ,  C07C309/68 ,  C07C317/04 ,  C07C317/14 ,  C07C323/66 ,  C07C381/00 ,  C07D209/48 ,  C07D209/76 ,  C07D291/00 ,  C07D333/36 ,  G02B5/20 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/0037 ,  B33Y70/00 ,  C07C323/66 ,  C07C381/00 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/114

摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X′ is —X1-A3-X2—; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a are phenyl or C1-C18alkyl; give high resolution with good resist profile.

公开(公告)号：US06673850B1

公开(公告)日：2004-01-06

申请号：US09959174

申请日：2001-10-18

申请人： Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

发明人： Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

IPC分类号： C08F246

CPC分类号： C07D295/108 ,  B33Y70/00 ,  C07C323/54 ,  C08F2/50 ,  C08F293/005 ,  C08F295/00 ,  C08L53/00 ,  C08L53/02 ,  C09D153/00 ,  C09D153/02 ,  C09J153/00 ,  C09J153/02 ,  G03F7/031 ,  Y10S522/904

摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.

摘要翻译： 具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。

公开(公告)号：US06306555B1

公开(公告)日：2001-10-23

申请号：US09740205

申请日：2000-12-18

申请人： Reinhard Schulz ,  Jean-Luc Birbaum ,  Jean-Pierre Wolf ,  Stephan Ilg ,  Hitoshi Yamato ,  Toshikage Asakura

发明人： Reinhard Schulz ,  Jean-Luc Birbaum ,  Jean-Pierre Wolf ,  Stephan Ilg ,  Hitoshi Yamato ,  Toshikage Asakura

IPC分类号： G03F7004

CPC分类号： G03F7/0382 ,  B33Y70/00 ,  C07C17/00 ,  C07C25/18 ,  C07C2601/14 ,  C08G59/68 ,  C08G65/105 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  Y10S430/115

摘要： Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted.

摘要翻译： 辐射敏感性组合物，其包含（a1）阳离子或酸可催化聚合或交联的化合物或（a2）在酸的作用下增加其在显影剂中的溶解度的化合物; 和（b）式IX的至少一种二芳基碘鎓盐是支链C 3 -C 20烷基或C 3 -C 8环烷基; X 1是氢，直链C 1 -C 20烷基，支链C 3 -C 20烷基或C 3 -C 8环烷基; 条件是X和X 1中的碳原子总数至少为4; Y为直链C 1 -C 10烷基，支链C 3 -C 10烷基或C 3 -C 8环烷基; A-为非亲核阴离子，选自（BF 4 ） - ，（SbF 6） - ，（PF 6） - ，（B（C 6 F 5））4-，C 1 -C 20烷基磺酸酯，C 2 -C 20卤代烷基磺酸酯，未取代的C 6 -C 10芳基磺酸酯，樟脑磺酸酯和C 6 -C 10芳基磺酸酯，被卤素， ，C 1 -C 12卤代烷基，C 1 -C 12烷氧基或COOR 1; 并且R 1是C 1 -C 20烷基，苯基，苄基; 或被C 1 -C 12烷基，C 1 -C 12烷氧基或卤素单取代或多取代的苯基;条件是碘原子上的两个苯环不同等取代。

公开(公告)号：US20110233477A1

公开(公告)日：2011-09-29

申请号：US13073251

申请日：2011-03-28

申请人： Hiroshi Yamamoto ,  Shinji Nakamichi ,  Junichi Tanabe ,  Ryuichi Takahashi ,  Hitoshi Yamato

发明人： Hiroshi Yamamoto ,  Shinji Nakamichi ,  Junichi Tanabe ,  Ryuichi Takahashi ,  Hitoshi Yamato

IPC分类号： H01L31/0224 ,  C07D401/14 ,  C07D213/80 ,  C07D401/10 ,  C07D455/04 ,  C07D413/10 ,  C07D401/06 ,  H01B1/22

CPC分类号： C07D213/80 ,  C07D213/38 ,  C07D213/65 ,  C07D213/89 ,  C07D401/06 ,  C07D401/14 ,  C07D455/04 ,  C09B23/148 ,  C09B57/00 ,  C09B57/008 ,  H01G9/2031 ,  H01G9/2059 ,  H01L51/0067 ,  Y02E10/542 ,  Y02E10/549

摘要： The present invention pertains to an electrode layer comprising a porous film made of oxide semiconductor fine particles sensitized with certain methine dyes. Moreover the present invention pertains to a photoelectric conversion device comprising said electrode layer, a dye sensitized solar cell comprising said photoelectric conversion device and to novel dyes of formula (I)

摘要翻译： 本发明涉及包含由某些次甲基染料致敏的氧化物半导体微粒制成的多孔膜的电极层。 此外，本发明涉及包括所述电极层，包含所述光电转换装置的染料敏化太阳能电池和式（I）的新型染料的光电转换装置，

公开(公告)号：US20110217654A1

公开(公告)日：2011-09-08

申请号：US13028323

申请日：2011-02-16

申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Keita Tanaka ,  Yuichi Nishimae

发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Keita Tanaka ,  Yuichi Nishimae

IPC分类号： G03F7/004 ,  C07C69/753 ,  C07D311/74 ,  C07C69/63 ,  C07D307/77 ,  C07D207/277 ,  C07C309/82 ,  C07C69/96 ,  C07C271/24 ,  C07D265/30 ,  C07D233/38 ,  C08F28/02 ,  G03F7/20

CPC分类号： C07C69/63 ,  B33Y70/00 ,  B33Y80/00 ,  C07C69/753 ,  C07C69/96 ,  C07C271/24 ,  C07C309/82 ,  C07D207/277 ,  C07D233/38 ,  C07D265/30 ,  C07D307/77 ,  C07D311/74 ,  C08F28/02 ,  G03F7/004 ,  G03F7/20

摘要： The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH2 or CO; Y is O, NR4, S, O(CO), O(CO)O, O(CO)NR4, OSO2, O(CS), or O(CS)NR4; R1 is for example C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, interrupted C2-C18alkyl, interrupted C3-C30cycloalkyl, interrupted C3-C30cycloalkyl-C1-C18alkyl, interrupted C4-C30cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R1 is NR12R13; R2 and R3 are for example C3-C30cycloalkylene, C3-C30cycloalkyl-C1-C18alkylene, C1-C18alkylene, C1-C10haloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R4 is for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl; R12 and R13 are for example C3-C30cycloalkyl, C3-C30cycloalkyl-C1-C18alkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1-C3-alkyl, Ar, (CO)R15, (CO)OR15 or SO2R15; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

摘要翻译： 本发明涉及产生式I或II的酸的化合物，例如相应的锍盐和碘鎓盐，以及其中X是CH 2或CO的相应的磺酰肟; Y是O，NR4，S，O（CO），O（CO）O，O（CO）NR4，OSO2，O（CS）或O（CS）NR4; R 1是例如C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 2 -C 18烷基，间断的C 3 -C 30环烷基， 间断的C 3 -C 30环烷基-C 1 -C 18烷基，间断的C 4 -C 30环烯基，苯基，萘基，蒽基，菲基，联苯基，芴基或杂芳基，全部未取代或被取代; 或R1是NR12R13; R2和R3是例如C 3 -C 30亚环烷基，C 3 -C 30环烷基-C 1 -C 18亚烷基，C 1 -C 18亚烷基，C 1 -C 10卤代亚烷基，C 2 -C 12亚烯基，C 4 -C 30亚环烯基，亚苯基，亚萘基，亚蒽基，亚菲基，亚联苯基或亚杂芳基。 全部未取代或取代; R4是例如C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12链烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基; R 12和R 13例如为C 3 -C 30环烷基，C 3 -C 30环烷基-C 1 -C 18烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3烷基，Ar，（CO）R 15 CO）OR15或SO2R15; 并且Ar是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，全部是未取代或取代的。

公开(公告)号：US07687220B2

公开(公告)日：2010-03-30

申请号：US11632687

申请日：2005-07-11

申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Tobias Hintermann

IPC分类号： G03F7/028 ,  C07C259/08

CPC分类号： C07C309/67 ,  B33Y70/00 ,  C07C309/65 ,  C07C309/73 ,  C07C309/74 ,  C07C309/75 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/66 ,  C07D209/86 ,  C07F9/097 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/12

摘要： The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, , naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.

摘要翻译： 本发明涉及式I，II或III的新型光致酸产生剂化合物，其中R 1为例如C 1 -C 18烷基磺酰基或苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，均为任选取代的，或者R 1为基团X 1 ，X2和X3彼此独立地为O或S; R'1，例如 亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R2是卤素或C1-C10卤代烷基; X是卤素; Ar1为例如联苯基或芴基，或为取代的萘基; Ar'1是杂亚芳基，任选取代; R8，R9，R10和R11例如是未被取代或被卤素取代的C1-C6烷基; 或R 8，R 9和R 10为未被取代或被C 1 -C 4烷基或卤素取代的苯基; 或R 10和R 11一起是1,2-亚苯基或未被取代或被C 1 -C 4烷基或卤素取代的C 2 -C 6亚烷基。